公开(公告)号：US20100118288A1

公开(公告)日：2010-05-13

申请号：US11922020

申请日：2006-06-13

申请人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Haico Victor Kok ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk ,  Wilhelmus Jacobus Maria Rooijakkers ,  Johannes Maria Kuiper ,  Leon Van Dooren ,  Jacob Sonneveld ,  Erwin Johannes Martinus Giling

发明人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Haico Victor Kok ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk ,  Wilhelmus Jacobus Maria Rooijakkers ,  Johannes Maria Kuiper ,  Leon Van Dooren ,  Jacob Sonneveld ,  Erwin Johannes Martinus Giling

IPC分类号： G01J4/00 ,  G03B27/72

CPC分类号： G01M11/0264 ,  G03F7/70566 ,  G03F7/706 ,  G03F7/7085

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的极化传感器，其中所述光罩偏振传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。

公开(公告)号：US20100182582A1

公开(公告)日：2010-07-22

申请号：US11922018

申请日：2006-06-13

申请人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Haico Victor Kok ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk ,  Wilhelmus Jacobus Maria Rooijakkers ,  Johannes Maria Kuiper ,  Leon Van Dooren ,  Jacob Sonneveld ,  Erwin Johannes Martinus Giling

发明人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Haico Victor Kok ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk ,  Wilhelmus Jacobus Maria Rooijakkers ,  Johannes Maria Kuiper ,  Leon Van Dooren ,  Jacob Sonneveld ,  Erwin Johannes Martinus Giling

IPC分类号： G03B27/72 ,  G01J4/04

CPC分类号： G01M11/0264 ,  G03F7/70566 ,  G03F7/706 ,  G03F7/7085

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的偏振传感器，其中所述光罩极化传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。

公开(公告)号：US20100045956A1

公开(公告)日：2010-02-25

申请号：US11922056

申请日：2006-06-13

申请人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Haico Victor Kok ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk ,  Wilhelmus Jacobus Maria Rooijakkers ,  Johannes Maria Kuiper ,  Leon Van Dooren ,  Jacob Sonneveld ,  Erwin Johannes Martinus Giling

发明人： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel Fransois Hubert Klaassen ,  Haico Victor Kok ,  Martijn Gerard Dominique Wehrens ,  Tammo Uitterdijk ,  Wilhelmus Jacobus Maria Rooijakkers ,  Johannes Maria Kuiper ,  Leon Van Dooren ,  Jacob Sonneveld ,  Erwin Johannes Martinus Giling

IPC分类号： G03B27/72 ,  G01J4/00

CPC分类号： G01M11/0264 ,  G03F7/70566 ,  G03F7/706 ,  G03F7/7085

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的极化传感器，其中所述光罩偏振传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。

公开(公告)号：US07459669B2

公开(公告)日：2008-12-02

申请号：US11321466

申请日：2005-12-30

申请人： Rob Adrianus Antonius Maria Bastiaensen ,  Marcel Maurice Hemerik ,  Marcus Adrianus Van De Kerkhof ,  Jeroen Johannes Sophia Maria Mertens ,  Jacob Sonneveld

发明人： Rob Adrianus Antonius Maria Bastiaensen ,  Marcel Maurice Hemerik ,  Marcus Adrianus Van De Kerkhof ,  Jeroen Johannes Sophia Maria Mertens ,  Jacob Sonneveld

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G01N21/85 ,  G03F7/70591 ,  G03F7/706

摘要： A sensor for use in a lithographic apparatus, the sensor having a liquid to prevent optical losses, especially when receiving radiation with a high NA. The liquid is fixed between two surfaces by capillary forces in an area through which radiation passes.

摘要翻译： 一种用于光刻设备的传感器，该传感器具有防止光损耗的液体，特别是当接收到具有高NA的辐射时。 液体通过辐射通过的区域中的毛细管力固定在两个表面之间。

公开(公告)号：US5708638A

公开(公告)日：1998-01-13

申请号：US615931

申请日：1996-03-14

申请人： Josephus J. M. Braat ,  Igolt P. D. Ubbens ,  James H. Coombs ,  Jacob Sonneveld ,  Jacobus P. C. Kroon ,  Petrus T. Jutte

发明人： Josephus J. M. Braat ,  Igolt P. D. Ubbens ,  James H. Coombs ,  Jacob Sonneveld ,  Jacobus P. C. Kroon ,  Petrus T. Jutte

IPC分类号： H04N5/783 ,  G11B5/008 ,  G11B5/027 ,  G11B7/00 ,  G11B7/0037 ,  G11B7/085 ,  G11B7/09 ,  G11B7/131 ,  G11B7/133 ,  G11B7/1353 ,  G11B7/1372 ,  G11B7/1381 ,  G11B15/02 ,  G11B15/12 ,  G11B15/14 ,  G11B15/18 ,  G11B15/473 ,  G11B19/12 ,  G11B20/02 ,  G11B27/032 ,  G11B27/036 ,  G11B27/36 ,  G11B33/10

CPC分类号： G11B7/131 ,  G11B15/02 ,  G11B15/125 ,  G11B15/1875 ,  G11B19/12 ,  G11B27/036 ,  G11B27/36 ,  G11B7/0037 ,  G11B7/0908 ,  G11B7/0909 ,  G11B7/133 ,  G11B7/1353 ,  G11B7/1372 ,  G11B7/1381 ,  G11B15/4731 ,  G11B2007/0006 ,  G11B2007/0013 ,  G11B2220/90 ,  G11B27/032 ,  G11B33/10 ,  G11B5/0086 ,  G11B7/0916

摘要： An optical scanning device can scan two types of record carriers each having a transparent layer with a different thickness, in which a radiation beam scans an information layer of the record carrier through the transparent layer. When scanning a first type of record carrier the best focus of a scanning radiation beam is positioned on the information layer and when scanning a second type of record carrier the paraxial focus of the radiation beam is positioned on the information layer.

摘要翻译： 光学扫描装置可以扫描具有不同厚度的透明层的两种类型的记录载体，其中辐射束通过透明层扫描记录载体的信息层。 当扫描第一类型的记录载体时，扫描辐射束的最佳焦点位于信息层上，并且当扫描第二类型的记录载体时，辐射束的近轴焦点位于信息层上。

公开(公告)号：US20070152178A1

公开(公告)日：2007-07-05

申请号：US11321466

申请日：2005-12-30

申请人： Rob Adrianus Bastiaensen ,  Marcel Hemerik ,  Marcus Van De Kerkhof ,  Jeroen Maria Mertens ,  Jacob Sonneveld

发明人： Rob Adrianus Bastiaensen ,  Marcel Hemerik ,  Marcus Van De Kerkhof ,  Jeroen Maria Mertens ,  Jacob Sonneveld

IPC分类号： G01N21/85

CPC分类号： G03F7/70341 ,  G01N21/85 ,  G03F7/70591 ,  G03F7/706

摘要： A sensor for use in a lithographic apparatus, the sensor having a liquid to prevent optical losses, especially when receiving radiation with a high NA. The liquid is fixed between two surfaces by capillary forces in an area through which radiation passes.

摘要翻译： 一种用于光刻设备的传感器，该传感器具有防止光损耗的液体，特别是当接收到具有高NA的辐射时。 液体通过辐射通过的区域中的毛细管力固定在两个表面之间。