-
公开(公告)号：US20190016013A1
公开(公告)日：2019-01-17
申请号：US16021771
申请日：2018-06-28
发明人： Keiji Mase , Shozo Ishibashi , Yusuke Kondo
摘要： A surface treatment method is provided that is capable of raising the slidability of a ceramic surface at low cost using a comparatively simple method. Dimples are formed on a surface of a treatment region, this being a portion of a ceramic surface where surface treatment is to be performed, by ejecting substantially spherical ejection particles having a median diameter of from 1 μm to 20 μm, together with compressed gas at an ejection pressure of from 0.01 MPa to 0.7 MPa, so as to achieve a value of a fastest decay autocorrelation length of not less than 10. The dimples are formed so as to have a plan view profile with a ratio between a horizontal Feret diameter and a vertical Feret diameter of from 0.7 to 1.43. Thereby a ceramic surface with improved slidability can be obtained regardless of use or non-use of a lubricant.
-
公开(公告)号：US10857695B2
公开(公告)日：2020-12-08
申请号：US16021771
申请日：2018-06-28
发明人： Keiji Mase , Shozo Ishibashi , Yusuke Kondo
摘要： A surface treatment method is provided that is capable of raising the slidability of a ceramic surface at low cost using a comparatively simple method. Dimples are formed on a surface of a treatment region, this being a portion of a ceramic surface where surface treatment is to be performed, by ejecting substantially spherical ejection particles having a median diameter of from 1 μm to 20 μm, together with compressed gas at an ejection pressure of from 0.01 MPa to 0.7 MPa, so as to achieve a value of a fastest decay autocorrelation length of not less than 10. The dimples are formed so as to have a plan view profile with a ratio between a horizontal Feret diameter and a vertical Feret diameter of from 0.7 to 1.43. Thereby a ceramic surface with improved slidability can be obtained regardless of use or non-use of a lubricant.
-
公开(公告)号：US10071462B2
公开(公告)日：2018-09-11
申请号：US15090875
申请日：2016-04-05
发明人： Keiji Mase , Daisuke Chino , Masato Hinata
摘要： To cut out a hard-brittle substrate by blasting, laying out substrates 2 on a plate material 1 made of a hard-brittle material with leaving a space for blasting; forming first protective films 4 on both surfaces of the plate material 1 at layout positions of the substrates 2; and forming second protective films 5 on both surfaces of a margin 3 of the plate material 1 with leaving a space with respect to the first protective films 4 and having outer edges from a periphery of the plate material 1 at a width of 5 mm or less; cutting regions 6 between the films 4, 4 and between the films 4, 5 from one surface of the plate material 1 to a depth of approximately half of a thickness thereof by blasting, then cutting from the other surface of the plate material 1 until the plate material 1 is penetrated.
-
公开(公告)号：US09793426B2
公开(公告)日：2017-10-17
申请号：US14277273
申请日：2014-05-14
发明人： Keiji Mase , Morio Tsukita
IPC分类号： H01L31/0236 , B24C1/08 , C03C15/00 , H01L31/048
CPC分类号： H01L31/02366 , B24C1/08 , C03C15/00 , C03C2204/08 , H01L31/048 , Y02E10/50
摘要： To impart antiglare properties without reducing the amount of transmitted light, a method for processing a surface of light-transmitting-glass according to the present invention comprises a blasting step of ejecting abrasive grains with particle sizes of #800 to #3000 (average particle diameter 14 μm to 4 μm) such as WA (white alundum: high-purity alumina) having higher hardness than that of the glass onto a light-receiving surface of the glass having light-transmitting property to be processed for forming indentations and protrusions in the light-receiving surface of the glass, and after the blasting step, a hydrofluoric acid treatment step of immersing the light-receiving surface of the glass into a hydrofluoric acid solution in 10% to 20% concentration for 30 to 600 seconds thereby increase a height (amplitude) of indentations and protrusions of the surface of light-transmitting-glass.
