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公开(公告)号：US20070212976A1
公开(公告)日：2007-09-13
申请号：US11374250
申请日：2006-03-13
申请人： Peter McReynolds , Gregory Menk , Benjamin Bonner , Gopalakrishna Prabhu , Erik Rondum , Garlen Leung , Anand Iyer
发明人： Peter McReynolds , Gregory Menk , Benjamin Bonner , Gopalakrishna Prabhu , Erik Rondum , Garlen Leung , Anand Iyer
CPC分类号： B24B21/004 , B24B37/20
摘要： A smart polishing media assembly is provided, along with a polishing system and a method for using the same. In one embodiment, the smart polishing media assembly includes a memory device coupled to a polishing material. The polishing material may be in pad, web or belt form. The memory device generally stores at least one material information, historical use information, and/or conditioning information of the polishing material.
摘要翻译： 提供了一种智能抛光介质组件，以及抛光系统及其使用方法。 在一个实施例中，智能抛光介质组件包括耦合到抛光材料的存储器件。 抛光材料可以是垫，网或带形式。 存储装置通常存储抛光材料的至少一种材料信息，历史使用信息和/或调理信息。
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公开(公告)号：US20070117500A1
公开(公告)日：2007-05-24
申请号：US11626014
申请日：2007-01-23
申请人： BENJAMIN BONNER , Peter Mcreynolds , Gregory Menk , Anand Iyer , Gopalakrishna Prabhu , Erik Rondum , Robert Jackson , Garlen Leung
发明人： BENJAMIN BONNER , Peter Mcreynolds , Gregory Menk , Anand Iyer , Gopalakrishna Prabhu , Erik Rondum , Robert Jackson , Garlen Leung
IPC分类号： B24D11/00
CPC分类号： B24D11/00 , B24B7/228 , B24D2203/00
摘要： A polishing article and method for manufacturing a polishing article for use in a chemical mechanical polishing process is disclosed. The polishing article has a plurality of polishing material tiles separated by grooves formed in or through a polishing material and may be adhesively bound to a base film. The polishing article may include various polygonal tiles and oval shapes formed in the polishing material which allow enhanced slurry retention and ease in rolling from a polishing material supply roll and onto a take-up roll in a web type platen assembly. The polishing article may also include an upper carrier film adapted to minimize delaminating stress placed in an area of the polishing article that is not adapted for polishing. A method and apparatus for manufacturing the various embodiments of the polishing article and a replacement supply roll are also disclosed.
摘要翻译： 公开了一种用于制造用于化学机械抛光工艺的抛光制品的抛光制品和方法。 抛光制品具有由在抛光材料中或通过抛光材料形成的凹槽分开的多个抛光材料砖，并且可以粘合地结合到基膜上。 抛光制品可以包括在抛光材料中形成的各种多边形瓦片和椭圆形形状，其允许增强的浆料保持性并且容易地从研磨材料供给辊滚动到卷筒纸型压板组件中的卷取辊上。 抛光制品还可以包括适于最小化抛光制品的不适于抛光的区域中的分层应力的上载体薄膜。 还公开了用于制造抛光制品和替换供应辊的各种实施例的方法和装置。
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公开(公告)号：US20070197147A1
公开(公告)日：2007-08-23
申请号：US11707549
申请日：2007-02-15
申请人： Erik Rondum , Peter McReynolds , Benjamin Bonner , Gregory Menk , Gopalakrishna Prabhu , Garlen Leung , Anand Iyer
发明人： Erik Rondum , Peter McReynolds , Benjamin Bonner , Gregory Menk , Gopalakrishna Prabhu , Garlen Leung , Anand Iyer
CPC分类号： B24B21/06 , B24B21/04 , B24B21/12 , B24B37/12 , B24B37/205 , B24B37/26 , B24D11/001
摘要： A polishing system is described. The polishing system includes a polishing layer, and a subpad supporting the polishing layer, where the subpad has a spiral groove formed therein.
