公开(公告)号：US20200076010A1

公开(公告)日：2020-03-05

申请号：US16560172

申请日：2019-09-04

Applicant: Faraday Technology, Inc.

Inventor： Earl Jennings Taylor ,  Maria E. Inman ,  Timothy D. Hall ,  Danny Xin Liu

IPC: H01M10/44 ,  C25C7/06 ,  H01M4/04 ,  H01M10/052

Abstract: The problem of high rate electrodeposition of metals such as copper during electrowinning operations or high rate charging of lithium or zinc electrodes for rechargeable battery applications while avoiding the adverse effects of dendrite formation such as causing short-circuiting and/or poor deposit morphology is solved by pulse reverse current electrodeposition or charging whereby the forward cathodic (electrodeposition or charging) pulse current is “tuned” to minimize dendrite formation for example by creating a smaller pulsating boundary layer and thereby minimizing mass transport effects leading to surface asperities and the subsequent reverse anodic (electropolishing) pulse current is “tuned” to eliminate the micro- and macro-asperities leading to dendrites.

公开(公告)号：US20220376317A1

公开(公告)日：2022-11-24

申请号：US17852444

申请日：2022-06-29

Applicant: Faraday Technology, Inc.

Inventor： Earl Jennings Taylor ,  Maria E. Inman ,  Timothy D. Hall ,  Danny Xin Liu

IPC: H01M10/44 ,  H01M10/052 ,  H01M4/04 ,  C25C7/06

Abstract: The problem of high rate electrodeposition of metals such as copper during electrowinning operations or high rate charging of lithium or zinc electrodes for rechargeable battery applications while avoiding the adverse effects of dendrite formation such as causing short-circuiting and/or poor deposit morphology is solved by pulse reverse current electrodeposition or charging whereby the forward cathodic (electrodeposition or charging) pulse current is “tuned” to minimize dendrite formation for example by creating a smaller pulsating boundary layer and thereby minimizing mass transport effects leading to surface asperities and the subsequent reverse anodic (electropolishing) pulse current is “tuned” to eliminate the micro- and macro-asperities leading to dendrites.

公开(公告)号：US11411258B2

公开(公告)日：2022-08-09

申请号：US16560172

申请日：2019-09-04

Applicant: Faraday Technology, Inc.

Inventor： Earl Jennings Taylor ,  Maria E. Inman ,  Timothy D. Hall ,  Danny Xin Liu

IPC: C25C7/06 ,  H01M10/44 ,  H01M10/052 ,  H01M4/04

Abstract: The problem of high rate electrodeposition of metals such as copper during electrowinning operations or high rate charging of lithium or zinc electrodes for rechargeable battery applications while avoiding the adverse effects of dendrite formation such as causing short-circuiting and/or poor deposit morphology is solved by pulse reverse current electrodeposition or charging whereby the forward cathodic (electrodeposition or charging) pulse current is “tuned” to minimize dendrite formation for example by creating a smaller pulsating boundary layer and thereby minimizing mass transport effects leading to surface asperities and the subsequent reverse anodic (electropolishing) pulse current is “tuned” to eliminate the micro- and macro-asperities leading to dendrites.

公开(公告)号：US20240030583A1

公开(公告)日：2024-01-25

申请号：US18353265

申请日：2023-07-17

Applicant: Faraday Technology, Inc.

Inventor： Danny Xin Liu ,  Holly Garich ,  Timothy D. Hall ,  Earl Jennings Taylor

IPC: H01P11/00 ,  C25D1/02 ,  C25D21/12

CPC classification number: H01P11/002 ,  C25D1/02 ,  C25D21/12

Abstract: A method of manufacturing a corrugated copper microwave waveguide comprising placing a mandrel with external corrugations in an electrolyte bath substantially devoid of brighteners, accelerators, or levelers and including copper ions, sulfuric acid, chloride, and polyethylene glycol. The mandrel is placed proximate a copper anode in the bath. One or more waveforms are applied to the mandrel and anode to control electrodeposition distribution of copper to the mandrel rather than controlling the electrolyte bath chemistry. The mandrel and the resulting electroformed waveguide are removed from the electrolyte bath and the mandrel is excised (e.g., dissolved) resulting in a microwave waveguide with internal corrugations. Substantially devoid of additives (brighteners, accelerators, and/or levelers) generally means not having to repeatedly meter in additives during the electroforming process.

公开(公告)号：US11702759B2

公开(公告)日：2023-07-18

申请号：US17399148

申请日：2021-08-11

Applicant: Faraday Technology, Inc.

Inventor： Timothy D. Hall ,  Holly M. Garich ,  Heather McCrabb ,  Earl Jennings Taylor

IPC: C25F3/16 ,  C25F7/00 ,  B33Y40/20 ,  B22F10/25 ,  B22F10/28

CPC classification number: C25F3/16 ,  B33Y40/20 ,  C25F7/00 ,  B22F10/25 ,  B22F10/28 ,  B22F2998/10 ,  B22F10/28 ,  B22F10/62 ,  B22F2003/241

Abstract: A method of and system for surface finishing an additive manufactured part. A part having a surface roughness with macroasperities is placed in a chamber with an electrolyte and an electrode. A pulse/pulse reverse power supply is connected to the part rendering it anodic and connected to the electrode rendering it cathodic. The power supply is operated to decrease the surface roughness of the part by applying a first series of waveforms including at least two waveforms where a diffusion layer is maintained at a thickness to produce a macroprofile regime relative to the macroasperities, the first series of waveforms having anodic voltages applied for anodic time periods before cathodic voltages applied for cathodic time periods to effect part surface smoothing to a first surface roughness with minimal material removal and applying a final waveform where the diffusion layer represents a microprofile regime, the final waveform having a final anodic voltage applied for a final anodic time period before a final cathodic voltage applied for a final cathodic time period to effect part surface smoothing to a final surface roughness with minimal material removal.

