Illumination device, and coordinate measuring instrument having an illumination device
    1.
    发明授权
    Illumination device, and coordinate measuring instrument having an illumination device 有权
    照明装置和具有照明装置的坐标测量仪器

    公开(公告)号:US07209243B2

    公开(公告)日:2007-04-24

    申请号:US10776256

    申请日:2004-02-12

    IPC分类号: G01B11/14

    摘要: A coordinate measuring instrument includes a horizontally X-Y displaceable measurement stage for receiving a substrate with a feature that is to be measured, an illumination system, and a detector device. The illumination system includes a light source, an optical fiber bundle, a coupling-in optical system before the optical fiber bundle, a coupling-out optical system after the optical fiber bundle, an illuminating optical system for illuminating an image field, and a homogenizing optical system which is arranged between said coupling-out optical system and said illuminating optical system. The homogenizing optical system homogenizes the non-uniform intensity distribution in the image field of the light emerging from the optical fiber bundle. The light of said light source is picked off via said coupling-in optical system with a large numerical entrance aperture, and is coupled into said optical fiber bundle. The detector device determines the values of X and Y coordinates of the feature within the X-Y displaceable measurement stage.

    摘要翻译: 坐标测量仪器包括用于接收具有要测量的特征的基板的水平X-Y可移位的测量台,照明系统和检测器装置。 照明系统包括光源,光纤束,光纤束前的耦合光学系统,光纤束之后的耦合出光学系统,用于照明图像场的照明光学系统,以及均匀化 光学系统,其布置在所述耦合输出光学系统和所述照明光学系统之间。 均匀化光学系统均匀化从光纤束出射的光的图像场中的不均匀强度分布。 所述光源的光通过具有大数值入口孔的所述耦合入光学系统被拾取,并且耦合到所述光纤束中。 检测器装置确定X-Y可置换测量阶段内的特征的X和Y坐标的值。

    Illumination device; and coordinate measuring instrument having an illumination device
    2.
    发明授权
    Illumination device; and coordinate measuring instrument having an illumination device 有权
    照明装置; 和具有照明装置的坐标测量仪器

    公开(公告)号:US06975409B2

    公开(公告)日:2005-12-13

    申请号:US09893998

    申请日:2001-06-29

    摘要: An illumination device according to the present invention comprises a light source (1), an optical fiber bundle (4), a coupling-in optical system (3) before and a coupling-out optical system (5) after the fiber bundle (4), and an illuminating optical system (17; 20). A homogenizing optical system (6) between the coupling-out optical system (5) and illuminating optical system (17; 20) brings about a homogenization of the intensity distribution in the image field. The homogenizing optical system (6) advantageously comprises a micro-honeycomb condenser (7) and a lens member (8) which superimpose the exit opening of the fiber bundle (4) in an intermediate image plane (10) to form a homogeneous intermediate image. The coordinate measuring instrument comprises an X-Y measurement stage (26) for receiving a substrate with a feature (31) that is to be measured, an illumination system with a light source (1), an optical fiber bundle (4), a coupling-in optical system (3), a coupling-out optical system (5), an illuminating optical system (17; 20) for illuminating an image field on the substrate, and a detector device (14) for determining the position of the feature. A homogenizing optical system (6) between the coupling-out optical system (5) and illuminating optical system (17; 20) brings about a homogenization of the intensity distribution in the image field.

    摘要翻译: 根据本发明的照明装置包括光源(1),光纤束(4),之前的耦合光学系统(3)和光纤束(4)之后的耦合光学系统(5) )和照明光学系统(17; 20)。 耦合出光学系统(5)和照明光学系统(17; 20)之间的均匀化光学系统(6)导致图像场中强度分布的均匀化。 均匀化光学系统(6)有利地包括微蜂窝聚光器(7)和将纤维束(4)的出口开口叠加在中间图像平面(10)中的透镜构件(8),以形成均匀的中间图像 。 坐标测量仪器包括用于接收具有要被测量的特征(31)的基板的XY测量台(26),具有光源(1)的光照系统,光纤束(4),耦合 - 在光学系统(3)中,耦合输出光学系统(5),用于照射基板上的图像场的照明光学系统(17; 20)以及用于确定特征位置的检测器装置(14)。 耦合出光学系统(5)和照明光学系统(17; 20)之间的均匀化光学系统(6)导致图像场中强度分布的均匀化。

