公开(公告)号：US20180120701A1

公开(公告)日：2018-05-03

申请号：US15856064

申请日：2017-12-28

Applicant: FUJIFILM Corporation

Inventor： Shuji HIRANO

IPC: G03F7/038 ,  C08F220/24

CPC classification number: G03F7/038 ,  C08F12/24 ,  C08F112/14 ,  C08F212/14 ,  C08F220/24 ,  C08F222/10 ,  C08F2220/281 ,  C08F2220/282 ,  C08F2220/283 ,  C08F2220/301 ,  C08F2220/302 ,  C08F2220/303 ,  C08F2222/1013 ,  C09D125/18 ,  G03F1/50 ,  G03F7/0002 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/075 ,  G03F7/0757 ,  G03F7/0758 ,  G03F7/16 ,  G03F7/20 ,  G03F7/322 ,  C08F2220/1875 ,  C08F212/32

Abstract: According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a hydrophobic resin (B), and a resin (C) having an aromatic ring, as well as a film, a mask blank, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided.

公开(公告)号：US20150147688A1

公开(公告)日：2015-05-28

申请号：US14603811

申请日：2015-01-23

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Shuji HIRANO ,  Wataru NIHASHI ,  Hiroo TAKIZAWA

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/0392 ,  G03F7/0397 ,  G03F7/325

Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having a repeating unit represented by the specific formula, (2) a step of exposing the film by using an actinic ray or radiation, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of the repeating unit represented by the specific formula is 25 mol % or more based on all repeating units in the resin (P).

Abstract translation: 提供一种图案形成方法，其包括（1）通过使用含有（P）具有由所述具体式表示的重复单元的树脂的光化射线敏感或辐射敏感性树脂组合物形成膜的步骤，（2）a 通过使用光化射线或辐射使膜曝光的步骤，以及（3）通过使用含有机溶剂的显影剂显影曝光的薄膜以形成负图案的步骤，其中由特定式表示的重复单元的含量 基于树脂（P）中的所有重复单元为25摩尔％以上。

公开(公告)号：US20150132688A1

公开(公告)日：2015-05-14

申请号：US14605415

申请日：2015-01-26

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Shuji HIRANO ,  Hiroo TAKIZAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/0388 ,  C08F12/24 ,  C08F20/28 ,  C08F220/12 ,  C08F220/18 ,  C08F220/20 ,  C08F220/26 ,  C08F2220/285 ,  G03F7/0002 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/30 ,  H01L21/0274

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.

Abstract translation: 提供一种光化射线敏感或辐射敏感性树脂组合物，其包含（P）具有（a）由该具体式表示的重复单元的树脂; 使用光化射线敏感性或辐射敏感性树脂组合物形成的抗蚀剂膜; 一种图案形成方法，包括（i）通过使用光化射线敏感或辐射敏感性树脂组合物形成膜的步骤，（ii）曝光所述膜的步骤，以及（iii）通过 使用开发人员形成一个模式; 一种用于制造电子装置的方法，包括图案形成方法; 以及通过电子设备的制造方法制造的电子设备。

公开(公告)号：US20150132687A1

公开(公告)日：2015-05-14

申请号：US14605264

申请日：2015-01-26

Applicant: FUJIFILM Corporation

Inventor： Shuji HIRANO ,  Natsumi YOKOKAWA ,  Hiroo TAKIZAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/20 ,  C08F22/10 ,  G03F7/30

CPC classification number: G03F7/0388 ,  C08F22/10 ,  C08F212/14 ,  C08F220/28 ,  G03F7/0002 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  G03F7/38 ,  H01L21/0274 ,  C08F2220/281 ,  C08F2220/283

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin containing a repeating unit represented by the specific formula (1) and a repeating unit represented by the specific formula (A); a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film from the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.