公开(公告)号：US20250055001A1

公开(公告)日：2025-02-13

申请号：US18755001

申请日：2024-06-26

Applicant: Faraday Technology, Inc.

Inventor： Danny Xin Liu ,  Timothy D. Hall ,  Maria E. Inman ,  Holly M. Garich ,  Earl Jennings Taylor

IPC: H01M6/36 ,  H01M4/06 ,  H01M6/16

Abstract: A battery includes a first chamber with a first electrode and a second chamber with a second electrode. An intercalation membrane between the first chamber and the second chamber is configured to retain an electrolyte in the first chamber and to accept therein migrating ions of the electrolyte in the presence of an electrical field and lose mechanical integrity permitting the electrolyte to enter the second chamber in order to activate the battery.

公开(公告)号：US20230121487A1

公开(公告)日：2023-04-20

申请号：US17953885

申请日：2022-09-27

Applicant: Faraday Technology, Inc.

Inventor： Dan Wang ,  Timothy David Hall ,  Maria E. Inman ,  Rajeswaran Radhakrishnan ,  Earl Jennings Taylor

IPC: C25D9/04 ,  C25D5/18

Abstract: A method of coating a substrate, the method comprises adding a nanocarbon material to an electrophoretic solution in an electrophoretic deposition apparatus including the substrate and an electrode spaced from the substrate, and applying a current to the substrate and the electrode to deposit the nanocarbon material onto the substrate.

公开(公告)号：US20220002895A1

公开(公告)日：2022-01-06

申请号：US17399148

申请日：2021-08-11

Applicant: Faraday Technology, Inc.

Inventor： Timothy D. Hall ,  Holly M. Garich ,  Heather McCrabb ,  Earl Jennings Taylor

IPC: C25F3/16 ,  C25F7/00 ,  B33Y40/20

Abstract: A method of and system for surface finishing an additive manufactured pint. A part having a surface roughness with macroasperities is placed in a chamber with an electrolyte and an electrode. A pulse/pulse reverse power supply is connected to the part rendering it anodic and connected to the electrode rendering it cathodic. The power supply is operated to decrease the surface roughness of the part by applying a first series of waveforms including at least two waveforms where a diffusion layer is maintained at a thickness to produce a macroprofile regime relative to the macroasperities, the first series of waveforms having anodic voltages applied for anodic time periods before cathodic voltages applied for cathodic time periods to effect part surface smoothing to a first surface roughness with minimal material removal and applying a final waveform where the diffusion layer represents a microprofile regime, the final waveform having a final anodic voltage applied for a final anodic time period before a final cathodic voltage applied for a final cathodic time period to effect part surface smoothing to a final surface roughness with minimal material removal.

公开(公告)号：US11527782B1

公开(公告)日：2022-12-13

申请号：US17852444

申请日：2022-06-29

Applicant: Faraday Technology, Inc.

Inventor： Earl Jennings Taylor ,  Maria E. Inman ,  Timothy D. Hall ,  Danny Xin Liu

IPC: H01M10/44 ,  H01M10/052 ,  H01M4/04 ,  C25C7/06

Abstract: The problem of high rate electrodeposition of metals such as copper during electrowinning operations or high rate charging of lithium or zinc electrodes for rechargeable battery applications while avoiding the adverse effects of dendrite formation such as causing short-circuiting and/or poor deposit morphology is solved by pulse reverse current electrodeposition or charging whereby the forward cathodic (electrodeposition or charging) pulse current is “tuned” to minimize dendrite formation for example by creating a smaller pulsating boundary layer and thereby minimizing mass transport effects leading to surface asperities and the subsequent reverse anodic (electropolishing) pulse current is “tuned” to eliminate the micro- and macro-asperities leading to dendrites.

公开(公告)号：US11118283B2

公开(公告)日：2021-09-14

申请号：US16774232

申请日：2020-01-28

Applicant: Faraday Technology, Inc.

Inventor： Timothy D. Hall ,  Holly M. Garich ,  Heather McCrabb ,  Earl Jennings Taylor

IPC: C25F3/16 ,  C25F7/00 ,  B33Y40/20

Abstract: A method of and system for surface finishing an additive manufactured part. A part having a surface roughness with macroasperities is placed in a chamber with an electrolyte and an electrode. A pulse/pulse reverse power supply is connected to the part rendering it anodic and connected to the electrode rendering it cathodic. The power supply is operated to decrease the surface roughness of the part by applying a first series of waveforms including at least two waveforms where a diffusion layer is maintained at a thickness to produce a macroprofile regime relative to the macroasperities, the first series of waveforms having anodic voltages applied for anodic time periods before cathodic voltages applied for cathodic time periods to effect part surface smoothing to a first surface roughness with minimal material removal and applying a final waveform where the diffusion layer represents a microprofile regime, the final waveform having a final anodic voltage applied for a final anodic time period before a final cathodic voltage applied for a final cathodic time period to effect part surface smoothing to a final surface roughness with minimal material removal.