Abstract:
A methodology for inline characterization and temperature profiling that enables parallel measurement of device characteristics at multiple temperatures and the resulting device are disclosed. Embodiments may include calibrating a first device under test (DUT) with respect to at least one heating structure in a metal layer of an integrated circuit (IC), applying a heater voltage to the at least one heating structure, and measuring at least one characteristic of the first DUT at a first temperature corresponding to the heater voltage.
Abstract:
A method and an apparatus for identifying non-intrinsic defect bits from a population of failing bits for failure analysis to characterize the extrinsic failure mechanisms is provided. Embodiments include performing a failure mode test on a bank of a memory array at different low VDD; determining optimal bank size to observe plateaus of fail counts; determining fail counts of the bank at each different low VDD; determining a plateau of the fail counts; determining whether the plateau represents extrinsic bits of the bank; and submitting the extrinsic bits for root cause analysis.
Abstract:
There is set forth herein a semiconductor structure including a plurality of test devices, the plurality of test devices including a first test device and a second test device. A semiconductor structure can also include a waveform generating circuit, the waveform generating circuit configured for application of a first stress signal waveform having a first duty cycle to the first test device, and a second stress signal waveform having a second duty cycle to the second test device. A semiconductor structure can include a selection circuit associated with each of the first test device and the second test device for switching between a stress cycle and a sensing cycle.