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    Micromirror unit and method of making the same
    2.
    发明申请
    Micromirror unit and method of making the same 有权
    微镜单元及其制作方法

    公开(公告)号：US20020159170A1

    公开(公告)日：2002-10-31

    申请号：US09950710

    申请日：2001-09-13

    Applicant: Fujitsu Limited

    Inventor： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

    IPC: G02B005/08

    CPC classification number: B81C1/00142 ,  B81B3/0078 ,  B81B2201/042 ,  B81B2201/045 ,  B81B2203/0136 ,  B81B2203/0181 ,  B81B2203/058 ,  B81C1/00396 ,  G02B26/0841 ,  Y10S359/904

    Abstract: A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

    Abstract translation: 提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。 该方法包括以下步骤。 首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。 然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。 然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。 然后，选择性地去除第二掩模图案。 然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。 最后，删除第一个掩模图案。

    Micromirror unit with torsion connector having nonconstant width
    3.
    发明申请
    Micromirror unit with torsion connector having nonconstant width 有权
    具有扭曲连接器的微镜单元具有不恒定的宽度

    公开(公告)号：US20030007262A1

    公开(公告)日：2003-01-09

    申请号：US09984814

    申请日：2001-10-31

    Applicant: Fujitsu Limited

    Inventor： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Hisao Okuda

    IPC: G02B026/08 ,  G02F001/29 ,  G02B005/08 ,  G02B007/188

    CPC classification number: G02B26/085 ,  G02B26/0841 ,  Y10S359/904

    Abstract: A micromirror unit is provided which includes a frame, a mirror forming base upon which a mirror surface is formed, and a torsion connector which includes a first end connected to the mirror forming base and a second end connected to the frame. The torsion connector defines a rotation axis about which the mirror forming base is rotated relative to the frame. The torsion connector has a width measured in a direction which is parallel to the mirror surface and perpendicular to the rotation axis. The width of the torsion connector is relatively great at the first end. The width becomes gradually smaller from the first end toward the second end.

    Abstract translation: 提供了一种微镜单元，其包括框架，形成有镜面的反射镜形成基座以及连接到反射镜形成基座的第一端和连接到框架的第二端的扭转连接器。 扭转连接器限定了旋转轴线，镜子形成基座围绕该轴线相对于框架旋转。 扭转连接器具有在与镜面平行且垂直于旋转轴线的方向上测量的宽度。 第一端扭转连接器的宽度相对较大。 宽度从第一端朝向第二端逐渐变小。

    Galvano-micromirror and its manufacture process
    4.
    发明申请
    Galvano-micromirror and its manufacture process 有权
    Galvano-micromirror及其制造工艺

    公开(公告)号：US20020196523A1

    公开(公告)日：2002-12-26

    申请号：US10216953

    申请日：2002-08-12

    Applicant: Fujitsu Limited

    Inventor： Satoshi Ueda

    IPC: G02B026/00

    CPC classification number: G02B26/0841

    Abstract: A GALVANO-micromirror includes a first substrate having a light-reflective mirror face on one surface thereof and a first electrode on one or both surface(s) thereof; and a second substrate including a frame-form base, a second electrode located opposedly to the first electrode, a joint holder section located under the mirror face for holding the first substrate, and a torsion bar section located under the mirror face for connecting the frame-form base to the joint holder section and supporting the joint holder section pivotally within a range of angles, wherein a part of a surface of the first substrate on which the mirror face is not formed is joined to the joint holder section of the second substrate.

    Abstract translation: GALVANO微镜包括在其一个表面上具有光反射镜面的第一基底和在其一个或两个表面上的第一电极; 以及第二基板，包括框架形基部，与第一电极相对设置的第二电极，位于用于保持第一基板的镜面下方的接头保持部，以及位于镜面下方的用于连接框架的扭杆部 形成基座并且在一定角度范围内可枢转地支撑接头保持器部分，其中未形成镜面的第一基板的一部分表面接合到第二基板的接头保持部分 。

    Galvano-mirror and method of making the same
    7.
    发明申请
    Galvano-mirror and method of making the same 有权

    公开(公告)号：US20020051281A1

    公开(公告)日：2002-05-02

    申请号：US09803014

    申请日：2001-03-12

    Applicant: Fujitsu Limited

    Inventor： Satoshi Ueda ,  Ippei Sawaki ,  Yoshihiro Mizuno

    IPC: B44C001/22

    CPC classification number: G02B26/0841 ,  G11B7/08564 ,  Y10T156/1052

    Abstract: A method of making a galvano-mirror is provided. It includes the following steps. First, a first material substrate formed with a plurality of mirror plate regions is prepared. The mirror plate regions correspond in arrangement to the mirror plate of the galvano-mirror. Then, a second material substrate formed with a plurality of driver plate regions is prepared. The driver plate regions correspond in arrangement to the driver plate of the galvano-mirror. Then, the first and the second material substrates are attached to each other so that each of the mirror plate regions faces a relevant one of the driver plate regions. Finally, the attached first and second material substrates are divided into individual gaslvano-mirrors.

    Method for manufacturing microstructure
    8.
    发明申请
    Method for manufacturing microstructure 有权
    微结构制造方法

    公开(公告)号：US20040232107A1

    公开(公告)日：2004-11-25

    申请号：US10686764

    申请日：2003-10-17

    Applicant: FUJITSU LIMITED ,  FUJITSU MEDIA DEVICES LIMITED

    Inventor： Norinao Kouma ,  Yoshihiro Mizuno ,  Osamu Tsuboi ,  Hisao Okuda ,  Hiromitsu Soneda ,  Satoshi Ueda ,  Ippei Sawaki ,  Yoshitaka Nakamura

    IPC: B44C001/22

    CPC classification number: B81C1/00182 ,  B81B2201/0235 ,  B81B2201/033 ,  B81B2201/042 ,  B81C2201/014 ,  B81C2201/0174 ,  G02B26/0841

    Abstract: A method is for manufacturing a microstructure having a thin-walled portion with use of a material substrate. The material substrate has a laminated structure which includes a first conductor layer 101, a second conductor layer 102, a third conductor layer 103, a first insulating layer 104 interposed between the first conductor layer and the second conductor layer, and a second insulating layer 105 interposed between the second conductor layer and the third conductor layer. The first insulating layer is patterned to have a first masking part for covering a thin-wall forming region of the second conductor layer. The second insulating layer is patterned to have a second masking part for covering the thin-wall forming region of the second conductor layer. The method includes forming the thin-walled portion in the second conductor portion by etching the material substrate from the first conductor layer down to the second insulating layer via a mask pattern 58 including a non-masking region corresponding to the thin-wall forming region of the second conductor layer.

    Abstract translation: 一种使用材料基板制造具有薄壁部分的微结构的方法。 材料基板具有包括第一导体层101，第二导体层102，第三导体层103，插入在第一导体层和第二导体层之间的第一绝缘层104和第二绝缘层105的层叠结构 插入在第二导体层和第三导体层之间。 第一绝缘层被图案化以具有用于覆盖第二导体层的薄壁形成区域的第一掩模部分。 图案化第二绝缘层以具有用于覆盖第二导体层的薄壁形成区域的第二掩模部分。 该方法包括：通过掩模图案58将材料基板从第一导体层蚀刻到第二绝缘层，从而在第二导体部分中形成薄壁部分，掩模图案58包括对应于薄壁形成区域的非屏蔽区域 第二导体层。

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