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公开(公告)号:US20210043410A1
公开(公告)日:2021-02-11
申请号:US16987172
申请日:2020-08-06
申请人: FEI Company
发明人: Erik Rene Kieft , Pleun Dona , Jasper Frans Mathijs van Rens , Wouter Verhoeven , Peter Mutsaers , Jom Luiten , Ondrej Baco
摘要: Disclosed herein are radio frequency (RF) cavities and systems including such RF cavities. The RF cavities are characterized as having an insert with at least one sidewall coated with a material to prevent charge build up without affecting RF input power and that is heat and vacuum compatible. One example RF cavity includes a dielectric insert, the dielectric insert having an opening extending from one side of the dielectric insert to another to form a via, and a coating layer disposed on an inner surface of the dielectric insert, the inner surface facing the via, wherein the coating layer has a thickness and a resistivity, the thickness less than a thickness threshold, and the resistivity greater than a resistivity threshold, wherein the thickness and resistivity thresholds are based partly on operating parameters of the RF cavity.
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公开(公告)号:US11328892B2
公开(公告)日:2022-05-10
申请号:US16987172
申请日:2020-08-06
申请人: FEI Company
发明人: Erik Rene Kieft , Pleun Dona , Jasper Frans Mathijs van Rens , Wouter Verhoeven , Peter Mutsaers , Jom Luiten , Ond{hacek over (r)}ej Ba{hacek over (c)}o
摘要: Disclosed herein are radio frequency (RF) cavities and systems including such RF cavities. The RF cavities are characterized as having an insert with at least one sidewall coated with a material to prevent charge build up without affecting RF input power and that is heat and vacuum compatible. One example RF cavity includes a dielectric insert, the dielectric insert having an opening extending from one side of the dielectric insert to another to form a via, and a coating layer disposed on an inner surface of the dielectric insert, the inner surface facing the via, wherein the coating layer has a thickness and a resistivity, the thickness less than a thickness threshold, and the resistivity greater than a resistivity threshold, wherein the thickness and resistivity thresholds are based partly on operating parameters of the RF cavity.
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公开(公告)号:US09984852B1
公开(公告)日:2018-05-29
申请号:US15364145
申请日:2016-11-29
申请人: FEI Company
发明人: Otger Jan Luiten , Petrus Henricus Antonius Mutsaers , Jasper Frans Mathijs van Rens , Wouter Verhoeven , Erik René Kieft
CPC分类号: H01J37/26 , H01J37/05 , H01J37/20 , H01J37/244 , H01J2237/0437 , H01J2237/2442 , H01J2237/24485 , H01J2237/2449 , H01J2237/2626 , H01J2237/2802
摘要: An apparatus for performing charged particle spectroscopy, comprising: A source, for producing a pulsed beam of charged particles that propagate along a beam path; A specimen holder, for holding a specimen at an irradiation position in said beam path; A detector arrangement, for performing energy-differentiated detection of charged particles that traverse said specimen, wherein, between said source and said detector arrangement, said beam path successively traverses: An energizing cavity, for applying a time-dependent accelerating field to said beam; A primary drift space; Said irradiation position; A temporal focusing cavity, for converting an energy differential in said beam into a time-of-flight differential; A secondary drift space.
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