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    RETICLE POD
    2.
    发明申请
    RETICLE POD 有权

    公开(公告)号：US20140183076A1

    公开(公告)日：2014-07-03

    申请号：US14139653

    申请日：2013-12-23

    Applicant: Entegris, Inc.

    Inventor： Steven P. Kolbow ,  Kevin McMullen ,  Anthony M. Tieben ,  Matthew Kusz ,  David L. Halbmaier ,  John Lystad

    IPC: B65D85/48

    CPC classification number: B65D85/48 ,  G03F1/66 ,  H01L21/67353 ,  H01L21/67359 ,  H01L21/67383 ,  H01L21/67386

    Abstract: A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.

    Abstract translation: 一个双重安全壳，具有一个外舱和一个提供支撑结构和环境控制装置的内舱。 内部容器包括具有平坦的抛光表面的基部，该表面具有突出部，所述掩模版位于所述底部上并且在所述掩模版和抛光表面之间提供间隙。 该间隙将掩模版与基底的平坦抛光表面分开，并且其尺寸被设计成抑制颗粒迁移到间隙中，从而防止晶片或掩模版的敏感表面的污染。 内部容器的顶盖位于靠近基座周边的抛光表面上。 内部容器的顶盖上的可移动的标线接合销与外部容器的顶盖接合，当内部容器组装在外部容器内部时，提供掩模版限制。

    RETICLE POD WITH COVER TO BASEPLATE ALIGNMENT SYSTEM
    3.
    发明申请
    RETICLE POD WITH COVER TO BASEPLATE ALIGNMENT SYSTEM 有权
    带有盖子的底板与基座对准系统

    公开(公告)号：US20150266660A1

    公开(公告)日：2015-09-24

    申请号：US14437121

    申请日：2013-10-17

    Applicant: ENTEGRIS, INC.

    Inventor： John Lystad ,  Steven P. Kolbow

    IPC: B65D85/48 ,  H01L21/673 ,  B65D43/02 ,  B65D25/10 ,  B65D25/14

    CPC classification number: B65D85/48 ,  B65D25/10 ,  B65D25/14 ,  B65D43/02 ,  G03F1/66 ,  H01L21/67353 ,  H01L21/67359 ,  H01L21/67373 ,  H01L21/67383 ,  H01L21/67386 ,  Y10T29/49895

    Abstract: An alignment system for aligning the cover and base of an inner pod of a reticle carrier. The cover and base can each be provided with hard planar surface seal zones on the bottom surface and the top surface, respectively. The cover of the inner pod may be provided with a through hole or a blind hole into which an alignment pin is disposed. The base is provided with a guide recess to receive the distal end of the alignment pin. The alignment pin operates to limit contact surface area between the cover and the base during that is in sliding contact, thus inhibiting particulate generation. Low particulate-generating materials, such as stainless steel or polyamide-imide, can also be utilized to further reduce particulate generation. Furthermore, the cover and base can each be unitary without need for fastening components thereto, thereby eliminating clamped surfaces that can entrap and subsequently shed particulates.

    Abstract translation: 对准系统，用于对准掩模载体的内部盒的盖和底座。 盖子和底座可以分别在底面和顶面上设置硬平面表面密封区域。 内部容器的盖可以设置有通孔或盲孔，对准销布置在其中。 底座设置有用于接收对准销的远端的引导凹部。 在滑动接触期间，对准销操作以限制盖和基座之间的接触表面积，从而抑制颗粒的产生。 还可以使用低颗粒产生材料，例如不锈钢或聚酰胺 - 酰亚胺，以进一步减少颗粒产生。 此外，盖和基座可以是单一的，而不需要紧固部件，从而消除夹带和随后脱落的颗粒的夹紧表面。

    Reticle pod
    5.
    发明授权
    Reticle pod 有权

    公开(公告)号：US09745119B2

    公开(公告)日：2017-08-29

    申请号：US14139653

    申请日：2013-12-23

    Applicant: Entegris, Inc.

    Inventor： Steven P. Kolbow ,  Kevin McMullen ,  Anthony M. Tieben ,  Matthew Kusz ,  David L. Halbmaier ,  John Lystad

    IPC: B65D85/48 ,  G03F1/66 ,  H01L21/673

    CPC classification number: B65D85/48 ,  G03F1/66 ,  H01L21/67353 ,  H01L21/67359 ,  H01L21/67383 ,  H01L21/67386

    Abstract: A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.

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