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公开(公告)号：US20140085618A1
公开(公告)日：2014-03-27
申请号：US14033929
申请日：2013-09-23
申请人： Gildardo R. Delgado , Frank Chilese , Rudy Garcia , John R. Torczynski , Anthony S. Geller , Daniel J. Rader , Leonard E. Klebanoff , Michail A. Gallis
发明人： Gildardo R. Delgado , Frank Chilese , Rudy Garcia , John R. Torczynski , Anthony S. Geller , Daniel J. Rader , Leonard E. Klebanoff , Michail A. Gallis
IPC分类号： G03F7/20
CPC分类号： G03F7/70841 , G03F1/0092 , G03F1/84 , G03F7/70916 , G03F7/70933
摘要： A method and an apparatus to protect a reticle against particles and chemicals in an actinic EUV reticle inspection tool are presented. The method and apparatus utilizes a pair of porous metal diffusers in the form of showerheads to provide a continual flow of clean gas. The main showerhead bathes the reticle surface to be inspected in smoothly flowing, low pressure gas, isolating it from particles coming from surrounding volumes. The secondary showerhead faces away from the reticle and toward the EUV illumination and projection optics, supplying them with purge gas while at the same time creating a buffer zone that is kept free of any particle contamination originating from those optics.
摘要翻译： 介绍了一种保护标线片免受光化性EUV标线检查工具中的颗粒和化学物质的方法和设备。 该方法和装置利用一对淋浴喷头形式的多孔金属扩散器来提供清洁气体的连续流动。 主喷头用平滑流动的低压气体将掩模版表面沐浴，将其与周围体积的颗粒隔离。 二次淋浴头面向远离掩模版并朝向EUV照明和投影光学元件，为其提供吹扫气体，同时创建一个缓冲区，保持没有源自这些光学元件的任何颗粒污染。
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公开(公告)号：US09244368B2
公开(公告)日：2016-01-26
申请号：US14033929
申请日：2013-09-23
申请人： Gildardo R. Delgado , Frank Chilese , Rudy Garcia , John R. Torczynski , Anthony S. Geller , Daniel J. Rader , Leonard E. Klebanoff , Michail A. Gallis
发明人： Gildardo R. Delgado , Frank Chilese , Rudy Garcia , John R. Torczynski , Anthony S. Geller , Daniel J. Rader , Leonard E. Klebanoff , Michail A. Gallis
CPC分类号： G03F7/70841 , G03F1/0092 , G03F1/84 , G03F7/70916 , G03F7/70933
摘要： A method and an apparatus to protect a reticle against particles and chemicals in an actinic EUV reticle inspection tool are presented. The method and apparatus utilizes a pair of porous metal diffusers in the form of showerheads to provide a continual flow of clean gas. The main showerhead bathes the reticle surface to be inspected in smoothly flowing, low pressure gas, isolating it from particles coming from surrounding volumes. The secondary showerhead faces away from the reticle and toward the EUV illumination and projection optics, supplying them with purge gas while at the same time creating a buffer zone that is kept free of any particle contamination originating from those optics.
摘要翻译： 介绍了一种保护标线片免受光化性EUV标线检查工具中的颗粒和化学物质的方法和设备。 该方法和装置利用一对淋浴喷头形式的多孔金属扩散器来提供清洁气体的连续流动。 主喷头用平滑流动的低压气体将掩模版表面沐浴，将其与周围体积的颗粒隔离。 二次淋浴头面向远离掩模版并朝向EUV照明和投影光学元件，为其提供吹扫气体，同时创建一个缓冲区，保持没有源自这些光学元件的任何颗粒污染。
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3.发明授权公开(公告)号：US06989629B1
公开(公告)日：2006-01-24
申请号：US11040627
申请日：2005-01-21
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916 , H01J2893/0063
摘要： Method and apparatus for mitigating the transport of debris generated and dispersed from electric discharge sources by thermophoretic and electrostatic deposition. A member is positioned adjacent the front electrode of an electric discharge source and used to establish a temperature difference between it and the front electrode. By flowing a gas between the member and the front electrode a temperature gradient is established that can be used for thermophoretic deposition of particulate debris on either the member or front electrode depending upon the direction of the thermal gradient. Establishing an electric field between the member and front electrode can aid in particle deposition by electrostatic deposition.
