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49 条记录 (耗时 0.022 秒)

    Process for preparing coumarin sulfonates
    3.
    发明授权
    Process for preparing coumarin sulfonates 失效
    香豆素磺酸盐的制备方法

    公开(公告)号：US5773591A

    公开(公告)日：1998-06-30

    申请号：US813106

    申请日：1997-03-07

    申请人： Mohammad Aslam ,  Michael T. Sheehan ,  George Kvakovszky

    发明人： Mohammad Aslam ,  Michael T. Sheehan ,  George Kvakovszky

    IPC分类号： G03F7/004 ,  C07D311/56 ,  C07D335/06 ,  C07D311/20

    CPC分类号： C07D311/56

    摘要： A novel process for preparing sulfonic acid esters and amides of benzo-heterocyclic diazo diketo compounds, such as substituted diazo-4-oxo-3,4-dihydrocoumarins, which are useful synthetic intermediates in a wide variety of applications including photoresists, opto-electronics, agricultural, and pharmaceutical applications is disclosed and claimed. The process comprises the steps of (a) subjecting a substituted benzo-heterocyclic .beta.-keto-enol compound to suitable diazo transfer conditions in the presence of a diazo transfer agent; (b) subjecting the so formed diazo diketo compound to suitable halosulfonation conditions in the presence of a halosulfonation agent; and (c) subjecting the so formed halosulfonyl aromatic compound to suitable substitution reaction in the presence of an alcohol or an amine to form the corresponding sulfonic acid ester or amide of benzo-heterocyclic diazo diketo compound. The compounds formed from the process of the present invention exhibit very high photosensitivity in the deep ultraviolet (DUV) region (ca. 250 nm), and therefore, are useful as photoactive compounds in DUV photoresist formulations.

    摘要翻译： 一种用于制备苯并杂环重氮二酮化合物的磺酸酯和酰胺的新方法，例如取代的重氮-4-氧代-3,4-二氢香豆素，其在各种应用中是有用的合成中间体，包括光致抗蚀剂，光电子 ，农业和药物应用被公开和要求保护。 该方法包括以下步骤：（a）在重氮转移剂存在下使取代的苯并杂环的β-酮 - 烯醇化合物进行合适的重氮转移条件; （b）在卤代磺化剂的存在下使如此形成的重氮二酮化合物进行适当的卤代磺化条件; 和（c）使这样形成的卤代磺酰基芳族化合物在醇或胺的存在下进行适当的取代反应，形成相应的苯并杂环重氮二酮化合物的磺酸酯或酰胺。 由本发明方法形成的化合物在深紫外（DUV）区域（约250nm）中表现出非常高的光敏性，因此可用作DUV光致抗蚀剂制剂中的光活性化合物。

    Process for making low optical polymers and copolymers for photoresists and optical applications
    5.
    发明授权
    Process for making low optical polymers and copolymers for photoresists and optical applications 失效
    制备用于光致抗蚀剂和光学应用的低光学聚合物和共聚物的方法

    公开(公告)号：US5625007A

    公开(公告)日：1997-04-29

    申请号：US295362

    申请日：1994-08-24

    申请人： Michael T. Sheehan ,  James H. Rea

    发明人： Michael T. Sheehan ,  James H. Rea

    IPC分类号： C08F8/12 ,  C08F8/14

    CPC分类号： C08F8/14 ,  C08F2810/50

    摘要： The present invention pertains to polymers comprising poly(4-hydroxystyrene) or substituted poly(4-hydroxystyrene) or both. The polymers have low optical density (absorbance) over a wavelength range from about 240 to about 260 nm, as well as low optical density over the near UV and visible spectrum (310 to 800 nm). Such polymers are produced by polymerizing 4-acetoxystyrene and/or substituted 4-acetoxystyrene monomers, with or without other comonomers, and subsequently performing transesterification. In the most preferred embodiment of the present invention, the polymers are produced using at least one alcohol as a reaction medium, a chain transfer agent and a transesterification reactant, providing an unusually economic process. These polymers are particularly useful as photoresist components for use in combination with deep UV, X-ray, and E-Beam imaging systems.

