Trench transistor and method for fabricating a trench transistor
    1.
    发明授权
    Trench transistor and method for fabricating a trench transistor 有权
    沟槽晶体管和制造沟槽晶体管的方法

    公开(公告)号:US07414286B2

    公开(公告)日:2008-08-19

    申请号:US11513969

    申请日:2006-08-31

    IPC分类号: H01L29/94

    摘要: A trench transistor having a semiconductor body, in which a trench structure and an electrode structure embedded in the trench structure is disclosed. The electrode structure is electrically insulated from the semiconductor body by an insulation structure. The electrode structure has a gate electrode structure and a field electrode structure arranged below the gate electrode structure and electrically insulated from the latter. There is provided between the gate electrode structure and the field electrode structure a shielding structure for reducing the capacitive coupling between the gate electrode structure and the field electrode structure.

    摘要翻译: 公开了一种具有半导体本体的沟槽晶体管,其中沟槽结构和嵌入沟槽结构中的电极结构被公开。 电极结构通过绝缘结构与半导体本体电绝缘。 电极结构具有栅电极结构和场电极结构,其布置在栅电极结构的下方并与之电绝缘。 在栅电极结构和场电极结构之间设置有用于减小栅电极结构和场电极结构之间的电容耦合的屏蔽结构。

    TRENCH TRANSISTOR AND METHOD FOR FABRICATING A TRENCH TRANSISTOR
    2.
    发明申请
    TRENCH TRANSISTOR AND METHOD FOR FABRICATING A TRENCH TRANSISTOR 有权
    TRENCH晶体管和用于制造TRENCH晶体管的方法

    公开(公告)号:US20070114600A1

    公开(公告)日:2007-05-24

    申请号:US11513969

    申请日:2006-08-31

    IPC分类号: H01L29/94

    摘要: A trench transistor having a semiconductor body, in which a trench structure and an electrode structure embedded in the trench structure is disclosed. The electrode structure is electrically insulated from the semiconductor body by an insulation structure. The electrode structure has a gate electrode structure and a field electrode structure arranged below the gate electrode structure and electrically insulated from the latter. There is provided between the gate electrode structure and the field electrode structure a shielding structure for reducing the capacitive coupling between the gate electrode structure and the field electrode structure.

    摘要翻译: 公开了一种具有半导体本体的沟槽晶体管,其中沟槽结构和嵌入沟槽结构中的电极结构被公开。 电极结构通过绝缘结构与半导体本体电绝缘。 电极结构具有栅电极结构和场电极结构,其布置在栅电极结构的下方并与之电绝缘。 在栅电极结构和场电极结构之间设置有用于减小栅电极结构和场电极结构之间的电容耦合的屏蔽结构。

    Trench transistor and method for fabricating a trench transistor
    3.
    发明授权
    Trench transistor and method for fabricating a trench transistor 有权
    沟槽晶体管和制造沟槽晶体管的方法

    公开(公告)号:US07790550B2

    公开(公告)日:2010-09-07

    申请号:US12186242

    申请日:2008-08-05

    IPC分类号: H01L21/336

    摘要: A trench transistor having a semiconductor body, in which a trench structure and an electrode structure embedded in the trench structure is disclosed. The electrode structure is electrically insulated from the semiconductor body by an insulation structure. The electrode structure has a gate electrode structure and a field electrode structure arranged below the gate electrode structure and electrically insulated from the latter. There is provided between the gate electrode structure and the field electrode structure a shielding structure for reducing the capacitive coupling between the gate electrode structure and the field electrode structure.

    摘要翻译: 公开了一种具有半导体本体的沟槽晶体管,其中沟槽结构和嵌入沟槽结构中的电极结构被公开。 电极结构通过绝缘结构与半导体本体电绝缘。 电极结构具有栅电极结构和场电极结构,其布置在栅电极结构的下方并与之电绝缘。 在栅电极结构和场电极结构之间设置有用于减小栅电极结构和场电极结构之间的电容耦合的屏蔽结构。

    TRENCH TRANSISTOR AND METHOD FOR FABRICATING A TRENCH TRANSISTOR
    4.
    发明申请
    TRENCH TRANSISTOR AND METHOD FOR FABRICATING A TRENCH TRANSISTOR 有权
    TRENCH晶体管和用于制造TRENCH晶体管的方法

    公开(公告)号:US20090206401A1

    公开(公告)日:2009-08-20

    申请号:US12186242

    申请日:2008-08-05

    IPC分类号: H01L29/78 H01L21/28

    摘要: A trench transistor having a semiconductor body, in which a trench structure and an electrode structure embedded in the trench structure is disclosed. The electrode structure is electrically insulated from the semiconductor body by an insulation structure. The electrode structure has a gate electrode structure and a field electrode structure arranged below the gate electrode structure and electrically insulated from the latter. There is provided between the gate electrode structure and the field electrode structure a shielding structure for reducing the capacitive coupling between the gate electrode structure and the field electrode structure.