摘要翻译： 用于通过热电泳和静电沉积减轻由放电源产生和分散的碎片的运输的方法和装置。 一个构件位于与放电源的前电极相邻并用于建立其与前电极之间的温度差。 通过在构件和前电极之间流动气体，建立温度梯度，该温度梯度可用于根据热梯度的方向将颗粒碎片热沉沉在构件或前电极上。 在构件和前电极之间建立电场可以通过静电沉积来帮助颗粒沉积。
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4.发明授权公开(公告)号：US06888297B2
公开(公告)日：2005-05-03
申请号：US10325997
申请日：2002-12-19
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916 , H01J2893/0063
摘要： Method and apparatus for mitigating the transport of debris generated and dispersed from electric discharge sources by thermophoretic and electrostatic deposition. A member is positioned adjacent the front electrode of an electric discharge source and used to establish a temperature difference between it and the front electrode. By flowing a gas between the member and the front electrode a temperature gradient is established that can be used for thermophoretic deposition of particulate debris on either the member or front electrode depending upon the direction of the thermal gradient. Establishing an electric field between the member and front electrode can aid in particle deposition by electrostatic deposition.
摘要翻译： 用于通过热电泳和静电沉积减轻由放电源产生和分散的碎片的运输的方法和装置。 一个构件位于与放电源的前电极相邻并用于建立其与前电极之间的温度差。 通过在构件和前电极之间流动气体，建立温度梯度，该温度梯度可用于根据热梯度的方向将颗粒碎片热沉沉在构件或前电极上。 在构件和前电极之间建立电场可以通过静电沉积来帮助颗粒沉积。
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公开(公告)号：US06492067B1
公开(公告)日：2002-12-10
申请号：US09454674
申请日：1999-12-03
IPC分类号： G03F900
CPC分类号： G03F1/64 , G03F7/70983
摘要： A removable pellicle for a lithographic mask that provides active and robust particle protection, and which utilizes a traditional pellicle and two deployments of thermophoretic protection to keep particles off the mask. The removable pellicle is removably attached via a retaining structure to the mask substrate by magnetic attraction with either contacting or non-contacting magnetic capture mechanisms. The pellicle retaining structural is composed of an anchor piece secured to the mask substrate and a frame member containing a pellicle. The anchor piece and the frame member are in removable contact or non-contact by the magnetic capture or latching mechanism. In one embodiment, the frame member is retained in a floating (non-contact) relation to the anchor piece by magnetic levitation. The frame member and the anchor piece are provided with thermophoretic fins which are interdigitated to prevent particles from reaching the patterned area of the mask. Also, the anchor piece and mask are maintained at a higher temperature than the frame member and pellicle which also prevents particles from reaching the patterned mask area by thermophoresis. The pellicle can be positioned over the mask to provide particle protection during mask handling, inspection, and pumpdown, but which can be removed manually or robotically for lithographic use of the mask.
摘要翻译： 用于光刻掩模的可移除防护薄膜，其提供有效和坚固的颗粒保护，并且其利用传统的防护薄膜和两个部署热保护性保护以将颗粒保持在掩模上。 通过接触或非接触磁捕获机构的磁吸引，可除去的防护薄膜组件通过保持结构可拆卸地附接到掩模基板。 防护薄膜保持结构由固定到掩模基板的锚固件和包含防护薄膜的框架构件组成。 锚固件和框架构件通过磁捕获或锁定机构可拆卸地接触或非接触。 在一个实施例中，框架构件通过磁悬浮保持与锚固件的浮动（非接触）关系。 框架构件和锚固件设置有散热鳍片，其被交错以防止颗粒到达掩模的图案化区域。 此外，锚固件和掩模保持在比框架构件和防护薄膜更高的温度，其也通过热泳来防止颗粒到达图案化掩模区域。 防护薄膜组件可以位于掩模上方，以在掩模处理，检查和抽吸期间提供颗粒保护，但是可以手动或机器人地去除防护薄膜以用于掩模的光刻使用。
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6.发明授权公开(公告)号：US06253464B1
公开(公告)日：2001-07-03
申请号：US09642222
申请日：2000-08-18
IPC分类号： F26B504
CPC分类号： G03F7/70866 , G03F7/70983
摘要： A system that employs thermophoresis to protect lithographic surfaces from particle deposition and operates in an environment where the pressure is substantially constant and can be sub-atmospheric. The system (thermophoretic pellicle) comprises an enclosure that surrounds a lithographic component whose surface is being protected from particle deposition. The enclosure is provided with means for introducing a flow of gas into the chamber and at least one aperture that provides for access to the lithographic surface for the entry and exit of a beam of radiation, for example, and further controls gas flow into a surrounding low pressure environment such that a higher pressure is maintained within the enclosure and over the surface being protected. The lithographic component can be heated or, alternatively the walls of the enclosure can be cooled to establish a temperature gradient between the surface of the lithographic component and the walls of the enclosure, thereby enabling the thermophoretic force that resists particle deposition.
