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公开(公告)号:US20200080549A1
公开(公告)日:2020-03-12
申请号:US16462615
申请日:2017-11-23
Applicant: Edwards Limited
Inventor: Michael Andrew Galtry , Christopher Mark Bailey
Abstract: A vacuum pumping arrangement comprises a first pump which has a first inlet and a first outlet. The first inlet is fluidly connected to a first common pumping line. The first common pumping line includes a plurality of first pumping line inlets each of which is fluidly connectable to a least one process chamber within a group of process chambers that form a semiconductor fabrication tool. The vacuum pumping arrangement also includes a reserve pump which has a reserve inlet and a reserve outlet. The reserve inlet is selectively fluidly connectable to each process chamber within the group of process chambers that form the semiconductor fabrication tool. The vacuum pumping arrangement additionally includes a controller which is configured to selectively fluidly isolate the pump from one or more given process chambers and selectively fluidly connect the reserve pump with the said one or more given process chambers.
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公开(公告)号:US12288696B2
公开(公告)日:2025-04-29
申请号:US18005753
申请日:2021-07-22
Applicant: Edwards Limited
Inventor: Christopher Mark Bailey , Michael Andrew Galtry
Abstract: A kit of parts for forming a foreline for coupling a process chamber to a vacuum pumping and/or abatement system, the kit comprising: a plurality of foreline segments; wherein each foreline segment is a pipe that comprises: a first substantially straight end portion; a second substantially straight end portion opposite to the first end portion; and an intermediate portion disposed between the first and second end portions and connected to the first and second end portions by respective bends; the first and second end portions are substantially parallel to each other; the intermediate portion is oblique to the first and second end portions; and the foreline segments are configured to be attached together so as to form a continuous foreline.
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公开(公告)号:US11971041B2
公开(公告)日:2024-04-30
申请号:US17629602
申请日:2020-07-24
Applicant: Edwards Limited
Inventor: Michael Andrew Galtry , Miles Geoffery Hockliffe
CPC classification number: F04D19/04 , F04D17/168 , F04D19/044 , F04D29/32
Abstract: A drag pump for pumping fluid from an inlet to an outlet includes a stator and a rotor. One of the stator or rotor includes a disc having a plurality of channels each of the channels extending from an inlet portion of the disc at or close to an inlet edge towards an outlet portion at or close to an outlet edge. The plurality of channels each has walls for guiding fluid flow from the inlet edge to the outlet edge in response to relative motion between the stator and the rotor. The disc further includes a plurality of protrusions extending from the channels, each of the protrusions being arranged to divide a channel at the inlet or the outlet end of the channel, into sub-channels that extend for a portion of a length of the channel and do not extend for a whole length of the channel.
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公开(公告)号:US11933284B2
公开(公告)日:2024-03-19
申请号:US17297807
申请日:2019-11-27
Applicant: Edwards Limited
Inventor: Nigel Paul Schofield , Christopher Mark Bailey , Michael Andrew Galtry , Andrew David Mann
CPC classification number: F04B37/14 , F04B41/06 , F04B49/007 , F04D13/12 , F04D19/042 , F04D25/16 , F04D27/005
Abstract: A vacuum exhaust system includes a plurality of turbo pumps that evacuate a plurality of vacuum chambers. A plurality of chamber valves are positioned between the turbo pumps and the plurality of vacuum chambers. A plurality of branch channels are each connected to a corresponding exhaust of the plurality of turbo pumps and a main channel is formed from a confluence of the branch channels. A booster vacuum pump is connected to the main channel. A backing vacuum pump is connected to an exhaust of the booster vacuum pump. A plurality of bypass channels, each having a valve, provide a fluid communication path between at least some of the plurality of vacuum chambers and the booster vacuum pump.
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公开(公告)号:US20230307253A1
公开(公告)日:2023-09-28
申请号:US18005753
申请日:2021-07-22
Applicant: Edwards Limited
Inventor: Christopher Mark Bailey , Michael Andrew Galtry
CPC classification number: H01L21/67017 , F16L9/22 , F16L9/20
Abstract: A kit of parts for forming a foreline for coupling a process chamber to a vacuum pumping and/or abatement system, the kit comprising: a plurality of foreline segments; wherein each foreline segment is a pipe that comprises: a first substantially straight end portion; a second substantially straight end portion opposite to the first end portion; and an intermediate portion disposed between the first and second end portions and connected to the first and second end portions by respective bends; the first and second end portions are substantially parallel to each other; the intermediate portion is oblique to the first and second end portions; and the foreline segments are configured to be attached together so as to form a continuous foreline.
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公开(公告)号:US20220299036A1
公开(公告)日:2022-09-22
申请号:US17629602
申请日:2020-07-24
Applicant: Edwards Limited
Inventor: Michael Andrew Galtry , Miles Geoffery Hockliffe
Abstract: A drag pump for pumping fluid from an inlet to an outlet includes a stator and a rotor. One of the stator or rotor includes a disc having a plurality of channels each of the channels extending from an inlet portion of the disc at or close to an inlet edge towards an outlet portion at or close to an outlet edge. The plurality of channels each has walls for guiding fluid flow from the inlet edge to the outlet edge in response to relative motion between the stator and the rotor. The disc further includes a plurality of protrusions extending from the channels, each of the protrusions being arranged to divide a channel at the inlet or the outlet end of the channel, into sub-channels that extend for a portion of a length of the channel and do not extend for a whole length of the channel.
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公开(公告)号:US20220010788A1
公开(公告)日:2022-01-13
申请号:US17297807
申请日:2019-11-27
Applicant: Edwards Limited
Inventor: Nigel Paul Schofield , Christopher Mark Bailey , Michael Andrew Galtry , Andrew David Mann
Abstract: A vacuum exhaust system includes a plurality of low pressure vacuum pumps that operate in a molecular flow region and evacuate a plurality of vacuum chambers. A plurality of chamber valves are positioned between the low pressure vacuum pumps and the plurality of vacuum chambers. A plurality of branch channels are each connected to a corresponding exhaust of the plurality of low pressure vacuum pumps and a main channel is formed from a confluence of the branch channels. An intermediate vacuum pump is connected to the main channel and operates in a viscous flow region. A higher pressure vacuum pump operates in a higher pressure viscous flow region and is connected to an exhaust of the intermediate pressure vacuum pump. A plurality of bypass channels, each having a valve, provide a fluid communication path between at least some of the plurality of vacuum chambers and a higher pressure vacuum pump.
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公开(公告)号:US11187222B2
公开(公告)日:2021-11-30
申请号:US16462615
申请日:2017-11-23
Applicant: Edwards Limited
Inventor: Michael Andrew Galtry , Christopher Mark Bailey
Abstract: A vacuum pumping arrangement comprises a first pump which has a first inlet and a first outlet. The first inlet is fluidly connected to a first common pumping line. The first common pumping line includes a plurality of first pumping line inlets each of which is fluidly connectable to a least one process chamber within a group of process chambers that form a semiconductor fabrication tool. The vacuum pumping arrangement also includes a reserve pump which has a reserve inlet and a reserve outlet. The reserve inlet is selectively fluidly connectable to each process chamber within the group of process chambers that form the semiconductor fabrication tool. The vacuum pumping arrangement additionally includes a controller which is configured to selectively fluidly isolate the pump from one or more given process chambers and selectively fluidly connect the reserve pump with the said one or more given process chambers.
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