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    Composition for an etching mask comprising a silicon-containing material
    1.
    发明申请
    Composition for an etching mask comprising a silicon-containing material 有权
    包含含硅材料的蚀刻掩模的组合物

    公开(公告)号：US20050192421A1

    公开(公告)日：2005-09-01

    申请号：US10789319

    申请日：2004-02-27

    申请人： Frank Xu ,  Michael Miller ,  Michael Watts

    发明人： Frank Xu ,  Michael Miller ,  Michael Watts

    IPC分类号： C08L83/04 ,  C08L83/06

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： The present invention includes a composition for a silicon-containing material used as an etch mask for underlying layers. More specifically, the silicon-containing material may be used as an etch mask for a patterned imprinted layer comprising protrusions and recessions. To that end, in one embodiment of the present invention, the composition includes a hydroxyl-functional silicone component, a cross-linking component, a catalyst component, and a solvent. This composition allows the silicon-containing material to selectively etch the protrusions and the segments of the patterned imprinting layer in superimposition therewith, while minimizing the etching of the segments in superposition with the recessions, and therefore allowing an in-situ hardened mask to be created by the silicon-containing material, with the hardened mask and the patterned imprinting layer forming a substantially planarized profile.

    摘要翻译： 本发明包括用作下层的蚀刻掩模的含硅材料用组合物。 更具体地，含硅材料可以用作包括突起和凹陷的图案化印记层的蚀刻掩模。 为此，在本发明的一个实施方案中，组合物包括羟基官能的硅氧烷组分，交联组分，催化剂组分和溶剂。 该组合物允许含硅材料与图案化压印层的突起和段的叠加选择性地蚀刻，同时最小化与凹陷叠加的段的蚀刻，并且因此允许形成原位硬化的掩模 通过含硅材料，硬化的掩模和图案化的压印层形成基本平坦化的轮廓。

    Imprint lithography template having a coating to reflect and/or absorb actinic energy
    3.
    发明申请
    Imprint lithography template having a coating to reflect and/or absorb actinic energy 审中-公开
    具有反射和/或吸收光化能的涂层的印记光刻模板

    公开(公告)号：US20060266916A1

    公开(公告)日：2006-11-30

    申请号：US11136897

    申请日：2005-05-25

    申请人： Michael Miller ,  Edward Fletcher ,  Nicholas Stacey ,  Michael Watts ,  Ian McMackin

    发明人： Michael Miller ,  Edward Fletcher ,  Nicholas Stacey ,  Michael Watts ,  Ian McMackin

    IPC分类号： B29C35/12

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention is directed towards a template, transmissive to energy having a predetermined wavelength, having first and second opposed sides and features a coating disposed thereon to limit the volume of the template through which the energy may propagate. In a first embodiment, the template includes, inter alia, a mold, having a plurality of protrusions and recessions, positioned on a first region of the first side; and a coating positioned upon a second region of the first side, with the coating having properties to block the energy from propagating between the first and second opposed sides.

    摘要翻译： 本发明涉及一种对具有预定波长的能量透射的模板，其具有第一和第二相对侧，并且具有设置在其上的涂层，以限制能量可以传播的模板的体积。 在第一实施例中，模板尤其包括定位在第一侧的第一区域上的具有多个突起和凹陷的模具; 以及位于所述第一侧的第二区域上的涂层，所述涂层具有阻挡能量在所述第一和第二相对侧之间传播的性质。

    Method of forming a deep-featured template employed in imprint lithography
    4.
    发明申请
    Method of forming a deep-featured template employed in imprint lithography 审中-公开
    形成压印光刻中使用的深度特征模板的方法

    公开(公告)号：US20050230882A1

    公开(公告)日：2005-10-20

    申请号：US10827118

    申请日：2004-04-19

    申请人： Michael Watts ,  Nicholas Stacey ,  Michael Miller

    发明人： Michael Watts ,  Nicholas Stacey ,  Michael Miller

    IPC分类号： B29C35/08 ,  B44C1/165 ,  G03F7/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention is directed to a method of forming a pattern on a plate employing a mold. The method includes placing the plate in superimposition with said mold. Formable material is positioned between that plate and the mold. A pattern is formed in the formable material having a shape complementary to the shape of the mold, defining patterned material. The patterned material is then adhered to the plate.

