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    Structured abrasive article and method of making and using the same
    1.
    发明授权
    Structured abrasive article and method of making and using the same 有权
    结构磨料制品及其制造和使用方法

    公开(公告)号：US07410413B2

    公开(公告)日：2008-08-12

    申请号：US11380444

    申请日：2006-04-27

    申请人： Edward J. Woo ,  Craig F. Lamphere ,  Gregory A. Koehnle

    发明人： Edward J. Woo ,  Craig F. Lamphere ,  Gregory A. Koehnle

    IPC分类号： B24D11/00

    CPC分类号： B24D11/001 ,  B24D2203/00

    摘要： A structured abrasive article comprises a backing, a structured abrasive layer affixed to the backing, the structured abrasive layer comprising: a plurality of raised abrasive regions, each raised abrasive region consisting essentially of a close-packed plurality of pyramidal abrasive composites; and a network consisting essentially of close-packed truncated pyramidal abrasive composites, wherein the network continuously abuts and separates the raised abrasive regions from one another. The height of the pyramidal abrasive composites is greater than the height of the truncated pyramidal abrasive composites. Methods of making and using the same are also disclosed.

    摘要翻译： 结构化磨料制品包括背衬，固定到背衬上的结构化磨料层，所述结构化研磨层包括：多个凸起的磨料区域，每个凸起的磨料区域基本上由紧密堆积的多个金字塔形磨料复合材料组成; 以及基本上由紧密堆积的截顶锥形磨料复合材料组成的网络，其中网络将凸起的磨料区域彼此连续地邻接和分离。 锥体磨料复合材料的高度大于截顶棱锥磨料复合材料的高度。 还公开了制备和使用它们的方法。

    ROTARY BUFFING PAD
    3.
    发明申请
    ROTARY BUFFING PAD 审中-公开
    旋转缓冲垫

    公开(公告)号：US20120258652A1

    公开(公告)日：2012-10-11

    申请号：US13497621

    申请日：2010-11-09

    申请人： Gregory A. Koehnle ,  Scott R. Culler ,  Brant A. Moegenburg ,  Schoen A. Schuknecht ,  Edward J. Woo

    发明人： Gregory A. Koehnle ,  Scott R. Culler ,  Brant A. Moegenburg ,  Schoen A. Schuknecht ,  Edward J. Woo

    IPC分类号： B24D13/14

    CPC分类号： B24B37/26

    摘要： Provided is a flat-faced buffing pad that includes a plurality of apertures of variable size. The apertures are generally larger in the areas toward the center of the pad, while being generally smaller in the areas toward the periphery of the pad. Some embodiments further include apertures disposed along one or more concentric circular rings located along the front surface and generally symmetrical about the rotation axis. These configurations of apertures provide both superior cut performance and superior finish. Moreover, these configurations minimize several undesirable aspects in a polishing operation, such as slinging of the polishing compound, vibration, wobbling, and drag felt by the operator as the rotary pad slides across the surface to be polished.

    摘要翻译： 提供了一种平面抛光垫，其包括多个可变尺寸的孔。 在朝向垫的中心的区域中，孔通常较大，而在朝向垫周边的区域中通常较小。 一些实施例还包括沿着沿着前表面定位并且围绕旋转轴线大致对称的一个或多个同心圆环设置的孔。 孔的这些构造提供了优异的切割性能和优异的光洁度。 此外，这些构造使抛光操作中的几个不期望的方面最小化，例如当旋转垫滑过待抛光表面时抛光化合物的吊带，振动，摆动和由操作者感到的阻力。

    Coated abrasive article
    4.
    发明授权
    Coated abrasive article 有权
    涂层磨料制品

    公开(公告)号：US06773474B2

    公开(公告)日：2004-08-10

    申请号：US10125938

    申请日：2002-04-19

    申请人： Gregory A. Koehnle ,  Edward J. Woo

    发明人： Gregory A. Koehnle ,  Edward J. Woo

    IPC分类号： B24D300

    CPC分类号： B24D3/28 ,  B24D3/344 ,  C08F290/061 ,  C08L63/00

    摘要： Coated abrasive articles comprise a backing and an abrasive layer, and optionally at least one of a backsize layer, tie layer, supersize layer, presize layer, or saturant. The coated abrasive article comprises a reaction product of components comprising: polyfunctional acrylate; polyfunctional cationically polymerizable material; free radical photoinitiator; triarylsulfonium salt having the formula wherein R1, R2 and R3 independently represent an, optionally substituted, aromatic group having from about 4 to about 20 carbon atoms, and Y− represents a non-interfering anion; and quaternary ammonium salt having the formula wherein X− is a non-interfering anion.

