公开(公告)号：US20150323824A1

公开(公告)日：2015-11-12

申请号：US14802438

申请日：2015-07-17

Applicant: FUJIFILM Corporation

Inventor： Yoshiaki HISAKADO ,  Masato NAGURA ,  Yu NAITO ,  Rikio INOUE ,  Yutaka ADEGAWA

IPC: G02F1/13363 ,  C08J5/18 ,  G02B1/14 ,  G02B5/30 ,  G02B5/20

CPC classification number: G02F1/13363 ,  B32B2457/202 ,  C08B3/06 ,  C08B3/08 ,  C08B3/16 ,  C08B3/18 ,  C08J5/18 ,  C08J2301/10 ,  C08J2467/03 ,  C08K5/3462 ,  C08K5/5442 ,  C08L1/10 ,  G02B1/14 ,  G02B5/208 ,  G02B5/3033 ,  G02B5/305 ,  G02B5/3083 ,  Y10T428/1036 ,  Y10T428/1041 ,  Y10T428/105 ,  C08L67/03

Abstract: A film of 15 to 45 μm thick containing a cellulose acylate and an aromatic ester oligomer having a repeating unit derived from a dicarboxylic acid and a repeating unit derived from a diol, in which the repeating unit derived from a dicarboxylic acid has a ratio m/n of from 0/10 to 3/7, m and n represent a molar proportion of a repeating unit derived from an aliphatic dicarboxylic acid and an aromatic dicarboxylic acid, respectively, and the film satisfies |Rth(590)|≦50 nm; has a good appearance and is free of deterioration in display performance when the film with a thin thickness is produced in the form of a roll, achieves a high pencil hardness by imparting a high Knoop hardness to the film, even with a hard coat layer provided, and is free of display unevenness on installing the film in a liquid crystal display device.

Abstract translation: 含有纤维素酰化物和具有源自二羧酸的重复单元的芳族酯低聚物和衍生自二元醇的重复单元的15至45μm厚的薄膜，其中衍生自二羧酸的重复单元的比例为m / n为0/10〜3/7，m和n分别表示衍生自脂族二羧酸和芳香族二羧酸的重复单元的摩尔比例，并且该膜满足| Rth（590）|＆nlE; 50nm ; 具有良好的外观，并且当以辊的形式产生厚度薄的膜时，显示性能没有劣化，即使提供硬涂层，也可以通过赋予膜高的努博硬度来实现高铅笔硬度 并且在将膜安装在液晶显示装置中时没有显示不均匀性。

公开(公告)号：US20160091635A1

公开(公告)日：2016-03-31

申请号：US14869252

申请日：2015-09-29

Applicant: FUJIFILM CORPORATION

Inventor： Shuntaro IBUKI ,  Yutaka ADEGAWA

IPC: G02B1/118 ,  B08B1/00 ,  G02B1/14

CPC classification number: G02B1/118 ,  B08B1/006

Abstract: There is provided an antireflection film including an unevenness structure having an average cycle shorter than a visible light wavelength on a transparent substrate film, wherein in the unevenness structure, an average aspect ratio of an average height of convex portions or an average depth of concave portions to an average cycle is from 1.0 to 3.0, a water contact angle to an unevenness structure surface is 100° or more, and a specular reflectance is 2.0% or less.

Abstract translation: 提供一种防反射膜，其具有在透明基板膜上具有比可见光波长短的平均周期的凹凸结构，其中在凹凸结构中，凸部的平均高度的平均纵横比或凹部的平均深度 平均循环为1.0〜3.0，与凹凸结构面的水接触角为100°以上，镜面反射率为2.0％以下。

公开(公告)号：US20150330602A1

公开(公告)日：2015-11-19

申请号：US14713159

申请日：2015-05-15

Applicant: FUJIFILM Corporation

Inventor： Takashi YONEMOTO ,  Hiroyuki YONEYAMA ,  Tatsuya OBA ,  Makoto KAMO ,  Yutaka ADEGAWA

IPC: F21V9/16 ,  C09K11/70 ,  C09K11/02 ,  F21V8/00

CPC classification number: C09K11/703 ,  C09K11/025 ,  F21V9/30 ,  G02B6/0026 ,  G02B6/005 ,  G02B6/0073

Abstract: A wavelength conversion member including a wavelength conversion layer comprising a quantum dot, wherein the wavelength conversion layer includes an organic matrix, and the organic matrix contains a polymer and one or more of compounds selected from the group consisting of compounds represented by general formula (1) and the like; and a quantum dot-containing polymerizable composition containing a quantum dot, a radical polymerizable compound, and one or more of compounds selected from the group consisting of compounds represented by general formula (1) and the like are provided. The wavelength conversion member has an excellent light resistance and the composition has an excellent photocurability which enables a production of a wavelength conversion member containing a quantum dot which has a less tendency to lower its light emission intensity.

Abstract translation: 一种波长转换构件，包括包括量子点的波长转换层，其中所述波长转换层包括有机基质，并且所述有机基质含有聚合物和一种或多种选自由通式（1）表示的化合物 ）等; 提供了含有量子点，自由基聚合性化合物和选自由通式（1）表示的化合物等的一种或多种化合物的量子点可聚合组合物。 该波长转换构件具有优异的耐光性，并且组合物具有优异的光固化性，其能够制造包含量子点的波长转换构件，其具有较低的发光强度降低的倾向。

公开(公告)号：US20180224579A1

公开(公告)日：2018-08-09

申请号：US15944173

申请日：2018-04-03

Applicant: FUJIFILM Corporation

Inventor： Shuntaro IBUKI ,  Yutaka ADEGAWA

IPC: G02B1/118

CPC classification number: G02B1/118 ,  B08B1/006

Abstract: There is provided an antireflection film including an unevenness structure having an average cycle shorter than a visible light wavelength on a transparent substrate film, wherein in the unevenness structure, an average aspect ratio of an average height of convex portions or an average depth of concave portions to an average cycle is from 1.0 to 3.0, a water contact angle to an unevenness structure surface is 100° or more, and a specular reflectance is 2.0% or less.

公开(公告)号：US20140093741A1

公开(公告)日：2014-04-03

申请号：US14040123

申请日：2013-09-27

Applicant: FUJIFILM Corporation

Inventor： Kenichi FUKUDA ,  Yutaka ADEGAWA

IPC: G02B1/11 ,  G02B1/10

CPC classification number: G02B1/111 ,  G02B1/105 ,  G02B1/14 ,  G02B5/3033 ,  Y10T428/31884 ,  Y10T428/31913 ,  Y10T428/31938

Abstract: There is provided a hardcoat film including a hardcoat layer provided at least one surface-side of a transparent support, wherein the hardcoat layer is formed from a hardcoat layer-forming composition containing a compound having a cyclic aliphatic hydrocarbon group and three or more ethylenically unsaturated double bond groups in a molecule of the compound, and a polymerization initiator.

Abstract translation: 提供一种硬涂层，其包括设置有透明支撑体的至少一个表面侧的硬涂层，其中硬涂层由含有环状脂族烃基和三个或更多个烯属不饱和基团的化合物的硬涂层形成组合物形成 化合物分子中的双键基团和聚合引发剂。