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    LASER UNIT MANAGEMENT SYSTEM
    4.
    发明申请
    LASER UNIT MANAGEMENT SYSTEM 审中-公开

    公开(公告)号：US20180196347A1

    公开(公告)日：2018-07-12

    申请号：US15914299

    申请日：2018-03-07

    申请人： GIGAPHOTON INC.

    发明人： Yuji MINEGISHI ,  Yutaka IGARASHI ,  Takeshi OHTA

    IPC分类号： G03F7/20 ,  G06F21/62 ,  H01S3/00

    CPC分类号： G03F7/70508 ,  G03F7/2002 ,  G03F7/70025 ,  G03F7/70483 ,  G03F7/70491 ,  G03F7/70575 ,  G03F7/70725 ,  G03F7/70775 ,  G06F21/62 ,  G06F2221/2141 ,  H01S3/036 ,  H01S3/08009 ,  H01S3/137 ,  H01S3/225

    摘要： A laser unit management system may include a server configured to hold first information provided with access limitation that allows an access with a first access authorization, second information provided with access limitation that allows an access with a second access authorization, and third information provided with access limitation that allows both an access with the first access authorization and an access with the second access authorization; and a laser unit including a laser output section and a controller, the laser output section being configured to output pulsed laser light toward an exposure unit that is configured to perform wafer exposure, the controller being configured to store the first information, the second information, and the third information in the server. The second information may include wafer-exposure-related information on the exposure unit and laser-control-related information on the laser unit that are in association with each other.

    EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM
    6.
    发明申请
    EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM 审中-公开
    EXCIMER激光设备和激光激光系统

    公开(公告)号：US20150003485A1

    公开(公告)日：2015-01-01

    申请号：US14487796

    申请日：2014-09-16

    申请人： GIGAPHOTON INC.

    发明人： Tooru ABE ,  Takeshi OHTA ,  Hiroaki TSUSHIMA ,  Osamu WAKABAYASHI

    IPC分类号： H01S3/036 ,  H01S3/097

    CPC分类号： H01S3/036 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/10046 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

    摘要： An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.

    摘要翻译： 准分子激光装置包括气体供给单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器， 激光气体和第二激光气体到激光室的内部。 气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，以及气体供给单元提供第一激光器的部分气体置换控制 可以选择性地执行气体和第二激光气体到激光室的内部和排气单元部分地从激光室内部排出气体。

    LINE NARROWED LASER APPARATUS
    7.
    发明申请
    LINE NARROWED LASER APPARATUS 审中-公开

    公开(公告)号：US20180323568A1

    公开(公告)日：2018-11-08

    申请号：US16033030

    申请日：2018-07-11

    申请人： Gigaphoton Inc.

    发明人： Hiroshi FURUSATO ,  Takeshi OHTA ,  Natsuhiko KOUNO ,  Osamu WAKABAYASHI ,  Takahito KUMAZAKI

    IPC分类号： H01S3/11 ,  H01S3/134 ,  H01S3/08 ,  H01S3/22 ,  H01S3/038 ,  H01S3/034

    CPC分类号： H01S3/11 ,  H01S3/034 ,  H01S3/038 ,  H01S3/08009 ,  H01S3/134 ,  H01S3/137 ,  H01S3/2207 ,  H01S3/2222

    摘要： The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply a pulsed voltage to the pair of electrodes, a wavelength-selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, a wavelength variable unit configured to change a selected wavelength selected by the wavelength-selecting element, and a controller. The controller is configured to control the wavelength variable unit based on an amount of control of the spectral width varying unit in a period from a time of ending the first burst oscillation to a time of starting the second burst oscillation.

    LINE NARROWED LASER APPARATUS
    8.
    发明申请
    LINE NARROWED LASER APPARATUS 审中-公开

    公开(公告)号：US20180123312A1

    公开(公告)日：2018-05-03

    申请号：US15857894

    申请日：2017-12-29

    申请人： Gigaphoton Inc.

    发明人： Hiroshi FURUSATO ,  Keisuke ISHIDA ,  Takeshi OHTA ,  Takahito KUMAZAKI ,  Osamu WAKABAYASHI

    IPC分类号： H01S3/11 ,  H01S3/00

    CPC分类号： H01S3/11 ,  H01S3/0078 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/134 ,  H01S3/137 ,  H01S3/1398 ,  H01S3/225 ,  H01S2301/04

    摘要： The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply pulsed voltage to the pair of electrodes, a wavelength selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, and a controller. The controller is configured to measure a duty in a predetermined period before starting the second burst oscillation and a length of a suspension period from a time of ending the first burst oscillation to a time of starting the second burst oscillation, and perform a first control of the spectral width varying unit based on the duty and the length of the suspension period.

    EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM
    9.
    发明申请
    EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM 有权
    EXCIMER激光设备和激光激光系统

    公开(公告)号：US20160322772A1

    公开(公告)日：2016-11-03

    申请号：US15208637

    申请日：2016-07-13

    申请人： Gigaphoton Inc.

    发明人： Tooru ABE ,  Takeshi OHTA ,  Hiroaki TSUSHIMA ,  Osamu WAKABAYASHI

    IPC分类号： H01S3/036 ,  H01S3/225 ,  H01S3/134 ,  H01S3/097 ,  H01S3/13

    CPC分类号： H01S3/036 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/10046 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

    摘要： Problem: to suppress the number of times complete gas replacement in a laser chamber.Solution: this excimer laser apparatus may include a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Then, gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.

    摘要翻译： 解决方案：该准分子激光装置可以包括气体供应单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器， 将第一激光气体和第二激光气体提供给激光室的内部。 然后，其中气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，并且气体供给单元提供气体供给单元 可以选择性地执行第一激光气体和到激光室内部的第二激光气体和排气单元部分地从激光室内部排出气体。