    摘要翻译： 本发明涉及一种在使用模具的板上形成图案的方法。 该方法包括将板放置在与所述模具重叠的位置。 可成型材料位于该板和模具之间。 在具有与模具形状互补的形状的成形材料中形成图案，限定图案化材料。 然后将图案化的材料粘附到板上。

    Composition to reduce adhesion between a conformable region and a mold
    5.
    发明申请
    Composition to reduce adhesion between a conformable region and a mold 有权
    组合物以减少适形区域和模具之间的粘附

    公开(公告)号：US20060111454A1

    公开(公告)日：2006-05-25

    申请号：US11068171

    申请日：2005-02-28

    申请人： Frank Xu ,  Michael Miller

    发明人： Frank Xu ,  Michael Miller

    IPC分类号： B01F17/00 ,  B01F3/08

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention provides compositions that feature improved preferential adhesion and release characteristics with respect to a substrate and a mold having imprinting material disposed therebetween. To that end, the compositions facilitate bifurcation of the imprinting into a surfactant-component-rich sub-portion and a surfactant-component-depleted sub-portion located between said surfactant-component-rich sub-portion and said substrate. This surfactant-component-rich sub-portion attenuates the adhesion forces between the mold and the imprinting material, once solidified.

    摘要翻译： 本发明提供了相对于基底和具有设置在其间的压印材料的模具具有改进的优先粘附和释放特性的组合物。 为此，组合物有利于将压印物分成富含表面活性剂组分的亚部分和位于所述富表面活性剂组分的子部分和所述底物之间的表面活性剂组分贫乏的子部分。 该表面活性剂成分丰富的子部分一旦固化，就会使模具和压印材料之间的粘合力衰减。

    Composition to Reduce Adhesion Between a Conformable Region and a Mold
    6.
    发明申请
    Composition to Reduce Adhesion Between a Conformable Region and a Mold 审中-公开
    降低适形区域和模具之间粘合性的成分

    公开(公告)号：US20070272825A1

    公开(公告)日：2007-11-29

    申请号：US11837757

    申请日：2007-08-13

    申请人： Frank Xu ,  Michael Miller

    发明人： Frank Xu ,  Michael Miller

    IPC分类号： B28B7/36

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention provides compositions that feature improved preferential adhesion and release characteristics with respect to a substrate and a mold having imprinting material disposed therebetween. To that end, the compositions facilitate bifurcation of the imprinting into a surfactant-component-rich sub-portion and a surfactant-component-depleted sub-portion located between said surfactant-component-rich sub-portion and said substrate. This surfactant-component-rich sub-portion attenuates the adhesion forces between the mold and the imprinting material, once solidified.

    摘要翻译： 本发明提供了相对于基底和具有设置在其间的压印材料的模具具有改进的优先粘附和释放特性的组合物。 为此，组合物有利于将压印物分成富含表面活性剂组分的亚部分和位于所述富表面活性剂组分的子部分和所述底物之间的表面活性剂组分贫乏的子部分。 该表面活性剂成分丰富的子部分一旦固化，就会使模具和压印材料之间的粘合力衰减。

    Method to reduce adhesion between a conformable region and a mold
    7.
    发明申请
    Method to reduce adhesion between a conformable region and a mold 审中-公开
    降低适形区域和模具之间的粘合力的方法

    公开(公告)号：US20060108710A1

    公开(公告)日：2006-05-25

    申请号：US11068174

    申请日：2005-02-28

    申请人： Frank Xu ,  Michael Miller

    发明人： Frank Xu ,  Michael Miller

    IPC分类号： B29C59/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention provides a method that features improved preferential adhesion and release characteristics with respect to a substrate and a mold having imprinting material disposed therebetween. To that end, the method includes locating the imprinting material between the mold and the substrate so as to be bifurcated into a surfactant-component-rich sub-portion and a surfactant-component-depleted sub-portion located between said surfactant-component-rich sub-portion and said substrate. This surfactant-component-rich sub-portion attenuates the adhesion forces between mold and the imprinting material, once solidified.

    摘要翻译： 本发明提供一种方法，其具有相对于基底和在其间设置有印记材料的模具具有改进的优先粘附和释放特性。 为此，该方法包括将印模材料定位在模具和基底之间，以便分成富表面活性剂组分的部分和表面活性剂成分贫乏的部分，该部分位于所述表面活性剂组分富含 子部分和所述衬底。 该表面活性剂成分丰富的子部分一旦固化就会使模具和压印材料之间的粘合力衰减。

    Floatation device for vessel
    9.
    外观设计
    Floatation device for vessel 有权

    公开(公告)号：USD1036354S1

    公开(公告)日：2024-07-23

    申请号：US29919054

    申请日：2023-12-01

    申请人： Michael Miller

    设计人： Michael Miller

    摘要： FIG. 1 is a perspective view of a floating device for a vessel;
    FIG. 2 is a front view of the floatation device for vessel of FIG. 1;
    FIG. 3 is a back view of the floatation device for vessel of FIG. 1;
    FIG. 4 is a first side view of the floatation device for vessel of FIG. 1;
    FIG. 5 is a second side view of the floatation device for vessel of FIG. 1;
    FIG. 6 is a top view of the floatation device for vessel of FIG. 1; and,
    FIG. 7 is a bottom view of the floatation device for vessel of FIG. 1.
    The broken lines shown are included for the purpose of illustrating portions of the article which form no part of the claimed design.