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    Lithographic apparatus
    4.
    发明授权
    Lithographic apparatus 有权
    平版印刷设备

    公开(公告)号：US07375799B2

    公开(公告)日：2008-05-20

    申请号：US11065349

    申请日：2005-02-25

    申请人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk

    发明人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk

    IPC分类号： G03B27/72 ,  G03B27/54

    CPC分类号： G03F7/70133 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/7085

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a detector for measuring the intensity of the radiation after it has passed through the projection system. The apparatus further includes a polarization changing element, such as a quarter-wave plate, that is adjustable; and a polarization analyzer, such as a linear polarizer, wherein the polarization changing element and the polarization analyzer are arranged in order in the radiation beam path at the level at which a patterning device would be held by the support. By taking intensity measurements, using the detector, for different rotational orientations of the polarization changing element, information on the state of polarization of the radiation at the level of the patterning device can be obtained. Because the polarization analyzer is located before the projection system, the measurements are not affected by the fact that the detector is located after the projection system, such as at the level of the substrate.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及用于在辐射通过投影系统之后测量辐射强度的检测器。 该装置还包括可调节的诸如四分之一波片的偏振变化元件; 以及诸如线性偏振器的偏振分析器，其中偏振改变元件和偏振分析器在辐射束路径中依次布置在图案形成装置将被支撑件保持的水平处。 通过采用强度测量，使用检测器，对于偏振变化元件的不同的旋转取向，可以获得关于在图案形成装置的电平处的辐射的偏振状态的信息。 由于偏振分析仪位于投影系统之前，测量不受检测器位于投影系统之后（例如在基板的水平面）的事实的影响。

    Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations
    5.
    发明授权
    Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations 有权
    平版印刷设备，光栅模块，传感器模块，测量波前像差的方法

    公开(公告)号：US06650399B2

    公开(公告)日：2003-11-18

    申请号：US10073119

    申请日：2002-02-12

    申请人： Johannes Jacobus Matheus Baselmans ,  Marco Hugo Petrus Moers ,  Hans Van Der Laan ,  Robert Wilhelm Willekers ,  Wilhelmus Petrus De Boeij ,  Marcus Adrianus Van De Kerkhof

    发明人： Johannes Jacobus Matheus Baselmans ,  Marco Hugo Petrus Moers ,  Hans Van Der Laan ,  Robert Wilhelm Willekers ,  Wilhelmus Petrus De Boeij ,  Marcus Adrianus Van De Kerkhof

    IPC分类号： G03B2742

    CPC分类号： G01M11/0264 ,  G01M11/0285 ,  G03F7/706

    摘要： A lithographic projection apparatus including an illumination system; a support structure for holding a mask; a substrate table for holding a substrate; a projection system for projecting a pattern onto a target portion of the substrate; and an interferometric measurement system for measuring wave front aberrations of the projection system, characterized in that the interferometric measurement system including: a grating, featuring a grating pattern in a grating plane, said grating being movable into and out of the projection beam, such that the grating plane is substantially coincident with said object plane; a pinhole, featuring a pinhole pattern in a pinhole plane and arranged in a pinhole plate, said pinhole being movable into and out of the projection beam, such that the pinhole plane is substantially coincident with a plane downstream of the projection system and optically conjugate to said object plane, and a detector with a detector surface substantially coincident with a detection plane, said detection plane located downstream of the pinhole at a location where a spatial distribution of the electric field amplitude of the projection beam is substantially a Fourier transformation of a spatial distribution of the electric field amplitude of the projection beam in the pinhole plane.

    摘要翻译： 一种光刻投影装置，包括照明系统; 用于保持面罩的支撑结构; 用于保持衬底的衬底台; 投影系统，用于将图案投影到所述基板的目标部分上; 以及用于测量所述投影系统的波前像差的干涉测量系统，其特征在于，所述干涉测量系统包括：光栅，其特征在于光栅平面中的光栅图案，所述光栅可移入和移出所述投影光束，使得 光栅平面基本上与所述物平面重合; 针孔，其具有针孔平面中的针孔图案并且布置在针孔板中，所述针孔可移动进入和离开投影梁，使得针孔平面基本上与投影系统的下游平面重合，并且与光学共轭 所述物体平面和检测器表面基本上与检测平面重合的检测器，所述检测平面位于所述针孔的下游，所述位置处投影光束的电场振幅的空间分布基本上是空间的傅立叶变换 投影光束在针孔平面中的电场振幅分布。

    Radiation beam modification apparatus and method
    7.
    发明授权
    Radiation beam modification apparatus and method 有权
    辐射束修改装置及方法

    公开(公告)号：US08351022B2

    公开(公告)日：2013-01-08

    申请号：US12774284

    申请日：2010-05-05

    申请人： Wilhelmus Petrus De Boeij ,  Leon Martin Levasier

    发明人： Wilhelmus Petrus De Boeij ,  Leon Martin Levasier

    IPC分类号： G02B5/22 ,  G02B26/02 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/72

    CPC分类号： G03B27/54 ,  G03F7/7025

    摘要： A radiation beam modification apparatus for controlling a property of a beam of radiation in a lithographic apparatus includes a flexible sheet provided with a plurality of apertures, and a positioning apparatus comprising a first rotatable member and a second rotatable member, wherein a first end portion of the flexible sheet is coupled to the first rotatable member, a second end portion of the flexible sheet is coupled to the second rotatable member and a central portion of the flexible sheet extends between the first rotatable member and the second rotatable member. The apertures may be used to control the numerical aperture of a projection system of a lithographic apparatus.

    摘要翻译： 用于控制光刻设备中的辐射束的性质的辐射束修改设备包括设置有多个孔的柔性片和包括第一可旋转构件和第二可旋转构件的定位装置，其中第一端部 柔性片联接到第一可旋转构件，柔性片的第二端部联接到第二可旋转构件，并且柔性片的中心部分在第一可旋转构件和第二可旋转构件之间延伸。 孔可用于控制光刻设备的投影系统的数值孔径。