摘要翻译： 描述了抛光系统。 抛光系统包括抛光层和支撑抛光层的子垫，其中子垫具有形成在其中的螺旋槽。
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公开(公告)号：US20060246831A1
公开(公告)日：2006-11-02
申请号：US11119682
申请日：2005-05-02
申请人： Benjamin Bonner , Peter McReynolds , Gregory Menk , Anand Iyer , Gopalakrishna Prabhu , Erik Rondum , Robert Jackson , Garlen Leung
发明人： Benjamin Bonner , Peter McReynolds , Gregory Menk , Anand Iyer , Gopalakrishna Prabhu , Erik Rondum , Robert Jackson , Garlen Leung
IPC分类号： B24D11/00
CPC分类号： B24D11/00 , B24B7/228 , B24D2203/00
摘要： A polishing article and method for manufacturing a polishing article for use in a chemical mechanical polishing process is disclosed. The polishing article has a plurality of polishing material tiles separated by grooves formed in or through a polishing material and may be adhesively bound to a base film. The polishing article may include various polygonal tiles and oval shapes formed in the polishing material which allow enhanced slurry retention and ease in rolling from a polishing material supply roll and onto a take-up roll in a web type platen assembly. The polishing article may also include an upper carrier film adapted to minimize delaminating stress placed in an area of the polishing article that is not adapted for polishing. A method and apparatus for manufacturing the various embodiments of the polishing article and a replacement supply roll are also disclosed.
摘要翻译： 公开了一种用于制造用于化学机械抛光工艺的抛光制品的抛光制品和方法。 抛光制品具有由在抛光材料中或通过抛光材料形成的凹槽分开的多个抛光材料砖，并且可以粘合地结合到基膜上。 抛光制品可以包括在抛光材料中形成的各种多边形瓦片和椭圆形形状，其允许增强的浆料保持性并且容易地从研磨材料供给辊滚动到卷筒纸型压板组件中的卷取辊上。 抛光制品还可以包括适于最小化抛光制品的不适于抛光的区域中的分层应力的上载体薄膜。 还公开了用于制造抛光制品和替换供应辊的各种实施例的方法和装置。
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公开(公告)号：US20070197141A1
公开(公告)日：2007-08-23
申请号：US11707651
申请日：2007-02-15
申请人： Steven Zuniga , Peter McReynolds , Erik Rondum , Benjamin Bonner , Henry Au , Gregory Menk , Gopalakrishna Prabhu , Anand Iyer , Garlen Leung
发明人： Steven Zuniga , Peter McReynolds , Erik Rondum , Benjamin Bonner , Henry Au , Gregory Menk , Gopalakrishna Prabhu , Anand Iyer , Garlen Leung
CPC分类号： B24B21/06 , B24B21/04 , B24B21/12 , B24B37/12 , B24B37/205 , B24B37/26 , B24D11/001
摘要： A polishing apparatus is described. The polishing apparatus includes a rotatable platen, a drive mechanism to incrementally advance a polishing sheet having a polishing surface in a linear direction across the platen, a subpad on the platen to support the polishing sheet, the subpad having a groove formed therein, and a vacuum source connected to the groove of the subpad and configured to apply a vacuum sufficient to pull portions of the polishing sheet into the groove of the subpad to induce a groove in the polishing surface.
摘要翻译： 描述了抛光装置。 抛光装置包括可旋转压板，驱动机构，用于逐渐推进具有沿着线性方向的研磨表面的抛光片横过压板，压板上的子垫以支撑抛光片，子板具有形成在其中的凹槽，以及 真空源连接到子垫的凹槽，并被配置为施加足以将抛光片的一部分拉入到子垫的凹槽中以在抛光表面中引起凹槽的真空。
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公开(公告)号：US20070197133A1
公开(公告)日：2007-08-23
申请号：US11707548
申请日：2007-02-15
申请人： Gregory Menk , Peter McReynolds , Erik Rondum , Anand Iyer , Gopalakrishna Prabhu , Garlen Leung
发明人： Gregory Menk , Peter McReynolds , Erik Rondum , Anand Iyer , Gopalakrishna Prabhu , Garlen Leung
CPC分类号： B24B21/06 , B24B21/04 , B24B21/12 , B24B37/12 , B24B37/205 , B24B37/26 , B24D11/001
摘要： A method is described. The method includes contacting a non-solid material to a non-linear edge of a sheet of polishing material, and causing the non-solid material to solidify to form a window that contacts the non-linear edge of the polishing material.
