公开(公告)号：US20180196178A1

公开(公告)日：2018-07-12

申请号：US15915327

申请日：2018-03-08

Applicant: FUJIFILM Corporation

Inventor： Hisamitsu Tomeba ,  Makoto Kubota

IPC: G02B5/22 ,  C08F220/28 ,  G03F7/039 ,  G03F7/20

Abstract: Provided are a resin film which exhibits an excellent low reflectivity, a coloring photosensitive composition capable of forming a resin film which exhibits an excellent low reflectivity, a resin film production method, a color filter, a light shielding film, a solid-state imaging element, and an image display device. The resin film of the present invention includes at least two or more resins, a coloring agent, and a photoacid generator, in which the resin film has a peak at which the value of A1/A2 is greater than 0.1 and 2.5 or less in a light scattering measurement of the resin film, in the case where a half-width of the peak is A1 and a scattering angle of a maximum light intensity of the peak is A2 in a spectrum in which a scattering angle is plotted on the horizontal axis and a scattered light intensity is plotted on the vertical axis.

公开(公告)号：US10795260B2

公开(公告)日：2020-10-06

申请号：US15906778

申请日：2018-02-27

Applicant: FUJIFILM Corporation

Inventor： Michihiro Ogawa ,  Hideki Takakuwa ,  Hisamitsu Tomeba

IPC: H01L27/14 ,  H04N5/335 ,  C07C21/18 ,  G03F7/033 ,  H01L27/146 ,  C09D4/06 ,  C08F8/30 ,  G03F7/105 ,  G02B5/00 ,  G03F7/004 ,  C08F2/44 ,  C08L51/08 ,  C08F290/06 ,  G02B5/22 ,  G03F7/038 ,  C08F220/22 ,  C08F220/28 ,  C09D133/16 ,  G02B1/04 ,  G03F7/00 ,  G03F7/031 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  H01L27/148 ,  C08F2/06

Abstract: An object of the present invention is to provide a curable composition satisfying both of excellent low reflectivity and excellent developability, a method for producing a cured film, an infrared color filter provided with a light-shielding film, and a solid-state imaging device.The curable composition of the present invention includes a fluorine-containing polymer including a repeating unit represented by Formula (A) and a repeating unit represented by Formula (B), a polymerizable compound, and a coloring agent. In Formula (A), R1 represents a hydrogen atom or an alkyl group, and L1 represents a divalent chained linking group having 3 or more carbon atoms in total, which may include an ester bond.In Formula (B), R2 represents a hydrogen atom or an alkyl group, L2 represents a single bond or a divalent linking group, and Rf represents a monovalent organic group including an fluorine atom.

公开(公告)号：US10761251B2

公开(公告)日：2020-09-01

申请号：US15915327

申请日：2018-03-08

Applicant: FUJIFILM Corporation

Inventor： Hisamitsu Tomeba ,  Makoto Kubota

IPC: G03F7/039 ,  H01L27/14 ,  G02B5/20 ,  G02B5/22 ,  C08F220/28 ,  G03F7/00 ,  G03F7/105 ,  C08F212/14 ,  C08F220/18 ,  G03F7/20

Abstract: Provided are a resin film which exhibits an excellent low reflectivity, a coloring photosensitive composition capable of forming a resin film which exhibits an excellent low reflectivity, a resin film production method, a color filter, a light shielding film, a solid-state imaging element, and an image display device. The resin film of the present invention includes at least two or more resins, a coloring agent, and a photoacid generator, in which the resin film has a peak at which the value of A1/A2 is greater than 0.1 and 2.5 or less in a light scattering measurement of the resin film, in the case where a half-width of the peak is A1 and a scattering angle of a maximum light intensity of the peak is A2 in a spectrum in which a scattering angle is plotted on the horizontal axis and a scattered light intensity is plotted on the vertical axis.

公开(公告)号：US09818778B2

公开(公告)日：2017-11-14

申请号：US14840160

申请日：2015-08-31

Applicant: FUJIFILM CORPORATION

Inventor： Hisamitsu Tomeba

IPC: H01L27/146 ,  G02B5/22 ,  H04N5/225 ,  H04N9/04

CPC classification number: H01L27/14621 ,  G02B5/223 ,  H01L27/14618 ,  H01L27/14627 ,  H01L27/14636 ,  H01L27/14645 ,  H01L27/14685 ,  H04N5/2254 ,  H04N5/2257 ,  H04N9/045

Abstract: A solid-state image sensor includes a semiconductor substrate, photoelectric conversion elements arranged on a light receiving surface side of the semiconductor substrate and making up pixels, and a filter layer disposed on a light incidence side of the photoelectric conversion elements so as to correspond to the photoelectric conversion elements. The filter layer includes at least red color filters, green color filters, blue color filters and infrared cut-off filters. The infrared cut-off filters are each arranged next to at least one of the red color filters, the green color filters and the blue color filters. The solid-state image sensor suppresses occurrence of deterioration of the spectral characteristics of an adjacent color filter of any of three primary colors.

