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公开(公告)号:US20240105595A1
公开(公告)日:2024-03-28
申请号:US17934389
申请日:2022-09-22
发明人: Johnatan A. Kantarovsky , Santosh Sharma , Michael J. Zierak , Steven J. Bentley , Ephrem G. Gebreselasie
IPC分类号: H01L23/525 , H01L21/76 , H01L27/06 , H01L29/20
CPC分类号: H01L23/5256 , H01L21/7605 , H01L27/0605 , H01L29/2003
摘要: Embodiments of the disclosure provide an electrically programmable fuse (efuse) over crystalline semiconductor material. A structure according to the disclosure includes a plurality of crystalline semiconductor layers. Each crystalline semiconductor layer includes a compound material. A metallic layer is on the plurality of crystalline semiconductor layers. The metallic layer has a lower resistivity than an uppermost layer of the plurality of crystalline semiconductor layers. A pair of gate conductors is on respective portions of the metallic layer. The metallic layer defines an electrically programmable fuse (efuse) link between the gate conductors.
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公开(公告)号:US20240234533A1
公开(公告)日:2024-07-11
申请号:US18152710
申请日:2023-01-10
IPC分类号: H01L29/47 , H01L29/40 , H01L29/66 , H01L29/778
CPC分类号: H01L29/475 , H01L29/401 , H01L29/66462 , H01L29/7786
摘要: Disclosed is a structure including a substrate and a transistor on the substrate. The transistor includes a barrier layer above the substrate and a multi-gate structure on the barrier layer. The multi-gate structure includes a primary gate and a secondary gate. The secondary gate has opposing sidewalls, opposing end walls and a top surface. The primary gate includes essentially vertically-oriented first portions on the barrier layer positioned laterally adjacent to opposing sidewalls, respectively, of the secondary gate. Optionally, the primary gate also includes an essentially horizontally-oriented second portion on the top surface of the secondary gate and/or essentially vertically-oriented third portions on the opposing end walls, respectively. The secondary gate can be a floating gate. Also disclosed is a method of forming the structure.
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公开(公告)号:US20240085247A1
公开(公告)日:2024-03-14
申请号:US17931670
申请日:2022-09-13
IPC分类号: G01K7/18 , H01C7/04 , H01L27/06 , H01L29/20 , H01L29/205 , H01L29/40 , H01L29/778
CPC分类号: G01K7/183 , H01C7/041 , H01L27/0605 , H01L29/2003 , H01L29/205 , H01L29/402 , H01L29/7786
摘要: A structure includes a negative temperature coefficient (NTC) resistor for use in gallium nitride (GaN) technology. The NTC resistor includes a p-type doped GaN (pGaN) layer, and a gallium nitride (GaN) heterojunction structure under the pGaN layer. The GaN heterojunction structure includes a barrier layer and a channel layer. An isolation region extends across an interface of the barrier layer and the channel layer, and a first metal electrode is on the pGaN layer spaced from a second metal electrode on the pGaN layer. The NTC resistor can be used as a temperature compensated reference in a structure providing a temperature detection circuit. The temperature detection circuit includes an enhancement mode HEMT sharing parts with the NTC resistor and includes temperature independent current sources including depletion mode HEMTs.
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公开(公告)号:US20240063219A1
公开(公告)日:2024-02-22
申请号:US17819980
申请日:2022-08-16
IPC分类号: H01L27/088 , H01L29/66 , H01L29/778 , H01L29/40 , H01L29/06
CPC分类号: H01L27/0883 , H01L29/66462 , H01L29/7786 , H01L29/401 , H01L29/402 , H01L29/0607
摘要: A structure for an III-V integrated circuit includes an integrated depletion and enhancement mode gallium nitride high electron mobility transistors (HEMTs). The structure includes a first, depletion mode HEMT having a first source, a first drain and a first fieldplate gate between the first source and the first drain, and a second, enhancement mode HEMT having a second source and a second drain. The second HEMT also includes a gallium nitride (GaN) gate and a second fieldplate gate between the second source and the second drain. The second fieldplate gate of the second HEMT may be closer to the second drain than the GaN gate. The structure provides a reliable, low leakage, high voltage depletion mode HEMT (e.g., with operating voltages of greater than 100V, but with a pinch-off voltage of less than 6 Volts) integrated with a gallium nitride (GaN) gate-based enhancement mode HEMT.
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公开(公告)号:US20240204764A1
公开(公告)日:2024-06-20
申请号:US18065768
申请日:2022-12-14
CPC分类号: H03K17/08 , H01L29/404 , H01L29/7816
摘要: An integrated circuit (IC) having a high voltage semiconductor device with a plurality of field plates between the gate and drain. The IC further includes a biasing circuit electrically coupled to each of the plurality of field plates, the biasing circuit including a plurality of high voltage depletion mode transistors, each having a pinch off voltage. The high voltage depletion mode transistors may have different pinch off voltages, and each of the field plates are each independently biased by a different one of the high voltage depletion mode transistors.