    摘要翻译： 本发明涉及包含聚（4-羟基苯乙烯）或取代的聚（4-羟基苯乙烯）或两者的聚合物。 聚合物在约240至约260nm的波长范围内具有低光密度（吸光度），以及在近紫外和可见光谱（310至800nm）下的低光密度。 这样的聚合物通过聚合4-乙酰氧基苯乙烯和/或取代的4-乙酰氧基苯乙烯单体，与或不与其它共聚单体共聚，然后进行酯交换。 在本发明的最优选的实施方案中，使用至少一种醇作为反应介质，链转移剂和酯交换反应物来生产聚合物，提供非常经济的方法。 这些聚合物特别可用作与深UV，X射线和E-Beam成像系统组合使用的光致抗蚀剂组分。

    Process for making low optical density polymers and copolymers for photoresists and optical applications
    6.
    发明授权
    Process for making low optical density polymers and copolymers for photoresists and optical applications 失效
    制备用于光致抗蚀剂和光学应用的低光密度聚合物和共聚物的方法

    公开(公告)号：US5239015A

    公开(公告)日：1993-08-24

    申请号：US706601

    申请日：1991-05-28

    申请人： Michael T. Sheehan ,  James H. Rea

    发明人： Michael T. Sheehan ,  James H. Rea

    IPC分类号： C08F8/12 ,  C08F8/14

    CPC分类号： C08F8/14 ,  C08F2810/50

    摘要： The present invention pertains to a process for the preparation of polymers comprising poly(4-hydroxystyrene) or substituted poly(4-hydroxystyrene) or both. The polymers have low optical density (absorbance) over a wavelength range from about 240 to about 260 nm, as well as low optical density over the near UV and visible spectrum (310 to 800 nm). Such polymers are produced by polymerizing 4-acetoxystyrene and/or substituted 4-acetoxystyrene monomers, with or without other comonomers, and subsequently performing transesterification. In the most preferred embodiment of the present invention, the polymers are produced using at least one alcohol as a reaction medium, a chain transfer agent and a transesterification reactant, providing an unusually economic process. These polymers are particularly useful as photoresist components for use in combination with deep UV, X-ray, and E-Beam imaging systems.To obtain polymers having low optical density over the 240 to 260 nm radiation wavelength range, it is necessary to use an initiator which does not comprise a substantially absorbant structure over the 240 to 260 nm range or to use an initiator concentration of less than about 3 mole % of the monomer(s), to obtain a polymerization conversion of the initial polymerization monomers of at least about 90% by weight, or to remove residual monomer(s) from the reaction medium prior to transesterification, and to obtain a transesterification conversion of the polymerized monomers of at least 85% by weight. It is also necessary to avoid the use of transesterification catalyst which can cause the formation of chemical structures which can absorb over the 240 to 260 nm radiation wavelength range.

    摘要翻译： 本发明涉及制备包含聚（4-羟基苯乙烯）或取代的聚（4-羟基苯乙烯）或两者的聚合物的方法。 聚合物在约240至约260nm的波长范围内具有低光密度（吸光度），以及在近紫外和可见光谱（310至800nm）下的低光密度。 这样的聚合物通过聚合4-乙酰氧基苯乙烯和/或取代的4-乙酰氧基苯乙烯单体，与或不与其它共聚单体共聚，然后进行酯交换。 在本发明的最优选的实施方案中，使用至少一种醇作为反应介质，链转移剂和酯交换反应物来生产聚合物，提供非常经济的方法。 这些聚合物特别可用作与深UV，X射线和E-Beam成像系统组合使用的光致抗蚀剂组分。 为了获得在240至260nm辐射波长范围内具有低光密度的聚合物，必须使用在240至260nm范围内不包含基本吸收结构的引发剂，或者使用小于约3的引发剂浓度 摩尔％的单体，以获得至少约90重量％的初始聚合单体的聚合转化率，或者在酯交换之前从反应介质中除去残留的单体，并获得酯交换转化 的聚合单体为至少85重量％。 还有必要避免使用酯交换催化剂，其可导致可以在240至260nm辐射波长范围内吸收的化学结构的形成。

    Epoxy resin, blocked polyisocyanate or polymers with polyhydroxystyrenes having novolak structure
    9.
    发明授权
    Epoxy resin, blocked polyisocyanate or polymers with polyhydroxystyrenes having novolak structure 有权
    环氧树脂，封端多异氰酸酯或具有酚醛清漆结构的聚羟基苯乙烯的聚合物