公开(公告)号：US11169439B2

公开(公告)日：2021-11-09

申请号：US16211715

申请日：2018-12-06

Applicant: FUJIFILM Corporation

Inventor： Hisamitsu Tomeba ,  Kaoru Aoyagi

IPC: G02B5/20 ,  G03F7/004 ,  G03F7/00 ,  G02B5/22 ,  G03F7/027 ,  G02B1/04 ,  G03F7/031 ,  G03F7/033 ,  G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40

Abstract: Provided are a coloring composition capable of producing a film with suppressed occurrence of striation, and a method for producing a film. The coloring composition includes a coloring agent A, a resin B, a polymerizable compound C, a photopolymerization initiator D, and an organic solvent E, in which the organic solvent E includes an ester-based solvent E1 having a surface tension at 25° C. of from 25 mN/m to 35 mN/m, an organic solvent E2 having a surface tension at 25° C. of less than 25 mN/m, a ratio of a mass of the ester-based solvent E1 to the mass of the organic solvent E2 is 80:20 to 30:70 in terms of the ratio of the mass of the ester-based solvent E1:the mass of the organic solvent E2, and the organic solvent E contains 50% by mass or more of a combination of the ester-based solvent E1 and the organic solvent E2 with respect to the total mass of the organic solvent E.

公开(公告)号：US10975250B2

公开(公告)日：2021-04-13

申请号：US15444661

申请日：2017-02-28

Applicant: FUJIFILM Corporation

Inventor： Hisamitsu Tomeba

IPC: G03F7/004 ,  C09D5/32 ,  G03F7/031 ,  C08F2/44 ,  H01L27/14 ,  C08F2/50 ,  C09D4/00 ,  G02B5/22 ,  C09D201/00 ,  C09D7/20 ,  G03F7/038 ,  C09D133/06 ,  G03F7/00 ,  G03F7/027 ,  C09D7/48 ,  C09D133/00 ,  C09D133/10 ,  G02B5/20 ,  G03F7/033 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  H01L27/146 ,  C08K5/06 ,  C08K5/10 ,  C08K3/22

Abstract: The invention relates to provide an infrared shielding composition that can form an infrared cut filter in which flat coating properties are excellent and the generation of a pattern on the surface is suppressed and that has excellent drying resistance, an infrared cut filter, and a solid-state imaging device. The infrared shielding composition according to the invention includes at least metal containing tungsten oxide particles; a resin binder; a solvent A of which a boiling point is 170° C. to 200° C. at 1 atm; and a solvent B different from the solvent A, in which a content of the solvent A is 0.1 to 20 mass % with respect to a total mass of the infrared shielding composition.

公开(公告)号：US10133175B2

公开(公告)日：2018-11-20

申请号：US15209870

申请日：2016-07-14

Applicant: FUJIFILM Corporation

Inventor： Daisuke Kashiwagi ,  Takeshi Andou ,  Satoru Yamada ,  Yasumasa Kawabe ,  Hisamitsu Tomeba

IPC: G03F7/004 ,  G03F7/038 ,  C08F220/18 ,  G02F1/1335 ,  G02B5/20 ,  G03F7/00 ,  G03F7/039 ,  G03F7/32 ,  G03F7/40 ,  H01L51/52 ,  H01L27/32 ,  C08F212/14 ,  C08F220/16 ,  C08F220/28 ,  C08F220/36 ,  G02B1/04 ,  G02B5/22 ,  G03F7/16 ,  G03F7/20 ,  H01L27/146 ,  H01L51/00 ,  H01L51/56

Abstract: Provided are a photosensitive resin composition from which a cured product having a thin film thickness, excellent light-shielding properties, and a high surface hardness is obtained; as well as a cured product obtained by curing the photosensitive resin composition, a cured film and a method for producing the same, a method for producing a resin pattern, and a liquid crystal display device, an organic EL display device, an infrared cut filter, or a solid-state imaging device, each having the cured film. The photosensitive resin composition of the present invention includes (Component A) a polymer having a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group; (Component B) a photoacid generator; (Component C) a solvent; (Component D) a compound having a crosslinkable group and a molecular weight in the range of 100 to 2,000; and (Component S) titanium black.

公开(公告)号：US09599901B2

公开(公告)日：2017-03-21

申请号：US15212936

申请日：2016-07-18

Applicant: FUJIFILM Corporation

Inventor： Daisuke Kashiwagi ,  Takeshi Andou ,  Satoru Yamada ,  Yasumasa Kawabe ,  Hisamitsu Tomeba

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/10 ,  G02B5/20 ,  G03F7/40 ,  G03F7/00 ,  G03F7/004 ,  G03F7/038 ,  H01L51/52 ,  H01L27/32 ,  G02B5/22 ,  G02F1/1335 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  H01L27/146

CPC classification number: G03F7/0397 ,  C08F212/14 ,  C08F220/10 ,  C09B55/002 ,  G02B5/20 ,  G02B5/206 ,  G02B5/208 ,  G02B5/223 ,  G02F1/133516 ,  G03F7/0007 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/168 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  H01L27/14621 ,  H01L27/14623 ,  H01L27/322 ,  H01L51/5253 ,  H01L51/5284

Abstract: Provided is a photosensitive resin composition from which a cured product having thin film thickness, excellent light-shielding properties, and high surface hardness is obtained. A a cured film and a method for producing the same, a method for producing a resin pattern, and an LCD device, an organic EL display device, an infrared cut filter, or a solid-state imaging device are also provided. The photosensitive resin composition includes a polymer component including at least one of categories (1) or (2), a photoacid generator, a solvent, and titanium black, wherein (1) includes (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and (a2) a constitutional unit containing a crosslinkable group, and (2) includes (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and (a2) a constitutional unit containing a crosslinkable group.