公开(公告)号：US12077680B2

公开(公告)日：2024-09-03

申请号：US17197246

申请日：2021-03-10

Applicant: FUJIMI INCORPORATED

Inventor： Akiko Soumiya

IPC: C09G1/02 ,  H01L21/321

CPC classification number: C09G1/02 ,  H01L21/3212

Abstract: The present invention is to provide means for polishing an object to be polished containing titanium nitride at a high polishing speed. The present invention relates to a polishing composition containing silica particles and a polishing accelerator, wherein the polishing accelerator is a compound having an aromatic heterocyclic ring and an OH group or a group of a salt thereof directly bonded to the aromatic heterocyclic ring, or a compound having an aromatic hydrocarbon ring, an OH group or a group of a salt thereof directly bonded to the aromatic hydrocarbon ring, and a COOH group or a group of a salt thereof directly bonded to the aromatic hydrocarbon ring, and the polishing composition is used for polishing an object to be polished containing titanium nitride.

公开(公告)号：US11339312B2

公开(公告)日：2022-05-24

申请号：US17208803

申请日：2021-03-22

Applicant: FUJIMI INCORPORATED

Inventor： Akiko Soumiya

IPC: C09G1/02 ,  H01L21/3105 ,  H01L21/306

Abstract: The present invention provides means capable of improving an effect of inhibiting polishing of silicon nitride. The present invention relates to a polishing composition containing a cationically modified silica particles, a non-aromatic crosslinked cyclic compound having an organic acid group or a group of a salt thereof, and water.