    公开(公告)号：US07897697B2

    公开(公告)日：2011-03-01

    申请号：US12456895

    申请日：2009-06-24

    申请人： Michael T. Sheehan ,  Edward G. Zey

    发明人： Michael T. Sheehan ,  Edward G. Zey

    IPC分类号： C08G61/02 ,  C08L63/00 ,  C08L87/00

    CPC分类号： C09D125/18 ,  C08G61/04 ,  C08G2261/312 ,  G03F7/023 ,  G03F7/038 ,  Y02P20/582

    摘要： A process for preparing derivatized poly(4-hydroxystryrene) having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer. New compositions of matter which comprise the derivatized poly(4-hydroxystyrene) prepared in the above manner and which have application in the electronic chemicals market such as in a photoresist composition, and in other areas such as in varnishes, printing inks, epoxy resins, copying paper, tackifiers for rubber, crude oil separators, and the like.

    摘要翻译： 一种制备具有酚醛清漆型结构的衍生化聚（4-羟基苯乙烯）的方法，其包括以下步骤：（i）提供含4-羟基苯基甲基甲醇的甲醇溶液，（ii）使所述溶液进行酸催化置换反应足够的时间 的时间和温度和压力的合适条件下将基本上所有的甲醇转化为溶液中的4-羟基苯基甲基甲醇甲醚，（iii）在合适的酸催化剂存在下将所述含醚溶液聚合足够的时间和在 合适的温度和压力条件形成酚醛清漆型聚合物。 包含以上述方式制备并且适用于电子化学品市场的衍生聚（4-羟基苯乙烯）的物质的新组合物，例如在光致抗蚀剂组合物中，以及其它领域如清漆，印刷油墨，环氧树脂， 复印纸，橡胶增粘剂，原油分离器等。

    Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same
    10.
    发明授权
    Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same 有权
    具有酚醛清漆型结构并封闭DPHS（BDPHS）的衍生多羟基苯乙烯（DPHS）及其制备方法

    公开(公告)号：US07662538B2

    公开(公告)日：2010-02-16

    申请号：US11250014

    申请日：2005-10-13

    申请人： Michael T. Sheehan ,  Edward G. Zey ,  Hiroshi Okazaki

    发明人： Michael T. Sheehan ,  Edward G. Zey ,  Hiroshi Okazaki

    IPC分类号： G03F7/039

    CPC分类号： C08F8/00 ,  C08G61/04 ,  G03F7/0392 ,  G03F7/091 ,  C08F8/14 ,  C08F112/14

    摘要： A process for preparing a blocked derivatized poly(4-hydroxystryrene)-DPHS having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer; and (iv) reacting said polymer with a vinyl ether, a dialkyl dicarbonate, or a mixture of vinyl ether and a dialkyl dicarbonate to form the blocked DPHS. New compositions of matter which comprise the blocked derivatized poly(4-hydroxystyrene) prepared in the above manner and which have application in the electronic chemicals market such as in a photoresist composition and MEMS, and in other areas such as in varnishes, printing inks, epoxy resins, copying paper, tackifiers for rubber, crude oil separators, toner resins for photocopying, antireflective coatings, and the like.

    摘要翻译： 一种制备具有酚醛清漆型结构的封端衍生的聚（4-羟基苯乙烯）-DPHS的方法，其包括以下步骤：（i）提供含有4-羟基苯基甲基甲醇的甲醇溶液，（ii）使所述溶液进行酸催化置换反应 在适当的温度和压力条件下，将基本上所有的所述甲醇转化为溶液中的4-羟基苯基甲基甲醇甲醚，（iii）在合适的酸催化剂存在下将所述含醚溶液聚合足够的时间 的时间和在合适的温度和压力条件下形成酚醛清漆型聚合物; 和（iv）使所述聚合物与乙烯基醚，二碳酸二烷基酯或乙烯基醚和二碳酸二烷基酯的混合物反应以形成封端的DPHS。 包含以上述方式制备并且适用于电子化学品市场的封闭的衍生化聚（4-羟基苯乙烯）的物质的新组合物，例如在光致抗蚀剂组合物和MEMS中，以及其它领域如清漆，印刷油墨， 环氧树脂，复印纸，橡胶增粘剂，原油分离器，复印用调色剂树脂，抗反射涂料等。