摘要翻译： 描述了一种方法。 该方法包括使非固体材料与抛光材料片的非线性边缘接触，并使非固体材料固化以形成接触抛光材料的非线性边缘的窗口。
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公开(公告)号：US20070197134A1
公开(公告)日：2007-08-23
申请号：US11707551
申请日：2007-02-15
申请人： Gregory Menk , Peter McReynolds , Erik Rondum , Anand Iyer , Gopalakrishna Prabhu , Garlen Leung
发明人： Gregory Menk , Peter McReynolds , Erik Rondum , Anand Iyer , Gopalakrishna Prabhu , Garlen Leung
IPC分类号： B24B49/00
CPC分类号： B24B21/06 , B24B21/04 , B24B21/12 , B24B37/12 , B24B37/205 , B24B37/26 , B24D11/001
摘要： A polishing article is described. The polishing article includes an elongated polishing layer, and a transparent carrier layer supporting the polishing layer, where the transparent carrier layer has a projection extending into an aperture in the polishing layer to provide a transparent window in the polishing layer.
摘要翻译： 描述抛光制品。 抛光制品包括细长的抛光层和支撑抛光层的透明载体层，其中透明载体层具有延伸到抛光层中的孔中的突起，以在抛光层中提供透明窗口。
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公开(公告)号：US20070197132A1
公开(公告)日：2007-08-23
申请号：US11707569
申请日：2007-02-15
申请人： Gregory Menk , Steven Zuniga , Erik Rondum , Peter McReynolds , Gopalakrishna Prabhu , Garlen Leung , Anand Iyer
发明人： Gregory Menk , Steven Zuniga , Erik Rondum , Peter McReynolds , Gopalakrishna Prabhu , Garlen Leung , Anand Iyer
IPC分类号： B24B51/00
CPC分类号： B24B21/06 , B24B21/04 , B24B21/12 , B24B37/12 , B24B37/205 , B24B37/26 , B24D11/001
摘要： A method is described. The method includes supporting a polishing sheet having a polishing surface on a subpad having a recess formed therein, applying a vacuum to the recess sufficient to pull portions of the polishing sheet into the recess to induce a recess in the polishing surface, positioning a substrate in a carrier head over the recess in the polishing surface, and lifting the substrate away from the polishing surface while the substrate is positioned over the recess.
摘要翻译： 描述了一种方法。 所述方法包括在具有形成在其中的凹部的子垫上支撑具有抛光表面的抛光片，向所述凹部施加足以将所述抛光片的一部分拉入所述凹部中的真空以在所述抛光表面中引入凹部， 载体头部在抛光表面中的凹部上方，并且当基底定位在凹部上方时，将基底提升离开抛光表面。
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公开(公告)号：US20070197145A1
公开(公告)日：2007-08-23
申请号：US11707750
申请日：2007-02-15
申请人： Gregory Menk , Peter McReynolds , Erik Rondum , Gopalakrishna Prabhu , Anand Iyer , Garlen Leung
发明人： Gregory Menk , Peter McReynolds , Erik Rondum , Gopalakrishna Prabhu , Anand Iyer , Garlen Leung
CPC分类号： B24B21/06 , B24B21/04 , B24B21/12 , B24B37/12 , B24B37/205 , B24B37/26 , B24D11/001
摘要： A polishing article is described. The polishing article includes a linear polishing sheet having a linear transparent portion, wherein the linear transparent portion is formed from a material that has the flexibility to pass around a radius of about 2.5 inches without cracking.
摘要翻译： 描述抛光制品。 抛光制品包括具有线性透明部分的直线抛光片，其中线状透明部分由具有约2.5英寸半径的柔性的材料形成而没有破裂。
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10.发明授权公开(公告)号：US06241596B1
公开(公告)日：2001-06-05
申请号：US09483790
申请日：2000-01-14
申请人： Thomas H. Osterheld , Hung Chih Chen , Erik Rondum
发明人： Thomas H. Osterheld , Hung Chih Chen , Erik Rondum
IPC分类号： B24D1100
CPC分类号： B24B37/26
摘要： A polishing pad for use in a chemical mechanical polishing system is provided. The pad comprises a patterned surface having slurry distribution/retaining grooves formed therein. The slurry distribution/retaining grooves include a uniform or random pattern of non-continuous or obstructed groove segments adapted to inhibit slurry or other fluids from flowing off of the pad during operation.
摘要翻译： 提供了一种用于化学机械抛光系统的抛光垫。 垫包括其中形成有浆料分布/保持槽的图案化表面。 浆料分配/保持槽包括适于在操作期间阻止浆料或其它流体从衬垫流出的非连续或阻塞的槽段的均匀或随机图案。
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