    摘要翻译: 公开了一种具有半导体本体的沟槽晶体管,其中沟槽结构和嵌入沟槽结构中的电极结构被公开。 电极结构通过绝缘结构与半导体本体电绝缘。 电极结构具有栅电极结构和场电极结构,其布置在栅电极结构的下方并与之电绝缘。 在栅电极结构和场电极结构之间设置有用于减小栅电极结构和场电极结构之间的电容耦合的屏蔽结构。

    Field-effect transistor and method for manufacturing a field-effect transistor
    9.
    发明授权
    Field-effect transistor and method for manufacturing a field-effect transistor 有权
    场效应晶体管及场效应晶体管的制造方法

    公开(公告)号:US08030703B2

    公开(公告)日:2011-10-04

    申请号:US11964202

    申请日:2007-12-26

    IPC分类号: H01L29/66

    摘要: A field-effect transistor and a method for manufacturing a field-effect transistor is disclosed. One embodiment includes a substrate having a surface along which a trench is implemented, wherein the trench has a trench bottom and a trench edge. A source area is implemented at the trench edge and a gate electrode at least partially implemented in the trench and separated from the substrate by an insulation layer. The field-effect transistor includes a drain electrode at a side of the substrate facing away from the surface. An additional electrode is implemented between the gate electrode and the trench bottom and electrically insulated from the substrate and an electrical connection between the additional electrode and the gate electrode, wherein the electrical connection has a predetermined ohmic resistance value.

    摘要翻译: 公开了场效应晶体管和制造场效应晶体管的方法。 一个实施例包括具有其上实现沟槽的表面的衬底,其中沟槽具有沟槽底部和沟槽边缘。 源极区域在沟槽边缘处实现,并且栅极电极至少部分地实现在沟槽中并且通过绝缘层与衬底分离。 场效应晶体管包括在衬底的背离表面的一侧的漏电极。 在栅极电极和沟槽底部之间实现另外的电极,并与衬底电绝缘,并且附加电极和栅电极之间的电连接,其中电连接具有预定的欧姆电阻值。

    FIELD-EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING A FIELD-EFFECT TRANSISTOR
    10.
    发明申请
    FIELD-EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING A FIELD-EFFECT TRANSISTOR 有权
    现场效应晶体管和制造场效应晶体管的方法

    公开(公告)号:US20080211019A1

    公开(公告)日:2008-09-04

    申请号:US11964202

    申请日:2007-12-26

    IPC分类号: H01L27/06 H01L21/8234

    摘要: A field-effect transistor and a method for manufacturing a field-effect transistor is disclosed. One embodiment includes a substrate having a surface along which a trench is implemented, wherein the trench has a trench bottom and a trench edge. A source area is implemented at the trench edge and a gate electrode at least partially implemented in the trench and separated from the substrate by an insulation layer. The field-effect transistor includes a drain electrode at a side of the substrate facing away from the surface. An additional electrode is implemented between the gate electrode and the trench bottom and electrically insulated from the substrate and an electrical connection between the additional electrode and the gate electrode, wherein the electrical connection has a predetermined ohmic resistance value.

    摘要翻译: 公开了场效应晶体管和制造场效应晶体管的方法。 一个实施例包括具有其上实现沟槽的表面的衬底,其中沟槽具有沟槽底部和沟槽边缘。 源极区域在沟槽边缘处实现,并且栅极电极至少部分地实现在沟槽中并且通过绝缘层与衬底分离。 场效应晶体管包括在衬底的背离表面的一侧的漏电极。 在栅极电极和沟槽底部之间实现另外的电极,并与衬底电绝缘,并且附加电极和栅电极之间的电连接,其中电连接具有预定的欧姆电阻值。