    Apparatus for the optical inspection of wafers
    3.
    发明授权
    Apparatus for the optical inspection of wafers 有权
    用于光学检查晶片的装置

    公开(公告)号:US08451440B2

    公开(公告)日:2013-05-28

    申请号:US12716612

    申请日:2010-03-03

    IPC分类号: G01N21/00 G01N21/95

    CPC分类号: G01N21/9501 G01N2021/8825

    摘要: An apparatus (1) for the optical inspection of wafers is disclosed, which comprises an assembly unit (10) which carries optical elements (30, 31, 32, 33) of at least one illumination path (3) for a bright field illumination and optical elements (50, 51, 52, 60, 61, 62, 70, 71, 72, 80, 81, 82) of at least one illumination path (5, 6, 7, 8) for a dark field illumination. The assembly unit (10) furthermore carries plural optical elements (91, 92, 93, 94, 95, 96, 97, 98, 99, 100) of at least one detection path (91, 92). An imaging optical element (32) of the at least one illumination path (3) for the bright field illumination (30), imaging optical elements (51, 61, 71, 81) of the at least one illumination path for the dark field illumination, and imaging optical elements (91, 95, 96) of the at least one detection path (9) are designed in such a way that all illumination paths (3, 5, 6, 7, 8) and all detection paths (91, 92) are telecentric.

    摘要翻译: 公开了一种用于光学检查晶片的设备(1),其包括:组装单元(10),其承载用于明场照明的至少一个照明路径(3)的光学元件(30,31,32,33),以及 用于暗场照明的至少一个照明路径(5,6,7,8)的光学元件(50,51,52,60,61,62,70,71,72,80,81,82)。 组装单元(10)还承载至少一个检测路径(91,92)的多个光学元件(91,92,93,94,95,96,97,98,99,100)。 用于明场照明(30)的至少一个照明路径(3)的成像光学元件(32),用于暗场照明的至少一个照明路径的成像光学元件(51,61,71,81) ,并且所述至少一个检测路径(9)的成像光学元件(91,95,96)被设计成使得所有照明路径(3,5,6,7,8)和所有检测路径(91, 92)是远心的。

    Apparatus for the Optical Inspection of Wafers
    4.
    发明申请
    Apparatus for the Optical Inspection of Wafers 有权
    晶圆光学检测装置

    公开(公告)号:US20100295938A1

    公开(公告)日:2010-11-25

    申请号:US12716612

    申请日:2010-03-03

    IPC分类号: H04N7/18

    CPC分类号: G01N21/9501 G01N2021/8825

    摘要: An apparatus (1) for the optical inspection of wafers is disclosed, which comprises an assembly unit (10) which carries optical elements (30, 31, 32, 33) of at least one illumination path (3) for a bright field illumination and optical elements (50, 51, 52, 60, 61, 62, 70, 71, 72, 80, 81, 82) of at least one illumination path (5, 6, 7, 8) for a dark field illumination. The assembly unit (10) furthermore carries plural optical elements (91, 92, 93, 94, 95, 96, 97, 98, 99, 100) of at least one detection path (91, 92). An imaging optical element (32) of the at least one illumination path (3) for the bright field illumination (30), imaging optical elements (51, 61, 71, 81) of the at least one illumination path for the dark field illumination, and imaging optical elements (91, 95, 96) of the at least one detection path (9) are designed in such a way that all illumination paths (3, 5, 6, 7, 8) and all detection paths (91, 92) are telecentric.