-
5.发明授权Method and device for cutting out hard-brittle substrate and protecting regions on the substrate 有权用于切割脆性基材和保护基材上的区域的方法和装置公开(公告)号：US09333624B2
公开(公告)日：2016-05-10
申请号：US13874788
申请日：2013-05-01
发明人： Keiji Mase , Daisuke Chino , Masato Hinata
摘要： To cut out a hard-brittle substrate by blasting, laying out substrates 2 on a plate material 1 made of a hard-brittle material with leaving a space for blasting; forming first protective films 4 on both surfaces of the plate material 1 at layout positions of the substrates 2; and forming second protective films 5 on both surfaces of a margin 3 of the plate material 1 with leaving a space with respect to the first protective films 4 and having outer edges from a periphery of the plate material 1 at a width of 5 mm or less; cutting regions 6 between the films 4, 4 and between the films 4, 5 from one surface of the plate material 1 to a depth of approximately half of a thickness thereof by blasting, then cutting from the other surface of the plate material 1 until the plate material 1 is penetrated.
摘要翻译： 为了通过喷砂来切割硬脆基材，将基材2铺在由易碎材料制成的板材1上，留下用于喷砂的空间; 在基板2的布置位置处在板材1的两个表面上形成第一保护膜4; 并且在板材1的边缘3的两个表面上形成第二保护膜5，相对于第一保护膜4留下一个空间，并且具有从板材1的周边以5mm或更小的宽度的外边缘 ; 通过喷射，从薄板4从薄板4的一个表面切割到薄膜4,4之间并在薄膜4,5之间切割其厚度的大约一半的深度，然后从板材1的另一个表面切割直到 板材1被穿透。
-
6.发明授权Method for producing elastic grinding material, elastic grinding material, and blasting method using said elastic grinding material 有权弹性研磨材料的制造方法，弹性研磨材料以及使用所述弹性研磨材料的喷砂方法公开(公告)号：US09186775B2
公开(公告)日：2015-11-17
申请号：US14364858
申请日：2012-12-12
发明人： Keiji Mase , Shozo Ishibashi
CPC分类号： B24C11/00 , B24C1/08 , C09K3/1409 , C09K3/1436
摘要： A long-lasting elastic grinding material capable of subjecting surfaces of objects to mirror-finishing, glossifying and the like via blasting thereof. A nucleus (2) is obtained by granulating a crosslinked polyrotaxane compound having self-tackiness and a rubber hardness of 30 or less into particles of a prescribed diameter. The nucleus (2), which is soft and exhibits significant deformability, is sealed on the inside of an abrasive-particle layer (3) by: adhering abrasive particles (31) to the surface of the nucleus (2): then affixing the abrasive particles (31) to the surface of the nucleus (2) by applying pressure to the surface of the nucleus (2) to which the abrasive particles (31) are adhered; and forming the abrasive-particle layer (3), which has a masonry-like structure formed by attaching a plurality of the abrasive particles (31) in the thickness direction to the surface of the nucleus (2), by further subjecting the surface of the nucleus (2) to which the abrasive particles (31) are affixed to repeated adhesion of identical abrasive particles (31) and affixing by application of pressure.
摘要翻译： 能够通过喷砂处理物体的表面进行镜面整理，光泽化等的长效弹性研磨材料。 通过将具有自粘性和橡胶硬度为30以下的交联聚轮烷化合物粒化成规定直径的颗粒而获得核（2）。 通过以下方式将磨粒（31）粘附到细胞核（2）的表面上：将磨料（2）软化并显示出显着的变形能力密封在研磨颗粒层（3）的内部，然后将磨料 通过向磨粒（31）附着的细胞核（2）的表面施加压力，将颗粒（31）施加到细胞核（2）的表面; 并且形成具有通过将厚度方向上的多个研磨颗粒（31）附着到所述核（2）表面而形成的砖石状结构的所述研磨颗粒层（3） 将磨料颗粒（31）固定在其上的核（2）重复粘合相同的磨料颗粒（31）并通过施加压力固定。
-
公开(公告)号：US20200282516A1
公开(公告)日：2020-09-10
申请号：US16723013
申请日：2019-12-20
发明人： Keiji Mase , Shozo Ishibashi , Yusuke Kondo
IPC分类号： B24C1/08
摘要： A powder-contacting member that prevents adhesion of powder even when the powder coming into contact with a surface is not only in the form of a single particle but also in the form of a layer, and has high flowability, and a method for the surface treatment of a powder-contacting member. The powder-contacting member has a surface with which powder comes into contact and on which surface treatment is performed. An arithmetic average peak curvature Spc (1/mm) of the surface is 150 to 400, a peak density Spd (piece/mm2) of the surface is 10000 to 180000, a root mean square gradient Sdq of the surface is 0.05 to 0.30, and an arithmetic average height Sa (μm) of the surface is 0.02 to 3.00.