Abstract translation: 提供了包含（P）包含由特定式（1）表示的重复单元的树脂和由特定式（A）表示的重复单元的光化射线敏感或辐射敏感性树脂组合物。 使用光化射线敏感性或辐射敏感性树脂组合物形成的抗蚀剂膜; 一种图案形成方法，包括（i）从光化射线敏感或辐射敏感性树脂组合物形成膜的步骤，（ii）曝光所述膜的步骤，以及（iii）通过使用 开发人员形成一个模式; 一种用于制造电子设备的方法，包括图案形成方法，以及通过电子设备的制造方法制造的电子设备。

公开(公告)号：US20150004533A1

公开(公告)日：2015-01-01

申请号：US14478135

申请日：2014-09-05

Applicant: FUJIFILM Corporation

Inventor： Shuji HIRANO ,  Hiroo TAKIZAWA ,  Hideaki TSUBAKI

IPC: G03F7/027 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0397 ,  C07D235/12 ,  C07D235/16 ,  C07D235/22 ,  C07D235/26 ,  C07D235/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/09 ,  G03F7/11 ,  G03F7/2002 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/322 ,  G03F7/325

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition in the present invention contains a nitrogen-containing compound (N) which is represented by the following general formula (N1): wherein, in the general formula (N1), X represents a group including a hetero atom; L represents a single bond or an alkylene group; R2 represents a substituent, in the case where a plurality of R2's are present, they may be the same as or different from each other and a plurality of R2's may be bonded to each other to form a ring; R3 represents a hydrogen atom or a substituent; and n represents an integer of 0 to 4.

Abstract translation: 本发明的光化射线敏感性或辐射敏感性树脂组合物含有下述通式（N1）表示的含氮化合物（N）：其中，在通式（N1）中，X表示 包括杂原子; L表示单键或亚烷基; R2表示取代基，在存在多个R 2的情况下，它们可以相同或不同，并且多个R 2可以彼此键合形成环; R3表示氢原子或取代基; n表示0〜4的整数。

公开(公告)号：US20200166839A1

公开(公告)日：2020-05-28

申请号：US16695208

申请日：2019-11-26

Applicant: FUJIFILM Corporation

Inventor： Shuji HIRANO ,  Kazuaki ENOMOTO ,  Keisuke NOGOSHI

IPC: G03F7/038 ,  G03F7/11 ,  C08F220/28 ,  C08F220/60 ,  B41C1/10

Abstract: Provided are a lithographic printing plate precursor having an image-recording layer on a hydrophilic support, in which the image-recording layer includes a. polymer having a constituent unit derived from a monomer having a solubility parameter of 20 MPa1/2 or more, an infrared absorber, and a polymer particle; a resin composition for producing a lithographic printing plate precursor including the polymer, an infrared absorber, and a polymer particle; and a method for producing a lithographic printing plate in which the lithographic printing plate precursor is used.

公开(公告)号：US20170242338A1

公开(公告)日：2017-08-24

申请号：US15446153

申请日：2017-03-01

Applicant: FUJIFILM Corporation

Inventor： Shuji HIRANO

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/32 ,  G03F7/20 ,  G03F7/38 ,  G03F7/038 ,  G03F7/16

Abstract: Provided are an active-light-sensitive or radiation-sensitive resin composition in which the sensitivity is excellent, and an active-light-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the active-light-sensitive or radiation-sensitive resin composition. The active-light-sensitive or radiation-sensitive resin composition contains a resin (Ab) whose polarity is changed by the action of an acid, and a compound that generates an acid upon irradiation with active light or radiation, in which the resin (Ab) includes a metal ion, and the metal type of the metal ion is at least one of metal types belonging to Groups 1 to 10 and 13 to 16 (here, excluding Mg and Cs).