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公开(公告)号:US20240063301A1
公开(公告)日:2024-02-22
申请号:US17891244
申请日:2022-08-19
发明人: Santosh Sharma
IPC分类号: H01L29/778 , H01L29/20 , H01L27/02 , H01L29/06
CPC分类号: H01L29/7786 , H01L29/2003 , H01L27/0266 , H01L29/0657
摘要: Disclosed are protective structures using depletion-mode and enhancement-mode transistors. A structure according to the disclosure may include a depletion-mode transistor having a gate coupled to ground and a first source/drain terminal. An enhancement-mode transistor includes a gate coupled to a second source/drain terminal of the depletion-mode transistor and a first source/drain terminal coupled to the gate of the depletion-mode transistor. The depletion-mode transistor limits a current flow from the first source/drain terminal to the gate of the enhancement-mode transistor.
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公开(公告)号:US12107585B2
公开(公告)日:2024-10-01
申请号:US17956273
申请日:2022-09-29
发明人: Santosh Sharma
IPC分类号: H03K5/22 , H03K17/687
CPC分类号: H03K5/22 , H03K17/6871
摘要: The present disclosure relates to a circuit and, more particularly, to comparator circuits used with a depletion mode device and methods of operation. The circuit includes: a comparator; a transistor connected to an output of the comparator; and a depletion mode device connected to ground and comprising a control gate connected to the transistor.
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公开(公告)号:US20240204090A1
公开(公告)日:2024-06-20
申请号:US18065674
申请日:2022-12-14
发明人: Santosh Sharma , Mark D. Levy
IPC分类号: H01L29/778 , H01L21/3213 , H01L29/06 , H01L29/08 , H01L29/10 , H01L29/20 , H01L29/66
CPC分类号: H01L29/7786 , H01L21/32139 , H01L29/0642 , H01L29/0891 , H01L29/1029 , H01L29/2003 , H01L29/66462
摘要: A disclosed structure includes an enhancement mode high electron mobility transistor (HEMT). The HEMT includes a barrier layer with a thick portion positioned laterally between thin portions and a gate. The gate includes a semiconductor layer (e.g., a P-type III-V semiconductor layer) on the thick portion of the barrier layer and having a thick portion positioned laterally between thin portions. The gate also includes a gate conductor layer on and narrower than the thick portion of the semiconductor layer, so end walls of the gate are stepped. Thin portions of the barrier layer near these end walls minimize or eliminate charge build up in a channel layer below. To block current paths around the gate, isolation regions can be below the thin portions of the barrier layer offset from the semiconductor layer. The structure can further include alternating e-mode and d-mode HEMTs. Also disclosed are associated method embodiments.
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公开(公告)号:US20240128958A1
公开(公告)日:2024-04-18
申请号:US18045909
申请日:2022-10-12
发明人: Santosh Sharma
IPC分类号: H03K5/04 , H03K17/687
CPC分类号: H03K5/04 , H03K17/6871
摘要: Disclosed are circuits for controlling slew rate of a transistor during switching. Each circuit includes a first transistor (e.g., a gallium nitride (GaN)-based high electron mobility transistor (HEMT) or metal-insulator-semiconductor HEMT (MISHEMT)), a capacitor, and a second transistor. The first transistor includes a first gate connected to a pad for receiving a pulse-width modulation (PWM) signal, a first drain region connected to a first plate of the capacitor, and a first source region. The second transistor includes a second gate connected to a second plate of the capacitor, a second drain region, and a second source region and is connected to both the pad and the first transistor. The connection between the first and second transistors varies depending on whether the first transistor is an enhancement or depletion mode device and on whether the slew rate control is employed for on state or off state switching.
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公开(公告)号:US20240072161A1
公开(公告)日:2024-02-29
申请号:US17823112
申请日:2022-08-30
发明人: Santosh Sharma
IPC分类号: H01L29/778 , H01L29/20 , H03K17/687
CPC分类号: H01L29/7786 , H01L29/2003 , H03K17/6871
摘要: Embodiments of the present disclosure provide a semiconductor device, including: a high electron mobility transistor (HEMT) bidirectional switch including: a first source at a first potential; a second source a second potential different than the first potential; and a substrate; and a biasing circuit, coupled to the first source of the bidirectional switch and the second source of the bidirectional switch, for biasing the substrate at a potential equal to the lower of the first potential of the first source of the bidirectional switch and the second potential of the second source of the bidirectional switch.
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