公开(公告)号：US20160315084A1

公开(公告)日：2016-10-27

申请号：US14691960

申请日：2015-04-21

Applicant: GLOBALFOUNDRIES INC.

Inventor： Xusheng WU ,  HongLiang SHEN ,  Changyong XIAO ,  Jianhua YIN ,  Jie CHEN ,  Jin Ping LIU ,  Hong YU ,  Zhenyu HU ,  Lan YANG ,  Wanxun HE

IPC: H01L27/092 ,  H01L29/10 ,  H01L21/8238

CPC classification number: H01L27/0924 ,  H01L21/823807 ,  H01L21/823821 ,  H01L21/82385 ,  H01L29/1033

Abstract: There is set forth herein in one embodiment a semiconductor structure having a first region and a second region. The first region can include fins of a first fin height and the second region can include fins of a second fin height.

Abstract translation: 这里在一个实施例中阐述了具有第一区域和第二区域的半导体结构。 第一区域可以包括第一翅片高度的翅片，并且第二区域可以包括具有第二翅片高度的翅片。

公开(公告)号：US20150380316A1

公开(公告)日：2015-12-31

申请号：US14319640

申请日：2014-06-30

Applicant: GLOBALFOUNDRIES INC.

Inventor： Hong YU ,  HongLiang SHEN ,  Zhao LUN ,  Zhenyu HU ,  Richard J. Carter

IPC: H01L21/8234 ,  H01L21/306 ,  H01L21/762 ,  H01L27/088 ,  H01L29/06

CPC classification number: H01L21/823481 ,  H01L21/30604 ,  H01L21/762 ,  H01L21/76229 ,  H01L21/823431 ,  H01L27/0886 ,  H01L29/0653

Abstract: The use of two different materials for shallow trench isolation and deep structural trenches with a dielectric material therein (e.g., flowable oxide and a HARP oxide, respectively) causes non-uniform heights of exposed portions of raised semiconductor structures for non-planar semiconductor devices, due to the different etch rates of the materials. Non-uniform openings adjacent the exposed portions of the raised structures from recessing the isolation and dielectric materials are filled with additional dielectric material to create a uniform top layer of one material (the dielectric material), which can then be uniformly recessed to expose uniform portions of the raised structures.

Abstract translation: 对于浅沟槽隔离和其中具有介电材料的深结构沟槽（例如，可流动的氧化物和HARP氧化物）分别使用两种不同的材料导致用于非平面半导体器件的凸起半导体结构的暴露部分的不均匀高度， 由于材料的蚀刻速率不同。 与凸起结构的暴露部分相邻的不均匀的开口不会使隔离和介电材料凹陷，填充有额外的电介质材料，以形成均匀的一层材料（电介质材料）的顶层，然后可将其均匀地凹入以露出均匀的部分 的凸起结构。