公开(公告)号：US10289001B2

公开(公告)日：2019-05-14

申请号：US15470110

申请日：2017-03-27

Applicant: FUJIFILM Corporation

Inventor： Hideaki Ito ,  Shinji Fujimoto ,  Yasumasa Kawabe

IPC: G03F7/09 ,  G03F7/11 ,  G03F7/16 ,  G03F7/20 ,  G03F7/26 ,  G03F7/30 ,  G03F7/40 ,  C08F12/22 ,  C08F12/24 ,  G03F7/004 ,  G03F7/033 ,  G03F7/039 ,  H03K17/96 ,  C08F212/14 ,  C08F212/32 ,  C08F220/28

Abstract: A pattern forming method includes forming a photosensitive resin composition layer on at least one surface of a substrate using a photosensitive transfer material, exposing the photosensitive resin composition layer; and developing the exposed photosensitive resin composition layer, in which the photosensitive transfer material includes a support, a thermoplastic resin layer, and a photosensitive resin composition layer in this order, and the photosensitive resin composition layer includes a polymer component (A) including a polymer having a constituent unit (a1) that includes a group in which an acid group is protected by an acid-decomposable group and a photoacid generator (B).

公开(公告)号：US09810984B2

公开(公告)日：2017-11-07

申请号：US14687491

申请日：2015-04-15

Applicant: FUJIFILM Corporation

Inventor： Hideaki Ito ,  Shinji Fujimoto ,  Yasumasa Kawabe

IPC: G03F7/039 ,  G03F7/30 ,  G03F7/40 ,  G03F7/09 ,  G03F7/16 ,  C08F12/22 ,  G03F7/11 ,  C08F12/24

CPC classification number: G03F7/094 ,  C08F12/22 ,  C08F12/24 ,  C08F212/14 ,  C08F220/28 ,  C08F2220/281 ,  G03F7/0045 ,  G03F7/033 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/161 ,  G03F7/20 ,  G03F7/26 ,  G03F7/30 ,  G03F7/40 ,  H03K17/962 ,  Y02P20/582 ,  C08F212/32

Abstract: A photosensitive transfer material including a support, a thermoplastic resin layer, and a photosensitive resin composition layer in this order, in which the photosensitive resin composition layer includes a polymer component (A) including a polymer having a constituent unit (a1) that includes a group in which an acid group is protected by an acid-decomposable group and a photoacid generator (B).

公开(公告)号：US10133175B2

公开(公告)日：2018-11-20

申请号：US15209870

申请日：2016-07-14

Applicant: FUJIFILM Corporation

Inventor： Daisuke Kashiwagi ,  Takeshi Andou ,  Satoru Yamada ,  Yasumasa Kawabe ,  Hisamitsu Tomeba

IPC: G03F7/004 ,  G03F7/038 ,  C08F220/18 ,  G02F1/1335 ,  G02B5/20 ,  G03F7/00 ,  G03F7/039 ,  G03F7/32 ,  G03F7/40 ,  H01L51/52 ,  H01L27/32 ,  C08F212/14 ,  C08F220/16 ,  C08F220/28 ,  C08F220/36 ,  G02B1/04 ,  G02B5/22 ,  G03F7/16 ,  G03F7/20 ,  H01L27/146 ,  H01L51/00 ,  H01L51/56

Abstract: Provided are a photosensitive resin composition from which a cured product having a thin film thickness, excellent light-shielding properties, and a high surface hardness is obtained; as well as a cured product obtained by curing the photosensitive resin composition, a cured film and a method for producing the same, a method for producing a resin pattern, and a liquid crystal display device, an organic EL display device, an infrared cut filter, or a solid-state imaging device, each having the cured film. The photosensitive resin composition of the present invention includes (Component A) a polymer having a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group; (Component B) a photoacid generator; (Component C) a solvent; (Component D) a compound having a crosslinkable group and a molecular weight in the range of 100 to 2,000; and (Component S) titanium black.

公开(公告)号：US09599901B2

公开(公告)日：2017-03-21

申请号：US15212936

申请日：2016-07-18

Applicant: FUJIFILM Corporation

Inventor： Daisuke Kashiwagi ,  Takeshi Andou ,  Satoru Yamada ,  Yasumasa Kawabe ,  Hisamitsu Tomeba

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/10 ,  G02B5/20 ,  G03F7/40 ,  G03F7/00 ,  G03F7/004 ,  G03F7/038 ,  H01L51/52 ,  H01L27/32 ,  G02B5/22 ,  G02F1/1335 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  H01L27/146

CPC classification number: G03F7/0397 ,  C08F212/14 ,  C08F220/10 ,  C09B55/002 ,  G02B5/20 ,  G02B5/206 ,  G02B5/208 ,  G02B5/223 ,  G02F1/133516 ,  G03F7/0007 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/168 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  H01L27/14621 ,  H01L27/14623 ,  H01L27/322 ,  H01L51/5253 ,  H01L51/5284

Abstract: Provided is a photosensitive resin composition from which a cured product having thin film thickness, excellent light-shielding properties, and high surface hardness is obtained. A a cured film and a method for producing the same, a method for producing a resin pattern, and an LCD device, an organic EL display device, an infrared cut filter, or a solid-state imaging device are also provided. The photosensitive resin composition includes a polymer component including at least one of categories (1) or (2), a photoacid generator, a solvent, and titanium black, wherein (1) includes (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and (a2) a constitutional unit containing a crosslinkable group, and (2) includes (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and (a2) a constitutional unit containing a crosslinkable group.