-
公开(公告)号：US10758968B2
公开(公告)日：2020-09-01
申请号：US15750661
申请日：2015-08-11
发明人： Keiji Mase , Shozo Ishibashi , Yusuke Kondo
摘要： A method of treating a surface of a mold. The method includes forming dimples on a surface of a mold by ejecting substantially spherical ejection-particles so as to bombard the surface of the mold. The dimples are formed so as to satisfy a condition defined by the following formula: 1+3.3e−H/230≤W≤3+13.4e−H/1060 wherein W is an equivalent diameter (μm) of the dimples and H is a base metal hardness (Hv) of the mold.
-
公开(公告)号：US20160023325A1
公开(公告)日：2016-01-28
申请号：US14827611
申请日：2015-08-17
发明人： Keiji Mase , Masato Hinata
IPC分类号： B24C1/04
CPC分类号： B24C1/045 , B24C5/04 , B24C7/0038 , Y02E10/541
摘要： To provide a scribing method by blasting that allows forming a groove at high accuracy without masking, a blasting machine that includes an ejection nozzle having a slit-shaped ejection opening with a width of 10 to 500 μm and a length of 5 to 5000 times the width, and an abrasive with a median diameter equal to or less than one-half of a width of the ejection opening of the ejection nozzle and with a maximum particle diameter smaller than a width of the ejection opening are used; and the abrasive is ejected together with compressed gas on a surface of a workpiece at an ejection distance of 0.1 to 3.0 mm and an ejection pressure of 0.2 MPa to 0.6 MPa without masking so that 0.25 cm3 or less of the abrasive is included per 1000 cm3 of the compressed gas discharged from the ejection nozzle.
摘要翻译： 为了提供通过喷砂的划线方法，能够高精度地形成槽而不进行掩蔽，喷丸机包括具有宽度为10〜500μm，长度为5〜5000倍的狭缝状喷出口的喷嘴 宽度和中等直径等于或小于喷嘴的喷射口的宽度的二分之一并且具有小于喷射口的宽度的最大粒径的研磨剂; 研磨剂与压缩气体一起喷射在工件表面上，喷射距离为0.1〜3.0mm，喷射压力为0.2MPa〜0.6MPa，不进行掩蔽，因此每1000cm3含有0.25cm3以下的研磨剂 从喷嘴排出的压缩气体。
-
公开(公告)号：US09144884B2
公开(公告)日：2015-09-29
申请号：US13964326
申请日：2013-08-12
发明人： Keiji Mase , Masato Hinata
CPC分类号： B24C1/045 , B24C5/04 , B24C7/0038 , Y02E10/541
摘要： To provide a scribing method by blasting that allows forming a groove at high accuracy without masking, a blasting machine that includes an ejection nozzle having a slit-shaped ejection opening with a width of 10 to 500 μm and a length of 5 to 5000 times the width, and an abrasive with a median diameter equal to or less than one-half of a width of the ejection opening of the ejection nozzle and with a maximum particle diameter smaller than a width of the ejection opening are used; and the abrasive is ejected together with compressed gas on a surface of a workpiece at an ejection distance of 0.1 to 3.0 mm and an ejection pressure of 0.2 MPa to 0.6 MPa without masking so that 0.25 cm3 or less of the abrasive is included per 1000 cm3 of the compressed gas discharged from the ejection nozzle.
摘要翻译： 为了提供通过喷砂的划线方法，能够高精度地形成槽而不进行掩蔽，喷丸机包括具有宽度为10〜500μm，长度为5〜5000倍的狭缝状喷出口的喷嘴 宽度和中等直径等于或小于喷嘴的喷射口的宽度的二分之一并且具有小于喷射口的宽度的最大粒径的研磨剂; 研磨剂与压缩气体一起喷射在工件表面上，喷射距离为0.1〜3.0mm，喷射压力为0.2MPa〜0.6MPa，不进行掩蔽，因此每1000cm3含有0.25cm3以下的研磨剂 从喷嘴排出的压缩气体。
-
-
-
-
-
-
-
-
-
搜索结果
23 条记录 (耗时 0.016 秒)