摘要翻译： 采用热泳法保护光刻表面免受颗粒沉积并在压力基本上恒定并且可能低于大气压的环境中运行的系统。 该系统（热泳薄膜）包括围绕其表面被保护以免颗粒沉积的光刻部件的外壳。 外壳设置有用于将气流引入室中的装置和至少一个孔，其提供用于进入光刻表面以进入和离开辐射束，并进一步控制气体流入周围 低压环境，使得在外壳内保持更高的压力并且在受保护的表面上。 可以加热平版印刷部件，或者替代地，外壳的壁可以被冷却以在光刻部件的表面和外壳的壁之间建立温度梯度，从而使得能够抵抗颗粒沉积的热解压力。
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公开(公告)号：US6153044A
公开(公告)日：2000-11-28
申请号：US71359
申请日：1998-04-30
IPC分类号： G03F1/14 , G03F7/20 , H01L21/027 , C23F1/02 , C23C16/00
CPC分类号： G03F7/70866 , G03F7/70983
摘要： A system that employs thermophoresis to protect lithographic surfaces from particle deposition and operates in an environment where the pressure is substantially constant and can be sub-atmospheric. The system (thermophoretic pellicle) comprises an enclosure that surrounds a lithographic component whose surface is being protected from particle deposition. The enclosure is provided with means for introducing a flow of gas into the chamber and at least one aperture that provides for access to the lithographic surface for the entry and exit of a beam of radiation, for example, and further controls gas flow into a surrounding low pressure environment such that a higher pressure is maintained within the enclosure and over the surface being protected. The lithographic component can be heated or, alternatively the walls of the enclosure can be cooled to establish a temperature gradient between the surface of the lithographic component and the walls of the enclosure, thereby enabling the thermophoretic force that resists particle deposition.
摘要翻译： 采用热泳法保护光刻表面免受颗粒沉积并在压力基本上恒定并且可能低于大气压的环境中运行的系统。 该系统（热泳薄膜）包括围绕其表面被保护以免颗粒沉积的光刻部件的外壳。 外壳设置有用于将气流引入室中的装置和至少一个孔，其提供用于进入光刻表面以进入和离开辐射束，并进一步控制气体流入周围 低压环境，使得在外壳内保持更高的压力并且在受保护的表面上。 可以加热平版印刷部件，或者替代地，外壳的壁可以被冷却以在光刻部件的表面和外壳的壁之间建立温度梯度，从而使得能够抵抗颗粒沉积的热解压力。
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公开(公告)号：US6156212A
公开(公告)日：2000-12-05
申请号：US244259
申请日：1999-02-03
CPC分类号： G01N1/2211 , B01D21/0087 , B01D21/267 , G01N2001/2223
摘要： An opposed-flow virtual cyclone for aerosol collation which can accurately collect, classify, and concentrate (enrich) particles in a specific size range. The opposed-flow virtual cyclone is a variation on the virtual cyclone and has its inherent advantages (no-impact particle separation in a simple geometry), while providing a more robust design for concentrating particles in a flow-through type system. The opposed-flow virtual cyclone consists of two geometrically similar virtual cyclones arranged such that their inlet jets are inwardly directed and symmetrically opposed relative to a plane of symmetry located between the two inlet slits. A top plate bounds both jets on the "top" side of the inlets, while the other or lower wall curves "down" and away from each inlet jet. Each inlet jet will follow the adjacent lower wall as it turns away, and that particles will be transferred away from the wall and towards the symmetry plane by centrifugal action. After turning, the two jets merge smoothly along the symmetry line and flow parallel to it through the throat. Particles are transferred from the main flows, across a dividing streamline, and into a central recirculating region, where particle concentrations become greatly increased relative to the main stream.
