公开(公告)号：US09327241B2

公开(公告)日：2016-05-03

申请号：US13808113

申请日：2011-06-08

申请人： Erwin Johannes Martinus Giling ,  Earl Lawrence Vincent Goetheer ,  Ralph Joh ,  Rüdiger Schneider ,  Johannes Van Der Meer ,  Dirk Verdoes

发明人： Erwin Johannes Martinus Giling ,  Earl Lawrence Vincent Goetheer ,  Ralph Joh ,  Rüdiger Schneider ,  Johannes Van Der Meer ,  Dirk Verdoes

IPC分类号： B01D53/96 ,  B01D53/62

CPC分类号： B01D53/96 ,  B01D53/62 ,  B01D2252/20494 ,  B01D2257/504 ,  Y02C10/04

摘要： A method for treating a contaminated alkaline amino acid salt solution is provided. First, carbon dioxide is introduced into the amino acid salt solution, with the result that carbonate or carbonate salts is or are precipitated, these being filtered off. The remaining filtrate is then cooled, amino acid or amino acid salts being crystallized out and likewise being filtered off. The amino acid or amino acid salt is then dissolved again, with the result that a treated amino acid salt solution is recovered.

摘要翻译： 提供了一种处理污染的碱性氨基酸盐溶液的方法。 首先，将二氧化碳引入氨基酸盐溶液中，结果碳酸盐或碳酸盐被沉淀，这些被滤出。 然后将剩余的滤液冷却，使氨基酸或氨基酸盐结晶出来并同样被滤出。 然后氨基酸或氨基酸盐再次溶解，结果是回收经处理的氨基酸盐溶液。

公开(公告)号：US20150034867A1

公开(公告)日：2015-02-05

申请号：US13808113

申请日：2011-06-08

申请人： Erwin Johannes Martinus Giling ,  Earl Lawrence Vincent Goetheer ,  Ralph Joh ,  Rüdiger Schneider ,  Johannes Van der Meer ,  Dirk Verdoes

发明人： Erwin Johannes Martinus Giling ,  Earl Lawrence Vincent Goetheer ,  Ralph Joh ,  Rüdiger Schneider ,  Johannes Van der Meer ,  Dirk Verdoes

IPC分类号： B01D53/96 ,  B01D53/62

CPC分类号： B01D53/96 ,  B01D53/62 ,  B01D2252/20494 ,  B01D2257/504 ,  Y02C10/04

摘要： A method for treating a contaminated alkaline amino acid salt solution is provided. First, carbon dioxide is introduced into the amino acid salt solution, with the result that carbonate or carbonate salts is or are precipitated, these being filtered off. The remaining filtrate is then cooled, amino acid or amino acid salts being crystallized out and likewise being filtered off. The amino acid or amino acid salt is then dissolved again, with the result that a treated amino acid salt solution is recovered.

摘要翻译： 提供了一种处理污染的碱性氨基酸盐溶液的方法。 首先，将二氧化碳引入氨基酸盐溶液中，结果碳酸盐或碳酸盐被沉淀，这些被滤出。 然后将剩余的滤液冷却，将氨基酸或氨基酸盐结晶出来并同样被滤出。 然后氨基酸或氨基酸盐再次溶解，结果是回收经处理的氨基酸盐溶液。

公开(公告)号：US20130313475A1

公开(公告)日：2013-11-28

申请号：US13982825

申请日：2012-01-17

申请人： Björn Fischer ,  Erwin Johannes Martinus Giling ,  Earl Lawrence Vincent Goetheer ,  Ralph Joh ,  Rüdiger Schneider ,  Jan Harm Urbanus

发明人： Björn Fischer ,  Erwin Johannes Martinus Giling ,  Earl Lawrence Vincent Goetheer ,  Ralph Joh ,  Rüdiger Schneider ,  Jan Harm Urbanus

IPC分类号： B01D53/96

CPC分类号： B01D53/96 ,  B01D53/1425 ,  B01D53/1475 ,  B01D2252/20494 ,  B01D2258/0283 ,  B08B7/0071 ,  Y02A50/2342 ,  Y02C10/06

摘要： A process for purifying a product contaminated with nitrosamines from an operating plant is proposed. The contaminated product is heated to a temperature T at which the nitrosamines are thermally destroyed. The temperature T is set at a higher level than the maximum temperature in the operating plant, and maintained for a residence time t. An apparatus for regeneration of a nitrosamine-contaminated product from a CO2 capture plant is also proposed.

