公开(公告)号：US20130213814A1

公开(公告)日：2013-08-22

申请号：US13766069

申请日：2013-02-13

Applicant: First Solar, Inc.

Inventor： Jianjun Wang ,  Markus Gloeckler ,  Long Cheng ,  Oleh Petro Karpenko

IPC: G01N27/42 ,  H01L31/18

CPC classification number: G01N27/42 ,  H01L22/24 ,  H01L31/0322 ,  H01L31/073 ,  H01L31/0749 ,  H01L31/186 ,  H02S50/10 ,  Y02E10/541 ,  Y02E10/543 ,  Y02P70/521

Abstract: A method for forming a defect marker on a thin film of a photovoltaic device by plating to detect pinholes and/or electrical shunts during device fabrication is disclosed. Also disclosed is a system for implementing such a method.

Abstract translation: 公开了一种在器件制造期间通过电镀在光电器件的薄膜上形成缺陷标记以检测针孔和/或电分路的方法。 还公开了一种用于实现这种方法的系统。

公开(公告)号：US20130189635A1

公开(公告)日：2013-07-25

申请号：US13748344

申请日：2013-01-23

Applicant: FIRST SOLAR, INC.

Inventor： Chong Lim ,  Oleh Petro Karpenko ,  Akhlesh Gupta

IPC: F27D3/00

CPC classification number: F27D3/00 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/6776

Abstract: A method and apparatus for heat treating a photovoltaic device. The apparatus includes a heating module, a processing module, and a cooling module in which the operating temperatures of the modules may be controlled separately. The heating module is configured to pre-heat a substrate and stabilize the substrate at the desired target temperature, the processing module is configured to thermally process the substrate, and the cooling module is configured for post-treatment cooling of the substrate.

Abstract translation: 一种用于热处理光伏器件的方法和装置。 该装置包括加热模块，处理模块和冷却模块，其中模块的操作温度可以分开控制。 加热模块被配置为预热基底并将基底稳定在期望的目标温度，处理模块被配置为热处理基底，并且冷却模块被配置用于对基底进行后处理冷却。

公开(公告)号：US09123584B2

公开(公告)日：2015-09-01

申请号：US14072406

申请日：2013-11-05

Applicant: FIRST SOLAR, INC.

Inventor： Arnold Allenic ,  Stephan Paul George, II ,  Sreenivas Jayaraman ,  Oleh Petro Karpenko ,  Chong Lim

IPC: H01L21/02 ,  H01L21/66 ,  G01B11/06 ,  G01N21/84

CPC classification number: H01L22/12 ,  G01B11/0683 ,  G01N21/8422 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A metrology system for gauging and spatially mapping a semiconductor material on a substrate can be used in controlling deposition and thermal activation processes.

Abstract translation: 用于在衬底上测量和空间映射半导体材料的计量系统可用于控制沉积和热激活过程。

公开(公告)号：US20140065731A1

公开(公告)日：2014-03-06

申请号：US14072406

申请日：2013-11-05

Applicant: FIRST SOLAR, INC

Inventor： Arnold Allenic ,  Stephan Paul George, II ,  Sreenivas Jayaraman ,  Oleh Petro Karpenko ,  Chong Lim

IPC: H01L21/66

CPC classification number: H01L22/12 ,  G01B11/0683 ,  G01N21/8422 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A metrology system for gauging and spatially mapping a semiconductor material on a substrate can be used in controlling deposition and thermal activation processes.

Abstract translation: 用于在衬底上测量和空间映射半导体材料的计量系统可用于控制沉积和热激活过程。