公开(公告)号：US20170176858A1

公开(公告)日：2017-06-22

申请号：US15446101

申请日：2017-03-01

Applicant: FUJIFILM Corporation

Inventor： Shuji HIRANO

IPC: G03F7/038 ,  G03F7/32 ,  G03F7/20

CPC classification number: G03F7/038 ,  G03F7/0042 ,  G03F7/2004 ,  G03F7/32 ,  G03F7/325

Abstract: Provided are a pattern forming method in which the resolving power of an isolated space pattern formed is excellent, and a method for manufacturing an electronic device, a resist composition, and a resist film, each using the pattern forming method. The pattern forming method is a pattern forming method including at least a step of forming a resist film using a resist composition, a step of exposing the resist film, and a step of developing the exposed resist film using a developer including an organic solvent to form a pattern, in which the resist composition contains a resin (Ab) including a metal ion.

公开(公告)号：US20160041465A1

公开(公告)日：2016-02-11

申请号：US14881400

申请日：2015-10-13

Applicant: FUJIFILM Corporation

Inventor： Hiroo TAKIZAWA ,  Shuji HIRANO ,  Natsumi YOKOKAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/32 ,  G03F7/20

CPC classification number: G03F7/038 ,  C08F12/22 ,  C08F212/14 ,  C08F216/14 ,  C08F220/18 ,  C08F220/26 ,  C11D11/0047 ,  G03F7/004 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2037 ,  G03F7/32 ,  G03F7/325 ,  H01L21/0275

Abstract: The pattern forming method includes (1) forming a film using an active light sensitive or radiation sensitive resin composition, (2) exposing the film to active light or radiation, and (3) developing the exposed film using a developer including an organic solvent, in which the active light sensitive or radiation sensitive resin composition contains a resin (A) having a group which generates a polar group by being decomposed due to the action of an acid, the resin (A) has a phenolic hydroxyl group and/or a phenolic hydroxyl group protected with a group leaving due to the action of an acid, and the developer including the organic solvent contains an additive which forms at least one interaction of an ionic bond, a hydrogen bond, a chemical bond, and a dipole interaction, with the polar group.

Abstract translation: 图案形成方法包括：（1）使用有源光敏或辐射敏感性树脂组合物形成膜，（2）将膜曝露于活性光或辐射，以及（3）使用包含有机溶剂的显影剂显影曝光膜， 其中活性光敏或辐射敏感性树脂组合物含有具有由于酸作用而分解产生极性基团的基团的树脂（A），树脂（A）具有酚羟基和/或 由于酸的作用而被基团保护的酚羟基，包含有机溶剂的显影剂含有形成离子键，氢键，化学键和偶极相互作用的至少一种相互作用的添加剂， 与极地集团。

公开(公告)号：US20140295332A1

公开(公告)日：2014-10-02

申请号：US14303090

申请日：2014-06-12

Applicant: FUJIFILM Corporation

Inventor： Shuji HIRANO ,  Hiroo TAKIZAWA ,  Hideaki TSUBAKI

IPC: G03F7/038

CPC classification number: G03F7/0388 ,  C07C313/06 ,  C07C313/24 ,  C07D233/06 ,  C07D233/56 ,  C07D235/22 ,  C07D267/00 ,  C07D295/22 ,  C07D401/12 ,  C08F12/20 ,  C08F12/22 ,  C08F12/30 ,  C08F212/14 ,  C08F220/10 ,  C08F220/18 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325 ,  C08F2220/1825

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition, which is excellent in sensitivity, resolution, a pattern profile and a depth of focus (DOF), and, an actinic ray-sensitive or radiation-sensitive film and a pattern forming method, each using the same, are provided. The actinic ray-sensitive or radiation-sensitive resin composition includes a nitrogen-containing compound and a resin (Ab) capable of varying a polarity or an alkali solubility thereof by the action of an acid.

Abstract translation: 灵敏度，分辨率，图案轮廓和焦深（DOF）优异的光化射线敏感或辐射敏感性树脂组合物，以及光化射线敏感或辐射敏感膜和图案形成方法， 每个使用相同的。 光化射线敏感或辐射敏感性树脂组合物包括含氮化合物和能够通过酸的作用改变其极性或碱溶性的树脂（Ab）。