摘要翻译： 提出了一种从操作植物中纯化受亚硝胺污染的产品的方法。 被污染的产品被加热到亚硝胺被热破坏的温度T. 温度T设定在比运行设备最高温度高的水平，并保持停留时间t。 还提出了用于从CO 2捕获设备再生亚硝胺污染的产物的装置。

公开(公告)号：US20150083964A1

公开(公告)日：2015-03-26

申请号：US14236469

申请日：2012-08-01

申请人： Björn Fischer ,  Erwin Johannes Martinus Giling ,  Earl Lawrence Vincent Goetheer ,  Ralph Joh ,  Markus Kinzl ,  Diego Andres Kuettel ,  Rüdiger Schneider ,  Jan Harm Urbanus

发明人： Björn Fischer ,  Erwin Johannes Martinus Giling ,  Earl Lawrence Vincent Goetheer ,  Ralph Joh ,  Markus Kinzl ,  Diego Andres Kuettel ,  Rüdiger Schneider ,  Jan Harm Urbanus

IPC分类号： B01D53/96

CPC分类号： B01D53/96 ,  B01D53/1425 ,  B01D53/1475 ,  B01D2251/606 ,  B01D2251/70 ,  B01D2251/80 ,  B01D2252/204 ,  B01D2257/504 ,  B01D2258/0283 ,  C02F1/04 ,  C02F1/283 ,  C02F2103/18 ,  Y02C10/04 ,  Y02C10/06

摘要： Apparatus and process for removal of volatile degradation products from the absorbent circuit of a CO2 separation process are provided. The CO2 separation process may use the absorbent circuit in an absorption process and a desorption process. Condensate is withdrawn from a condensation process connected downstream of the desorption process, and purified to substantially free such condensate of degradation products. The purified condensate is recycled back to the absorbent circuit.

摘要翻译： 提供了用于从CO 2分离过程的吸收回路中除去挥发性降解产物的装置和方法。 CO 2分离过程可以在吸收过程和解吸过程中使用吸收剂回路。 从与解吸过程下游连接的冷凝过程中取出冷凝物，并纯化至基本上释放降解产物的这种缩合物。 净化的冷凝物再循环回吸收回路。

公开(公告)号：US20100118288A1

公开(公告)日：2010-05-13

申请号：US11922020

申请日：2006-06-13

申请人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Haico Victor Kok ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk ,  Wilhelmus Jacobus Maria Rooijakkers ,  Johannes Maria Kuiper ,  Leon Van Dooren ,  Jacob Sonneveld ,  Erwin Johannes Martinus Giling

发明人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Haico Victor Kok ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk ,  Wilhelmus Jacobus Maria Rooijakkers ,  Johannes Maria Kuiper ,  Leon Van Dooren ,  Jacob Sonneveld ,  Erwin Johannes Martinus Giling

IPC分类号： G01J4/00 ,  G03B27/72

CPC分类号： G01M11/0264 ,  G03F7/70566 ,  G03F7/706 ,  G03F7/7085

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的极化传感器，其中所述光罩偏振传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。

公开(公告)号：US20100182582A1

公开(公告)日：2010-07-22

申请号：US11922018

申请日：2006-06-13

申请人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Haico Victor Kok ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk ,  Wilhelmus Jacobus Maria Rooijakkers ,  Johannes Maria Kuiper ,  Leon Van Dooren ,  Jacob Sonneveld ,  Erwin Johannes Martinus Giling

发明人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Haico Victor Kok ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk ,  Wilhelmus Jacobus Maria Rooijakkers ,  Johannes Maria Kuiper ,  Leon Van Dooren ,  Jacob Sonneveld ,  Erwin Johannes Martinus Giling

IPC分类号： G03B27/72 ,  G01J4/04

CPC分类号： G01M11/0264 ,  G03F7/70566 ,  G03F7/706 ,  G03F7/7085

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的偏振传感器，其中所述光罩极化传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。

公开(公告)号：US20100045956A1

公开(公告)日：2010-02-25

申请号：US11922056

申请日：2006-06-13

申请人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Haico Victor Kok ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk ,  Wilhelmus Jacobus Maria Rooijakkers ,  Johannes Maria Kuiper ,  Leon Van Dooren ,  Jacob Sonneveld ,  Erwin Johannes Martinus Giling

发明人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Haico Victor Kok ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk ,  Wilhelmus Jacobus Maria Rooijakkers ,  Johannes Maria Kuiper ,  Leon Van Dooren ,  Jacob Sonneveld ,  Erwin Johannes Martinus Giling

IPC分类号： G03B27/72 ,  G01J4/00

CPC分类号： G01M11/0264 ,  G03F7/70566 ,  G03F7/706 ,  G03F7/7085

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的极化传感器，其中所述光罩偏振传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。