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1.
公开(公告)号:US08698271B2
公开(公告)日:2014-04-15
申请号:US12404275
申请日:2009-03-13
Applicant: Dongwoo Suh , Sang Hoon Kim , Gyungock Kim , JiHo Joo
Inventor: Dongwoo Suh , Sang Hoon Kim , Gyungock Kim , JiHo Joo
CPC classification number: H01L31/028 , H01L21/02381 , H01L21/0245 , H01L21/02532 , H01L21/02592 , H01L21/0262 , H01L21/02667 , H01L31/103 , H01L31/1808 , H01L31/1872 , Y02E10/50 , Y02P70/521
Abstract: Provided is a germanium photodetector having a germanium epitaxial layer formed without using a buffer layer and a method of fabricating the same. In the method, an amorphous germanium layer is formed on a substrate. The amorphous germanium layer is heated up to a high temperature to form a crystallized germanium layer. A germanium epitaxial layer is formed on the crystallized germanium layer.
Abstract translation: 提供了具有不使用缓冲层形成的锗外延层的锗光电检测器及其制造方法。 在该方法中,在基板上形成无定形锗层。 将非晶锗层加热至高温以形成结晶的锗层。 在结晶的锗层上形成锗外延层。
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公开(公告)号:US08859319B2
公开(公告)日:2014-10-14
申请号:US13612736
申请日:2012-09-12
Applicant: Sang Hoon Kim , Gyungock Kim , In Gyoo Kim , JiHo Joo , Ki Seok Jang
Inventor: Sang Hoon Kim , Gyungock Kim , In Gyoo Kim , JiHo Joo , Ki Seok Jang
IPC: H01L31/18
CPC classification number: H01L31/1804 , G02B6/12004 , G02B6/131 , H01L31/02327 , H01L31/103 , H01L31/1037 , H01L31/109 , Y02E10/547 , Y02P70/521
Abstract: Methods of forming photo detectors are provided. The method includes providing a semiconductor layer on a substrate, forming a trench in the semiconductor layer, forming a first single crystalline layer and a second single crystalline layer using a selective single crystalline growth process in the trench, and patterning the first and second single crystalline layers and the semiconductor layer to form a first single crystalline pattern, a second single crystalline pattern and an optical waveguide.
Abstract translation: 提供了形成光电检测器的方法。 该方法包括在衬底上提供半导体层,在半导体层中形成沟槽,在沟槽中使用选择性单晶生长工艺形成第一单晶层和第二单晶层,以及使第一和第二单晶 层和半导体层以形成第一单晶图案,第二单晶图案和光波导。
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3.
公开(公告)号:US20120126357A1
公开(公告)日:2012-05-24
申请号:US13284818
申请日:2011-10-28
Applicant: Sang Hoon KIM , Gyungock Kim , In Gyoo Kim , JiHo Joo , Ki Seok Jang
Inventor: Sang Hoon KIM , Gyungock Kim , In Gyoo Kim , JiHo Joo , Ki Seok Jang
IPC: H01L31/102 , H01L31/18
CPC classification number: H01L31/102 , H01L31/18
Abstract: Provided are light detection devices and methods of manufacturing the same. The light detection device includes a first conductive pattern on a surface of a substrate, an insulating pattern on the substrate and having an opening exposing at least a portion of the first conductive pattern, a light absorbing layer filling the opening of the insulating pattern and having a top surface disposed at a level substantially higher than a top surface of the insulating pattern, a second conductive pattern on the light absorbing layer, and connecting terminals electrically connected to the first and second conductive patterns, respectively.
Abstract translation: 提供了光检测装置及其制造方法。 光检测装置包括在基板的表面上的第一导电图案,在基板上的绝缘图案,并且具有露出第一导电图案的至少一部分的开口,填充绝缘图案的开口的光吸收层,并且具有 设置在基本上高于绝缘图案的顶表面的高度的顶表面,在光吸收层上的第二导电图案,以及分别电连接到第一和第二导电图案的连接端子。
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4.
公开(公告)号:US08948224B2
公开(公告)日:2015-02-03
申请号:US13545889
申请日:2012-07-10
Applicant: In Gyoo Kim , Gyungock Kim , Sang Hoon Kim , JiHo Joo , Ki Seok Jang
Inventor: In Gyoo Kim , Gyungock Kim , Sang Hoon Kim , JiHo Joo , Ki Seok Jang
IPC: H01L21/00
CPC classification number: H01S5/021 , H01S3/0637 , H01S5/0205 , H01S5/026 , H01S5/028 , H01S5/1032 , H01S5/125 , H01S5/2272 , H01S5/3027
Abstract: The inventive concept provides semiconductor laser devices and methods of fabricating the same. According to the method, a silicon-crystalline germanium layer for emitting a laser may be formed in a selected region by a selective epitaxial growth (SEG) method. Thus, surface roughness of both ends of a Fabry Perot cavity formed of the silicon-crystalline germanium layer may be reduced or minimized, and a cutting process and a polishing process may be omitted in the method of fabricating the semiconductor laser device.
Abstract translation: 本发明构思提供了半导体激光器件及其制造方法。 根据该方法,可以通过选择性外延生长(SEG)法在选择的区域中形成用于发射激光的硅晶锗层。 因此,可以减少或最小化由硅晶锗层形成的法布里珀罗腔的两端的表面粗糙度,并且在制造半导体激光器件的方法中可以省略切割工艺和抛光工艺。
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5.
公开(公告)号:US08928107B2
公开(公告)日:2015-01-06
申请号:US13284818
申请日:2011-10-28
Applicant: Sang Hoon Kim , Gyungock Kim , In Gyoo Kim , JiHo Joo , Ki Seok Jang
Inventor: Sang Hoon Kim , Gyungock Kim , In Gyoo Kim , JiHo Joo , Ki Seok Jang
IPC: H01L31/06 , H01L31/102 , H01L31/18
CPC classification number: H01L31/102 , H01L31/18
Abstract: Provided are light detection devices and methods of manufacturing the same. The light detection device includes a first conductive pattern on a surface of a substrate, an insulating pattern on the substrate and having an opening exposing at least a portion of the first conductive pattern, a light absorbing layer filling the opening of the insulating pattern and having a top surface disposed at a level substantially higher than a top surface of the insulating pattern, a second conductive pattern on the light absorbing layer, and connecting terminals electrically connected to the first and second conductive patterns, respectively.
Abstract translation: 提供了光检测装置及其制造方法。 光检测装置包括在基板的表面上的第一导电图案,在基板上的绝缘图案,并且具有露出第一导电图案的至少一部分的开口,填充绝缘图案的开口的光吸收层,并且具有 设置在基本上高于绝缘图案的顶表面的高度的顶表面,在光吸收层上的第二导电图案,以及分别电连接到第一和第二导电图案的连接端子。
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