    摘要翻译: 公开了一种用于光学检查晶片的设备(1),其包括:组装单元(10),其承载用于明场照明的至少一个照明路径(3)的光学元件(30,31,32,33),以及 用于暗场照明的至少一个照明路径(5,6,7,8)的光学元件(50,51,52,60,61,62,70,71,72,80,81,82)。 组装单元(10)还承载至少一个检测路径(91,92)的多个光学元件(91,92,93,94,95,96,97,98,99,100)。 用于明场照明(30)的至少一个照明路径(3)的成像光学元件(32),用于暗场照明的至少一个照明路径的成像光学元件(51,61,71,81) ,并且所述至少一个检测路径(9)的成像光学元件(91,95,96)被设计成使得所有照明路径(3,5,6,7,8)和所有检测路径(91, 92)是远心的。

    Inspection microscope and objective for an inspection microscope
    5.
    发明授权
    Inspection microscope and objective for an inspection microscope 有权
    检查显微镜和检查显微镜的目的

    公开(公告)号:US07019910B2

    公开(公告)日:2006-03-28

    申请号:US10115001

    申请日:2002-04-04

    申请人: Gerhard Hoppen

    发明人: Gerhard Hoppen

    IPC分类号: G02B21/02

    CPC分类号: G02B21/0016

    摘要: An inspection microscope (1) having a light source (3) that emits light of a first wavelength below 400 nm for illumination of a specimen (13) to be inspected, and having an objective (11) that is composed of multiple optical components and has a numerical aperture and a focal length, and having a tube optical system (21) and an autofocus device (25) that directs light of a second wavelength onto the specimen (13), is disclosed. The inspection microscope (1) is characterized by the objective (11), which has an optical correction that eliminates the longitudinal chromatic aberrations with respect to the first and the second wavelength and whose optical components are assembled in cement-free fashion, the second wavelength being greater than 400 nm.

    摘要翻译: 1.一种检查用显微镜(1),其具有发射第一波长在400nm以下的光的光源(3),用于照射待检查的检体(13),并具有由多个光学部件构成的物镜(11) 具有数值孔径和焦距,并且具有将第二波长的光引导到样本(13)上的管光学系统(21)和自动聚焦装置(25)。 检查显微镜(1)的特征在于物镜(11),其具有光学校正,其消除了相对于第一和第二波长的纵向色差,并且其光学部件以无水泥方式组装,第二波长 大于400nm。

    DUV-capable microscope objective with parfocal IR focus
    6.
    发明授权
    DUV-capable microscope objective with parfocal IR focus 失效
    具有DUV能力的显微镜物镜,具有焦距红外对焦

    公开(公告)号:US07050223B1

    公开(公告)日:2006-05-23

    申请号:US09598406

    申请日:2000-06-21

    申请人: Gerhard Hoppen

    发明人: Gerhard Hoppen

    IPC分类号: G02B13/14 G02B21/02

    CPC分类号: G02B13/14 G02B21/02

    摘要: A DUV-capable dry objective for microscopes comprises lens groups made of quartz glass, fluorite, and in some cases also lithium fluoride. It possesses a DUV focus for a DUV wavelength region λDUV±Δλ, where Δλ=8 nm, and additionally a parfocal IR focus for an IR wavelength λIR, where 760 nm≧λIR≧920 nm. For that purpose, the penultimate element is of concave configuration on both sides, and its object-side outer radius is much smaller than its image-side outer radius. The DUV objective is IR autofocus-capable.

    摘要翻译: 用于显微镜的具有DUV能力的干物镜包括由石英玻璃,萤石制成的透镜组,并且在一些情况下也包括氟化锂。 它具有用于DUV波长区域λDUV±Deltalambda的DUV聚焦,其中Deltalλ= 8nm,另外还有用于IR波长λ的IR焦点,其中760 nm> =λ = 920nm。 为了这个目的,倒数第二个元件在两侧是凹形的,它的物体侧的外半径远远小于其图像侧的外半径。 DUV目标是IR自动对焦功能。