-
公开(公告)号:US20230111689A1
公开(公告)日:2023-04-13
申请号:US18081177
申请日:2022-12-14
Applicant: Google LLC
Inventor: Stephen M. Cea , Annalisa Cappellani , Martin D. Giles , Rafael Rios , Seiyon Kim , Kelin J. Kuhn
IPC: H01L29/786 , H01L29/66 , H01L29/08 , H01L29/423 , H01L29/06 , H01L21/268 , H01L29/78
Abstract: Nanowire structures having non-discrete source and drain regions are described. For example, a semiconductor device includes a plurality of vertically stacked nanowires disposed above a substrate. Each of the nanowires includes a discrete channel region disposed in the nanowire. A gate electrode stack surrounds the plurality of vertically stacked nanowires. A pair of non-discrete source and drain regions is disposed on either side of, and adjoining, the discrete channel regions of the plurality of vertically stacked nanowires.
-
公开(公告)号:US11757026B2
公开(公告)日:2023-09-12
申请号:US17072992
申请日:2020-10-16
Applicant: Google LLC
Inventor: Stephen M. Cea , Cory E. Weber , Patrick H. Keys , Seiyon Kim , Michael G. Haverty , Sadasivan Shankar
IPC: H01L29/775 , H01L29/66 , B82Y10/00 , H01L29/06 , H01L29/417 , H01L29/786 , H01L29/78 , H01L29/16 , B82Y40/00
CPC classification number: H01L29/775 , B82Y10/00 , H01L29/0673 , H01L29/41791 , H01L29/66439 , H01L29/66545 , H01L29/785 , H01L29/78696 , B82Y40/00 , H01L29/16
Abstract: Nanowire structures having wrap-around contacts are described. For example, a nanowire semiconductor device includes a nanowire disposed above a substrate. A channel region is disposed in the nanowire. The channel region has a length and a perimeter orthogonal to the length. A gate electrode stack surrounds the entire perimeter of the channel region. A pair of source and drain regions is disposed in the nanowire, on either side of the channel region. Each of the source and drain regions has a perimeter orthogonal to the length of the channel region. A first contact completely surrounds the perimeter of the source region. A second contact completely surrounds the perimeter of the drain region.
-
公开(公告)号:US11552197B2
公开(公告)日:2023-01-10
申请号:US16740089
申请日:2020-01-10
Applicant: Google LLC
Inventor: Stephen M. Cea , Annalisa Cappellani , Martin D. Giles , Rafael Rios , Seiyon Kim , Kelin J. Kuhn
IPC: H01L29/786 , H01L29/78 , H01L29/41 , H01L29/66 , H01L29/08 , H01L29/423 , H01L29/06 , H01L21/268 , B82Y40/00
Abstract: Nanowire structures having non-discrete source and drain regions are described. For example, a semiconductor device includes a plurality of vertically stacked nanowires disposed above a substrate. Each of the nanowires includes a discrete channel region disposed in the nanowire. A gate electrode stack surrounds the plurality of vertically stacked nanowires. A pair of non-discrete source and drain regions is disposed on either side of, and adjoining, the discrete channel regions of the plurality of vertically stacked nanowires.
-
公开(公告)号:US12125916B2
公开(公告)日:2024-10-22
申请号:US18081177
申请日:2022-12-14
Applicant: Google LLC
Inventor: Stephen M. Cea , Annalisa Cappellani , Martin D. Giles , Rafael Rios , Seiyon Kim , Kelin J. Kuhn
IPC: H01L29/786 , H01L21/268 , H01L29/06 , H01L29/08 , H01L29/423 , H01L29/66 , H01L29/78 , B82Y40/00
CPC classification number: H01L29/78618 , H01L21/268 , H01L29/0673 , H01L29/0847 , H01L29/42356 , H01L29/42392 , H01L29/66477 , H01L29/66742 , H01L29/66787 , H01L29/66977 , H01L29/7845 , H01L29/7848 , H01L29/78651 , H01L29/78684 , H01L29/78696 , B82Y40/00 , H01L29/7839
Abstract: Nanowire structures having non-discrete source and drain regions are described. For example, a semiconductor device includes a plurality of vertically stacked nanowires disposed above a substrate. Each of the nanowires includes a discrete channel region disposed in the nanowire. A gate electrode stack surrounds the plurality of vertically stacked nanowires. A pair of non-discrete source and drain regions is disposed on either side of, and adjoining, the discrete channel regions of the plurality of vertically stacked nanowires.
-
-
-