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公开(公告)号：US20200274315A1
公开(公告)日：2020-08-27
申请号：US16871758
申请日：2020-05-11
申请人： Gigaphoton Inc.
摘要： An excimer laser apparatus according to the present disclosure includes an etalon spectrometer configured to measure a fringe waveform of a laser beam; and a controller configured to obtain area of a first ratio in a spectral space obtained based on a result of the measurement by the etalon spectrometer, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate a first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter.
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公开(公告)号：US20170222391A1
公开(公告)日：2017-08-03
申请号：US15486323
申请日：2017-04-13
申请人： Gigaphoton Inc.
发明人： Masato MORIYA , Takeshi OHTA , Keisuke ISHIDA , Takashi KUSAMA
CPC分类号： H01S3/13 , G01J1/0425 , G01J1/0474 , G01J3/28 , G01J9/0246 , G01J2009/0257 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0811 , H01S3/0823 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/2251 , H01S3/2256
摘要： A narrow band laser apparatus may include: a laser resonator; a pair of discharge electrodes; a power supply; a first wavelength measurement device configured to output a first measurement result; a second wavelength measurement device configured to output a second measurement result; and a control unit. The control unit calibrates the first measurement result, based on a difference between the second measurement result derived when the control unit controls the power supply to apply a pulsed voltage to the pair of discharge electrodes with a first repetition frequency and the second measurement result derived when the control unit controls the power supply to apply the pulsed voltage to the pair of discharge electrodes with a second repetition frequency, the second repetition frequency being higher than the first repetition frequency.
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