    摘要翻译： 涂覆的磨料制品包括背衬和研磨层，以及可选地，背板，连结层，超大层，预浸层或饱和剂中的至少一种。 涂覆的磨料制品包含组分的反应产物，其包含：多官能丙烯酸酯;多官能阳离子聚合材料;自由基光引发剂;具有式R 1，R 2和R 3的三芳基锍盐独立地表示任选取代的， 具有约4至约20个碳原子的芳族基团，Y 1表示非干扰性阴离子; 具有甲酰氧基X'的季铵盐是一种非干扰性阴离子。

    STRUCTURED ABRASIVE WITH OVERLAYER, AND METHOD OF MAKING AND USING THE SAME
    5.
    发明申请
    STRUCTURED ABRASIVE WITH OVERLAYER, AND METHOD OF MAKING AND USING THE SAME 有权
    用OVERLAYER进行结构磨蚀，以及制造和使用它们的方法

    公开(公告)号：US20090017727A1

    公开(公告)日：2009-01-15

    申请号：US11777701

    申请日：2007-07-13

    申请人： Joseph G. Pribyl ,  Karunasena Alahapperuma ,  Craig F. Lamphere ,  Edward J. Woo

    发明人： Joseph G. Pribyl ,  Karunasena Alahapperuma ,  Craig F. Lamphere ,  Edward J. Woo

    IPC分类号： B24B1/00 ,  C09K3/14

    CPC分类号： B24D18/00 ,  B24D3/28 ,  B24D3/34

    摘要： A structured abrasive article comprises a backing with a topographically structured abrasive layer secured thereto. The topographically structured abrasive layer comprises precisely-shaped abrasive composites. A solid overlayer comprising eroding particles with a Mohs scale hardness of at least 4 and a water-soluble polymer is disposed on at least a portion of the topographically structured abrasive layer. Methods of making and using the structured abrasive articles are also disclosed.

    摘要翻译： 结构化的磨料制品包括具有固定到其上的结构化研磨层的背衬。 地形结构的研磨层包括精确成形的磨料复合材料。 包括侵蚀莫氏硬度至少为4的颗粒和水溶性聚合物的固体覆层设置在至少部分地形构造的磨料层上。 还公开了制造和使用结构化磨料制品的方法。

    Abrasive article and methods of making same
    8.
    发明授权
    Abrasive article and methods of making same 有权
    磨料制品及其制作方法

    公开(公告)号：US07329175B2

    公开(公告)日：2008-02-12

    申请号：US11321505

    申请日：2005-12-29

    申请人： Edward J. Woo ,  Thomas W. Rambosek ,  Curtis J. Schmidt

    发明人： Edward J. Woo ,  Thomas W. Rambosek ,  Curtis J. Schmidt

    IPC分类号： B24D11/00

    CPC分类号： B24D11/02

    摘要： A porous abrasive article that allows air and dust particles to pass through. The abrasive article has a screen abrasive and a porous attachment interface. The screen abrasive has an abrasive layer comprising a plurality of erectly oriented abrasive particles and at least one binder. The porous attachment interface cooperates with the screen abrasive to allow the flow of particles through the abrasive article.

    摘要翻译： 允许空气和灰尘颗粒通过的多孔磨料制品。 磨料制品具有筛网研磨剂和多孔附着界面。 筛网研磨剂具有包括多个直立取向的磨料颗粒和至少一个粘合剂的研磨层。 多孔附着界面与筛网研磨剂配合使颗粒流过磨料制品。

    Release layer for photoreceptors
    10.
    发明授权
    Release layer for photoreceptors 失效
    光感受器释放层

    公开(公告)号：US5733698A

    公开(公告)日：1998-03-31

    申请号：US724073

    申请日：1996-09-30

    申请人： Gaye K. Lehman ,  Claire A. Jalbert ,  Edward J. Woo ,  Kathryn R. Bretscher ,  James A. Baker ,  Mark C. Berens

    发明人： Gaye K. Lehman ,  Claire A. Jalbert ,  Edward J. Woo ,  Kathryn R. Bretscher ,  James A. Baker ,  Mark C. Berens

    IPC分类号： G03G5/147

    CPC分类号： G03G5/14773 ,  G03G5/147 ,  G03G5/14704 ,  G03G5/14708 ,  G03G5/14721 ,  G03G5/14726 ,  G03G5/14734

    摘要： The invention is photoconductor construction comprising a release layer which controls the carrier liquid on the surface of the photoreceptor and minimizes beading of toner carrier liquid. According to one embodiment this invention is a photoconductor construction comprising a photoconductor layer applied to an electroconductive substrate, an interlayer applied to the photoconductor layer, and a release layer over the interlayer. The release layer is a swellable polymer. According to another embodiment this invention is a photoconductor construction comprising a polymeric release layer that has a surface with an average roughness, Ra, of at least 10 nm.

    摘要翻译： 本发明是光电导体结构，其包括释放层，其控制感光体表面上的载体液体并使调色剂载体液体的珠粒最小化。 根据一个实施例，本发明是一种光电导体结构，其包括施加到导电基底的光电导体层，施加到光电导体层的中间层，以及中间层上的释放层。 脱模层是可溶胀聚合物。 根据另一个实施方案，本发明是一种光电导体结构，其包含具有至少10nm的平均粗糙度Ra的表面的聚合物释放层。