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    Alignment Measurement Arrangement, Alignment Measurement Method, Device Manufacturing Method and Lithographic Apparatus
    1.
    发明申请
    Alignment Measurement Arrangement, Alignment Measurement Method, Device Manufacturing Method and Lithographic Apparatus 审中-公开
    对准测量布置，对准测量方法，器件制造方法和平版印刷设备

    公开(公告)号：US20100245792A1

    公开(公告)日：2010-09-30

    申请号：US12730764

    申请日：2010-03-24

    申请人： Franciscus Godefridus Casper BIJNEN ,  Richard Johannes Franciscus VAN HAREN ,  Xiuhong WEI

    发明人： Franciscus Godefridus Casper BIJNEN ,  Richard Johannes Franciscus VAN HAREN ,  Xiuhong WEI

    IPC分类号： G03B27/42 ,  H04N7/18

    CPC分类号： G03B27/42 ,  G03F9/7046 ,  G03F9/7088 ,  G03F9/7092

    摘要： An alignment measurement arrangement includes a source, an optical system and a detector. The source generates a radiation beam with a plurality of wavelength ranges. The optical system receives the radiation beam, produces an alignment beam, directs the alignment beam to a mark located on an object, receives alignment radiation back from the mark, and transmits the received radiation. The detector receives the alignment radiation and detects an image of the alignment mark and outputs a plurality of alignment signals, r, each associated with one of the wavelength ranges. A processor, in communication with the detector, receives the alignment signals, determines signal qualities of the alignment signals; determines aligned positions of the alignment signals, and calculates a position of the alignment mark based on the signal qualities, aligned positions, and a model relating the aligned position to the range of wavelengths and mark characteristics, including mark depth and mark asymmetry.

    摘要翻译： 对准测量装置包括源，光学系统和检测器。 源产生具有多个波长范围的辐射束。 光学系统接收辐射束，产生对准光束，将对准光束引导到位于物体上的标记，从标记接收对准辐射，并发送接收到的辐射。 检测器接收对准辐射并检测对准标记的图像，并输出多个与波长范围之一相关联的对准信号r。 与检测器通信的处理器接收对准信号，确定对准信号的信号质量; 确定对准信号的对准位置，并且基于信号质量，对准位置以及与对准位置相关联的波长范围和标记特征（包括标记深度和标记不对称性）来计算对准标记的位置。

    Method of Creating an Alignment Mark on a Substrate and Substrate
    3.
    发明申请
    Method of Creating an Alignment Mark on a Substrate and Substrate 有权
    在基板和基板上创建对准标记的方法

    公开(公告)号：US20090166899A1

    公开(公告)日：2009-07-02

    申请号：US12345113

    申请日：2008-12-29

    申请人： Richard Johannes Franciscus VAN HAREN

    发明人： Richard Johannes Franciscus VAN HAREN

    IPC分类号： H01L23/544 ,  H01L21/76 ,  H01L21/44

    CPC分类号： G03F9/7049 ,  G03F9/7076 ,  G03F9/7084 ,  H01L23/544 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

    摘要： In an embodiment, a method of creating an alignment mark on a substrate includes forming a plurality of lines segmented into electrically conducting line segments and space segments, thereby forming spaces between the lines to form a macroscopic structure in a first layer of the substrate, creating a plurality of electrically conducting trenches in a second layer of the substrate, and arranging the plurality of trenches to be in electrical contact with the line segments and overlapping the space segments at least partially.

    摘要翻译： 在一个实施例中，在衬底上产生对准标记的方法包括形成分割成导电线段和空间段的多条线，从而在线之间形成空间，以在衬底的第一层中形成宏观结构，从而产生 在所述衬底的第二层中的多个导电沟槽，以及将所述多个沟槽布置成与所述线段电接触并且至少部分地与所述空间段重叠。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD WITH DOUBLE EXPOSURE OVERLAY CONTROL
    4.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD WITH DOUBLE EXPOSURE OVERLAY CONTROL 有权
    具有双重曝光覆盖控制的平面设备和设备制造方法

    公开(公告)号：US20100141916A1

    公开(公告)日：2010-06-10

    申请号：US12705050

    申请日：2010-02-12

    申请人： Maurits VAN DER SCHAAR ,  Richard Johannes Franciscus VAN HAREN

    发明人： Maurits VAN DER SCHAAR ,  Richard Johannes Franciscus VAN HAREN

    IPC分类号： G03B27/42

    CPC分类号： G03F7/0035 ,  G03B27/42 ,  G03F7/70466 ,  G03F9/7084

    摘要： A device manufacturing method includes a transfer of a pattern from a patterning device onto a substrate. The device manufacturing method further includes transferring a pattern of a main mark to a base layer for forming an alignment mark; depositing a pattern receiving layer on the base layer; in a first lithographic process, aligning, by using the main mark, a first mask that includes a first pattern and a local mark pattern, and transferring the first pattern and the local mark pattern to the pattern receiving layer; aligning, by using the local mark pattern, a second mask including a second pattern relative to the pattern receiving layer; andin a second lithographic process, transferring the second pattern to the pattern receiving layer; the first and second patterns being configured to form an assembled pattern.

    摘要翻译： 一种器件制造方法包括将图案从图案形成装置转移到衬底上。 所述器件制造方法还包括将主标记的图案转印到用于形成对准标记的基底层; 在基层上沉积图案接收层; 在第一光刻工艺中，通过使用主标记对准包括第一图案和局部标记图案的第一掩模，并将第一图案和局部标记图案转印到图案接收层; 通过使用本地标记图案，相对于图案接收层对准包括第二图案的第二掩模; 并在第二光刻工艺中将第二图案转印到图案接收层; 第一和第二图案被配置成形成组装图案。