公开(公告)号：US20150099433A1

公开(公告)日：2015-04-09

申请号：US14501733

申请日：2014-09-30

申请人： EBARA CORPORATION

发明人： Hideaki TANAKA

IPC分类号： H01L21/67 ,  B08B1/00

CPC分类号： H01L21/67046 ,  B08B1/04 ,  H01L21/67051 ,  H01L21/68728

摘要： A substrate cleaning apparatus for reducing a limitation of a layout of a chemical liquid nozzle and a rinsing liquid nozzle, while enabling a load cell to be installed at an optimal location and achieving a larger adjustment range, is disclosed. The substrate cleaning apparatus includes a roll assembly including at least a roll cleaning member to be brought into contact with a substrate and a roll arm that rotatably supports the roll cleaning member, a support arm for supporting the roll assembly; an adjustment screw extending through the support arm and screwed into the roll assembly; and a screw support that fixes a relative position of the adjustment screw in a vertical direction with respect to the support arm and rotatably supports the adjustment screw.

摘要翻译： 公开了一种用于减少化学液体喷嘴和冲洗液体喷嘴的布局限制的基板清洁装置，同时使测压元件能够安装在最佳位置并实现更大的调节范围。 基板清洗装置包括：辊组件，其至少包括与基板接触的辊清洁部件和可旋转地支撑辊清洁部件的辊臂，支撑辊组件的支撑臂; 调节螺钉，其延伸穿过所述支撑臂并拧入所述辊组件; 以及螺钉支撑件，其将调节螺钉的相对于支撑臂的垂直方向的相对位置固定，并可旋转地支撑调节螺钉。

公开(公告)号：US20140116466A1

公开(公告)日：2014-05-01

申请号：US14061686

申请日：2013-10-23

申请人： Ebara Corporation

发明人： Koji Maeda ,  Soichi ISOBE ,  Hiroshi SHIMOMOTO ,  Hideaki TANAKA

IPC分类号： H01L21/02 ,  H01L21/66

CPC分类号： H01L21/02057 ,  H01L21/67046

摘要： A substrate cleaning apparatus performs scrub cleaning of a surface of a substrate with an elongated cylindrical roll cleaning member. The substrate cleaning apparatus includes a roll holder for supporting the cleaning member and rotate the roll cleaning member, a vertical movement mechanism for vertically moving the roll holder so that the roll cleaning member applies a roll load to the substrate at the time of cleaning the substrate by actuation of an actuator having a regulating device, a load cell for measuring the roll load, and a controller for performing feedback control of the roll load through the regulating device based on the measured value of the load cell. The substrate cleaning apparatus further includes a monitor unit for monitoring whether an operation amount of the regulating device falls outside an allowable range of a preset reference value of an operation amount corresponding to a preset roll load.

摘要翻译： 基板清洁装置用细长的圆筒形辊清洁构件进行基板表面的擦洗清洁。 基板清洗装置包括用于支撑清洁部件并旋转辊清洁部件的辊保持器，用于使辊保持器垂直移动的垂直移动机构，使得辊清洁部件在清洁基板时向基板施加辊荷载 通过具有调节装置的致动器的致动器，用于测量辊荷载的测力传感器，以及控制器，用于根据称重传感器的测量值对通过调节装置的辊载荷进行反馈控制。 基板清洗装置还包括监视单元，用于监视调节装置的操作量是否超出对应于预设滚动载荷的操作量的预设基准值的允许范围。

公开(公告)号：US20160243593A1

公开(公告)日：2016-08-25

申请号：US15045045

申请日：2016-02-16

申请人： EBARA CORPORATION

发明人： Hideaki TANAKA

IPC分类号： B08B1/00 ,  B08B3/08 ,  B08B3/02 ,  H01L21/306 ,  B24B37/11 ,  H01L21/67 ,  H01L21/687 ,  H01L21/02 ,  B08B1/04 ,  B08B5/04

CPC分类号： B08B1/001 ,  B08B1/007 ,  B08B1/04 ,  B24B37/11 ,  H01L21/67046

摘要： A substrate cleaning apparatus for cleaning a substrate while rotating the substrate and placing a cleaning member in contact with the rotating substrate is disclosed. The substrate cleaning apparatus comprises: a self-cleaning member mounted to an arm supporting the cleaning member, the self-cleaning member being configured to come into contact with the cleaning member to perform self-cleaning of the cleaning member; and a moving mechanism mounted to the arm supporting the cleaning member, the moving mechanism being configured to move the self-cleaning member between a position where the self-cleaning member is in contact with the cleaning member and a position where the self-cleaning member is separated from the cleaning member.

摘要翻译： 公开了一种用于在旋转基板并且将清洁构件与旋转基板接触的同时清洁基板的基板清洁装置。 基板清洗装置包括：安装到支撑清洁部件的臂的自清洁部件，所述自清洁部件构造成与所述清洁部件接触以进行所述清洁部件的自清洁; 以及安装到支撑清洁构件的臂的移动机构，所述移动机构构造成在自清洁构件与清洁构件接触的位置和自清洁构件的位置之间移动自清洁构件 与清洁部件分离。

公开(公告)号：US20180240687A1

公开(公告)日：2018-08-23

申请号：US15956297

申请日：2018-04-18

申请人： EBARA CORPORATION

发明人： Hideaki TANAKA

IPC分类号： H01L21/67 ,  H01L21/02 ,  B08B1/04 ,  A46B13/00 ,  B08B1/00 ,  A46B15/00

摘要： A substrate cleaning apparatus for performing scrub cleaning of a surface of a substrate by rotating both of the substrate and a roll cleaning member while keeping the roll cleaning member in contact with the surface. The apparatus includes a roll holder configured to support and rotate a roll cleaning member, a vertical movement mechanism, having a vertically movable unit vertically movable by actuating an actuator having a regulating device, configured to vertically move the roll holder coupled to the vertically movable unit so the roll cleaning member applies a roll load to the substrate W while cleaning the substrate. A load cell provided between the vertically movable unit of the vertical movement mechanism and the roll holder is configured to measure the roll load. A controller is configured to perform feedback control of the roll load through the regulating device based on a measured value of the load cell.

公开(公告)号：US20170271178A1

公开(公告)日：2017-09-21

申请号：US15616582

申请日：2017-06-07

申请人： EBARA CORPORATION

发明人： Koji MAEDA ,  Soichi ISOBE ,  Hiroshi SHIMOMOTO ,  Hideaki TANAKA

IPC分类号： H01L21/67 ,  H01L21/02

CPC分类号： H01L21/02057 ,  H01L21/67046

摘要： A substrate cleaning apparatus performs scrub cleaning of a surface of a substrate with an elongated cylindrical roll cleaning member. The substrate cleaning apparatus includes a roll holder for supporting the cleaning member and rotate the roll cleaning member, a vertical movement mechanism for vertically moving the roll holder so that the roll cleaning member applies a roll load to the substrate at the time of cleaning the substrate by actuation of an actuator having a regulating device, a load cell for measuring the roll load, and a controller for performing feedback control of the roll load through the regulating device based on the measured value of the load cell. The substrate cleaning apparatus further includes a monitor unit for monitoring whether an operation amount of the regulating device falls outside an allowable range of a preset reference value of an operation amount corresponding to a preset roll load.