中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

24 records (took 0.028 seconds)

    Extreme ultraviolet light generation system
    1.
    发明授权
    Extreme ultraviolet light generation system 有权

    公开(公告)号：US10932350B2

    公开(公告)日：2021-02-23

    申请号：US16710208

    申请日：2019-12-11

    Applicant: Gigaphoton Inc.

    Inventor： Tatsuya Yanagida ,  Osamu Wakabayashi

    IPC: H05G2/00 ,  G03F7/20 ,  H01S3/223 ,  H01S3/06 ,  H01S3/11 ,  H01S3/08 ,  H01S3/107 ,  H01S3/23 ,  H01S3/16 ,  H01S3/00 ,  H01S3/102

    Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.

    System and method for generating extreme ultraviolet light, and laser apparatus
    4.
    发明授权
    System and method for generating extreme ultraviolet light, and laser apparatus 有权
    用于产生极紫外光的系统和方法，以及激光装置

    公开(公告)号：US09130345B2

    公开(公告)日：2015-09-08

    申请号：US14152813

    申请日：2014-01-10

    Applicant: GIGAPHOTON, INC.

    Inventor： Tatsuya Yanagida ,  Osamu Wakabayashi

    IPC: H05G2/00 ,  H01S3/10

    CPC classification number: H01S3/10061 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/2308 ,  H01S3/2383 ,  H01S2301/20 ,  H05G2/003 ,  H05G2/008

    Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

    Abstract translation: 可以提供与激光装置一起使用的极紫外光发生系统，并且极紫外光发生系统可以包括：包括至少一个用于至少一个激光束的窗口的室，以及用于将目标材料供应到 房间 以及设置在激光束路径上的至少一个偏振控制单元，用于控制至少一个激光束的偏振状态。

    Extreme ultraviolet light generating system and electronic device manufacturing method
    5.
    发明授权
    Extreme ultraviolet light generating system and electronic device manufacturing method 有权

    公开(公告)号：US11226565B2

    公开(公告)日：2022-01-18

    申请号：US16987856

    申请日：2020-08-07

    Applicant: Gigaphoton Inc.

    Inventor： Tatsuya Yanagida

    IPC: G03B27/54 ,  G03F7/20 ,  G21K5/02 ,  H05G2/00

    Abstract: An extreme ultraviolet light generating system includes a chamber; a target supply unit configured to successively output, toward a predetermined region in the chamber, a plurality of droplets including a first droplet and a second droplet of a target substance; a trajectory correcting laser apparatus configured to apply a trajectory correcting laser beam to each of the droplets moving from the target supply unit toward the predetermined region; a drive laser apparatus configured to apply a drive laser beam to each droplet having reached the predetermined region to generate plasma; and a control unit configured to control the trajectory correcting laser apparatus such that intensity of the trajectory correcting laser beam applied to the first droplet is different from intensity of the trajectory correcting laser beam applied to the second droplet.

    Extreme ultraviolet light generation method
    8.
    发明授权
    Extreme ultraviolet light generation method 有权

    公开(公告)号：US10667375B2

    公开(公告)日：2020-05-26

    申请号：US16239746

    申请日：2019-01-04

    Applicant: Gigaphoton Inc.

    Inventor： Tatsuya Yanagida

    IPC: H05G2/00

    Abstract: An extreme ultraviolet light generation method according to one aspect of the present disclosure includes outputting a droplet to a first laser light irradiation region that is a region different from a plasma generation region, irradiating the droplet that reaches the first laser light irradiation region with first laser light to generate a deformed liquid target, irradiating the deformed liquid target that reaches a second laser light irradiation region that is a region different from the plasma generation region with second laser light to generate a fragment jet target, and irradiating at least a part of the fragment jet target that reaches the plasma generation region with third laser light that propagates in a direction intersecting a propagation direction of the second laser light.

    Extreme ultraviolet light generation apparatus
    10.
    发明授权
    Extreme ultraviolet light generation apparatus 有权

    公开(公告)号：US10172225B2

    公开(公告)日：2019-01-01

    申请号：US15860137

    申请日：2018-01-02

    Applicant: Gigaphoton Inc.

    Inventor： Toru Suzuki ,  Tamotsu Abe ,  Osamu Wakabayashi ,  Tatsuya Yanagida

    IPC: H05G2/00 ,  G03F7/20

    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.

Patent Agency Ranking