公开(公告)号：US20220134506A1

公开(公告)日：2022-05-05

申请号：US17511944

申请日：2021-10-27

Applicant: EBARA CORPORATION

Inventor： Yuichi Kato ,  Osamu Nabeya

IPC: B24B37/20

Abstract: A polishing head capable of preventing contact between both side walls of an elastic membrane when a negative pressure is formed in a pressure chamber formed by the elastic membrane. The polishing head includes: a first elastic membrane configured to press the workpiece against the polishing pad; a retainer ring surrounding the first elastic membrane; a second elastic membrane configured to press the retainer ring against the polishing pad; a carrier to which the first elastic membrane is secured; and an attachment member arranged in a pressure chamber formed by the second elastic membrane and fixing the second elastic membrane to the carrier. The attachment member has a support portion extending toward the retainer ring along a side wall of the second elastic membrane.

公开(公告)号：USD1021832S1

公开(公告)日：2024-04-09

申请号：US29874375

申请日：2023-04-19

Applicant: EBARA CORPORATION

Designer： Kenichi Akazawa ,  Osamu Nabeya ,  Shingo Togashi ,  Satoru Yamaki ,  Tomoko Owada ,  Cheng Cheng ,  Yuichi Kato

Abstract: FIG. 1 is a top perspective view of an elastic membrane showing our new design;
FIG. 2 is a bottom perspective view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is a front view thereof, a rear view being identical thereto;
FIG. 6 is a right-side view thereof, a left-side view being identical thereto;
FIG. 7 is a cross sectional view taken along section line 7-7 in FIG. 3; and,
FIG. 8 is an enlarged portion view taken along line 8-8 in FIG. 7.
The broken lines in the drawings depict portions of the elastic membrane that form no part of the claimed design.

公开(公告)号：USD981969S1

公开(公告)日：2023-03-28

申请号：US29794758

申请日：2021-06-15

Applicant: EBARA CORPORATION

Designer： Kenichi Akazawa ,  Tomoko Owada ,  Osamu Nabeya ,  Makoto Fukushima ,  Yuichi Kato

公开(公告)号：US11752590B2

公开(公告)日：2023-09-12

申请号：US17511944

申请日：2021-10-27

Applicant: EBARA CORPORATION

Inventor： Yuichi Kato ,  Osamu Nabeya

IPC: B24B37/20 ,  B24B37/30

CPC classification number: B24B37/20 ,  B24B37/30

Abstract: A polishing head capable of preventing contact between both side walls of an elastic membrane when a negative pressure is formed in a pressure chamber formed by the elastic membrane. The polishing head includes: a first elastic membrane configured to press the workpiece against the polishing pad; a retainer ring surrounding the first elastic membrane; a second elastic membrane configured to press the retainer ring against the polishing pad; a carrier to which the first elastic membrane is secured; and an attachment member arranged in a pressure chamber formed by the second elastic membrane and fixing the second elastic membrane to the carrier. The attachment member has a support portion extending toward the retainer ring along a side wall of the second elastic membrane.

公开(公告)号：USD989012S1

公开(公告)日：2023-06-13

申请号：US29774336

申请日：2021-03-16

Applicant: EBARA CORPORATION

Designer： Kenichi Akazawa ,  Osamu Nabeya ,  Shingo Togashi ,  Satoru Yamaki ,  Tomoko Owada ,  Cheng Cheng ,  Yuichi Kato

Abstract: FIG. 1 is a top perspective view of an elastic membrane showing our new design;
FIG. 2 is a bottom perspective view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is a front view thereof, a rear view being identical thereto;
FIG. 6 is a right-side view thereof, a left-side view being identical thereto;
FIG. 7 is a cross sectional view taken along section line 7-7 in FIG. 3; and,
FIG. 8 is an enlarged portion view take along line 8-8 of FIG. 7.
The broken lines in the drawings depict portions of the elastic membrane that form no part of the claimed design.