Photopolymerization of ethylenically unsaturated organic compositions and the formation of a relief image
    3.
    发明授权
    Photopolymerization of ethylenically unsaturated organic compositions and the formation of a relief image 失效
    烯属不饱和有机组合物的光聚合和形成浮雕图像

    公开(公告)号:US3297440A

    公开(公告)日:1967-01-10

    申请号:US27746063

    申请日:1963-05-02

    摘要: A photo-polymerizable composition comprises an ethylenically unsaturated organic compound and as photopolymerization initiator a cobalt (III) ammine, amine, e.g. ethylene diamine, a ,b ,g -triamine propane or b ,b 1, b 111-triamino triethylamine or pyridine or a ,a 1-dipyridyl complex. The light-sensitive composition may also comprise a hydrophilic or hydrophobic colloid binder, e.g. polystyrene, polymethyl methacrylate, polyvinyl-acetate, polyvinylbutyral, partially saponified cellulose acetate, gelatin casein, starch, carboxymethyl cellulose and polyvinyl alcohol. Specified cobalt complexes are ammonium dioxalato diammine cobaltate, potassium tetranitro diammine cobaltate, trinitro-triammine cobalt (III), dinitrotetrammine cobalt (III) nitrate, carbonatotetrammine cobalt (III) nitrate chloro-pentammine cobalt (III) dichloride, nitropentammine cobalt (III) dinitrate dichloro-aquo-triammine cobalt (III) chloride, aquopentammine cobalt (III) trinitrate, bis-(carbonato tetrammine cobalt III) sulphate, trichloro aquohexammine m -amido cobalt III chloride, dodecammine hexyltetra cobalt (III) chloride. Specified ethylenically unsaturated compounds are acrylamide, methacrylamide, N-methylolmethacrylamide, acrylonitrile, acrylic acid, methacrylic acid, calcium acrylate N-vinyl carbazole, N-vinyl phthalimide, divinyl benzene, diglycol diacrylate N,N1-alkylene bis-acrylamides, allyl esters of polyacrylic acid, maleic esters of polyvinyl alcohol, cellulose, acetomaleates and allylcellulose. The exposed layer is developed with a solvent for the ethylenically unsaturated compound. The support may carry an actinic light absorptive layer.