摘要翻译： 用于气溶胶排放的相对流动的虚拟旋风器，其可以精确地收集，分类和浓缩（富集）特定尺寸范围的颗粒。 相对流动的虚拟旋风是虚拟旋风分离器的一个变体，并具有其固有的优点（简单几何中无冲击粒子分离），同时为流通式系统中的颗粒集中提供了更为坚固的设计。 相对流虚拟旋风分离器由两个几何相似的虚拟旋风器组成，其布置成使得它们的入口射流相对于位于两个入口狭缝之间的对称平面向内指向和对称地相对。 顶板在入口的“顶部”侧限制两个喷嘴，而另一个或下部壁则“向下”并远离每个入口喷嘴。 每个入口射流随着它的转移而跟随相邻的下壁，并且该颗粒将通过离心作用从壁上转移离开对称平面。 转弯后，两架飞机沿对称线顺利合并，并通过喉咙平行流动。 颗粒从主要流动，跨越分流流线转移到中心再循环区域，其中颗粒浓度相对于主流流量大大增加。
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9.发明授权Apparatus to collect, classify, concentrate, and characterize gas-borne particles 有权收集，分类，集中和表征气体颗粒的装置公开(公告)号：US06664550B2
公开(公告)日：2003-12-16
申请号：US10137983
申请日：2002-04-30
IPC分类号： G01N2164
CPC分类号： G01N1/2202 , G01N1/24 , G01N1/405 , G01N2001/2223
摘要： An aerosol lab-on-a-chip (ALOC) integrates one or more of a variety of particle collection, classification, concentration (enrichment), an characterization processes onto a single substrate or layered stack of such substrates. By mounting a UV laser diode laser light source on the substrate, or substrates tack, so that it is located down-stream of the sample inlet port and at right angle the sample particle stream, the UV light source can illuminate individual particles in the stream to induce a fluorescence response in those particles having a fluorescent signature such as biological particles, some of said particles. An illuminated particle having a fluorescent signal above a threshold signal would trigger a sorter module that would separate that particle from the particle stream.
摘要翻译： 气溶胶实验室（ALOC）将各种颗粒收集，分类，浓缩（浓缩），表征过程中的一种或多种集成到单个底物或这种底物的分层堆叠上。 通过将UV激光二极管激光光源安装在基板上或基板上，使得其位于样品入口的下游并且与样品颗粒流成直角，则UV光源可以照射流中的各个颗粒 在具有荧光特征的那些颗粒中诱导荧光响应，例如生物颗粒，一些所述颗粒。 具有高于阈值信号的荧光信号的照射粒子将触发分离器模块，其将该颗粒与粒子流分离。
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10.发明授权Apparatus to collect, classify, concentrate, and characterize gas-borne particles 失效收集，分类，集中和表征气体颗粒的装置公开(公告)号：US06386015B1
公开(公告)日：2002-05-14
申请号：US09469718
申请日：1999-12-21
IPC分类号： G01N100
CPC分类号： G01N1/2202 , G01N1/24 , G01N1/405 , G01N2001/2223
摘要： An aerosol lab-on-a-chip (ALOC) integrates one or more of a variety of aerosol collection, classification, concentration (enrichment), and characterization processes onto a single substrate or layered stack of such substrates. By taking advantage of modern micro-machining capabilities, an entire suite of discrete laboratory aerosol handling and characterization techniques can be combined in a single portable device that can provide a wealth of data on the aerosol being sampled. The ALOC offers parallel characterization techniques and close proximity of the various characterization modules helps ensure that the same aerosol is available to all devices (dramatically reducing sampling and transport errors). Micro-machine fabrication of the ALOC significantly reduces unit costs relative to existing technology, and enables the fabrication of small, portable ALOC devices, as well as the potential for rugged design to allow operation in harsh environments. Miniaturization also offers the potential of working with smaller particle sizes and lower pressure drops (leading to reduction of power consumption).
摘要翻译： 气溶胶实验室（ALOC）将一种或多种各种气溶胶收集，分级，浓缩（浓缩）和表征过程集成到单个基底或这种基底的分层堆叠上。 通过利用现代微加工能力，可以将一整套独立的实验室气溶胶处理和表征技术组合在一个便携式设备中，可以为所采样的气溶胶提供丰富的数据。 ALOC提供并行表征技术，并且各种表征模块的紧密接近有助于确保相同的气溶胶可用于所有设备（显着降低采样和传输误差）。 ALOC的微机械制造相对于现有技术显着降低了单位成本，并且能够制造小型便携式ALOC装置，并且具有坚固的设计以允许在恶劣环境中操作的潜力。 小型化还提供了使用更小粒径和更低压降（导致功耗降低）的潜力。
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