Barrier film and method of manufacturing the same
    6.
    发明授权
    Barrier film and method of manufacturing the same 有权
    阻隔膜及其制造方法

    公开(公告)号:US08828528B2

    公开(公告)日:2014-09-09

    申请号:US13271434

    申请日:2011-10-12

    摘要: A barrier film includes a base which is formed of a plastic film having a first surface and a second surface opposed to the first surface, a first barrier layer which is formed on the first surface by an atomic layer deposition method and is made of an inorganic material having a water vapor barrier property; and a second barrier layer which is formed on the second surface by an atomic layer deposition method and is made of an inorganic material having a water vapor barrier property.

    摘要翻译: 阻挡膜包括由具有第一表面和与第一表面相对的第二表面的塑料膜形成的基底,通过原子层沉积方法形成在第一表面上的第一阻挡层,并且由无机 具有水蒸气阻隔性的材料; 以及通过原子层沉积法形成在第二表面上并由具有水蒸气阻隔性的无机材料制成的第二阻挡层。

    BARRIER FILM AND METHOD OF MANUFACTURING THE SAME
    7.
    发明申请
    BARRIER FILM AND METHOD OF MANUFACTURING THE SAME 有权
    遮蔽膜及其制造方法

    公开(公告)号:US20120107586A1

    公开(公告)日:2012-05-03

    申请号:US13271434

    申请日:2011-10-12

    IPC分类号: B32B9/04 C23C16/06 B32B7/02

    摘要: A barrier film includes a base which is formed of a plastic film having a first surface and a second surface opposed to the first surface, a first barrier layer which is formed on the first surface by an atomic layer deposition method and is made of an inorganic material having a water vapor barrier property; and a second barrier layer which is formed on the second surface by an atomic layer deposition method and is made of an inorganic material having a water vapor barrier property.

    摘要翻译: 阻挡膜包括由具有第一表面和与第一表面相对的第二表面的塑料膜形成的基底,通过原子层沉积方法形成在第一表面上的第一阻挡层,并且由无机 具有水蒸气阻隔性的材料; 以及通过原子层沉积法形成在第二表面上并由具有水蒸气阻隔性的无机材料制成的第二阻挡层。

    FILM FORMING APPARATUS AND FILM FORMING METHOD
    8.
    发明申请
    FILM FORMING APPARATUS AND FILM FORMING METHOD 审中-公开
    薄膜成型装置和薄膜成型方法

    公开(公告)号:US20110159186A1

    公开(公告)日:2011-06-30

    申请号:US12975492

    申请日:2010-12-22

    摘要: The present invention provides a film forming apparatus and a film forming method realizing improvement in the degree of freedom in film formation while suppressing production cost. While conveying a base material by using a plurality of guide rolls, film formation is performed by atomic layer deposition by outputting precursor gases to the base material by a plurality of ALD heads. The ALD heads are disposed so as to individually face the guide rolls so that the precursor gases are locally output to the base material. The amount of the precursor gases used is reduced more than that in a related art, and the variety of kinds of the usable precursor gases is widened.

    摘要翻译: 本发明提供了一种在抑制生产成本的同时实现成膜自由度的提高的成膜装置和成膜方法。 在通过使用多个导辊输送基材的同时,通过原子层沉积通过多个ALD头将母体气体输出到基材进行成膜。 ALD头被设置成分别面向导辊,使得前体气体局部地输出到基底材料。 所使用的前体气体的量比现有技术中减少了多少,并且可用的前体气体的种类多种多样。