SMART SHUNT DEVICES AND METHODS
    1.
    发明申请
    SMART SHUNT DEVICES AND METHODS 有权
    SMART SHUNT设备和方法

    公开(公告)号:US20140309577A1

    公开(公告)日:2014-10-16

    申请号:US14213170

    申请日:2014-03-14

    IPC分类号: A61F9/007 G01L9/00 A61M27/00

    摘要: Devices and methods for the measurement and control of fluid using one or two capacitors are described. The devices use Micro-Electro-Mechanical-Systems (MEMS) and radio-frequency inductive coupling to sense the properties of a fluid in a tube. The single and double capacitor devices may be coupled to shunts implantable in a patient and operable to be interrogated non-invasively. The shunts employing the novel capacitor devices are insensitive to stray signals such as the orientation of a patient's head. The devices are operable to employ a wireless external spectrometer to measure passive subcutaneous components.

    摘要翻译: 描述了使用一个或两个电容器来测量和控制流体的装置和方法。 这些器件使用微机电系统(MEMS)和射频感应耦合来感测管中流体的性质。 单电容器装置和双电容器装置可以耦合到可植入患者体内的分流器,并可操作以非侵入性地询问。 采用新型电容器装置的分流器对诸如患者头部的取向的杂散信号不敏感。 这些装置可操作地使用无线外部光谱仪来测量被动皮下组分。

    VIBRATION POWERED IMPACT RECORDER (VPIR)
    2.
    发明申请
    VIBRATION POWERED IMPACT RECORDER (VPIR) 有权
    振动式冲击记录仪(VPIR)

    公开(公告)号:US20110004444A1

    公开(公告)日:2011-01-06

    申请号:US12792372

    申请日:2010-06-02

    IPC分类号: G06F17/40 G01P15/08 F03G7/08

    CPC分类号: G01P1/127 G01P15/0891

    摘要: A vibration-powered impact recording device that harvests power from vibrations that affect the device is provided. The recording device is affixed to an object and includes a vibration limit detection and recordation system. The system can include a suitable part that is fixed to the object, and a mass (or other suitable part) that is less firmly attached, with the relative motion between the two parts producing an electrical voltage. The electrical voltage can be used to power an information storage unit that records the details of the impact and optionally other sensors which record other parameters such as temperature, humidity etc. at the time of impact.

    摘要翻译: 提供了一种振动动力的冲击记录装置,其从影响装置的振动收集电力。 记录装置固定在物体上并包括振动极限检测和记录系统。 该系统可以包括固定到物体上的适当部件和不牢固地附接的质量(或其它合适的部件),两部分之间的相对运动产生电压。 可以使用电压为记录冲击细节的信息存储单元供电,以及可能的其他记录其他参数(如温度,湿度等)的其他传感器的电源。

    Vibration powered impact recorder (VPIR)
    3.
    发明授权
    Vibration powered impact recorder (VPIR) 有权
    振动动力撞击记录仪(VPIR)

    公开(公告)号:US08571835B2

    公开(公告)日:2013-10-29

    申请号:US12792372

    申请日:2010-06-02

    IPC分类号: G06F17/40 G01N1/00 G11C13/02

    CPC分类号: G01P1/127 G01P15/0891

    摘要: A vibration-powered impact recording device that harvests power from vibrations that affect the device is provided. The recording device is affixed to an object and includes a vibration limit detection and recordation system. The system can include a suitable part that is fixed to the object, and a mass (or other suitable part) that is less firmly attached, with the relative motion between the two parts producing an electrical voltage. The electrical voltage can be used to power an information storage unit that records the details of the impact and optionally other sensors which record other parameters such as temperature, humidity etc. at the time of impact.

    摘要翻译: 提供了一种振动动力的冲击记录装置,其从影响装置的振动收集电力。 记录装置固定在物体上并包括振动极限检测和记录系统。 该系统可以包括固定到物体上的适当部件和不牢固地附接的质量(或其它合适的部件),两部分之间的相对运动产生电压。 可以使用电压为记录冲击细节的信息存储单元供电,以及可能的其他记录其他参数(如温度,湿度等)的其他传感器的电源。

    Alignment mark fabrication process to limit accumulation of errors in level to level overlay
    4.
    发明授权
    Alignment mark fabrication process to limit accumulation of errors in level to level overlay 有权
    对准标记制作过程,以限制层次叠加中错误的积累

    公开(公告)号:US06440816B1

    公开(公告)日:2002-08-27

    申请号:US09771621

    申请日:2001-01-30

    IPC分类号: H01L2176

    CPC分类号: H01L21/76229 Y10S438/975

    摘要: A process for device fabrication, including coating a wafer with a layer including SiO2, SiNx, and a first resist, defining shallow trench isolation and alignment patterns in the first resist, transferring the first resist pattern into the SiO2 and SiNx, removing the first resist, etching trenches to a depth suitable for shallow trench isolation, coating the wafer with a second photoresist, defining open areas around alignment-marks, etching alignment mark trenches to a depth greater than the trench depth, suitable for alignment mark detection, removing the second resist and the SiNx, depositing SiO2 to fill the trenches for shallow trench isolation and partially fill the alignment mark trenches for alignment mark detection; and performing chemical mechanical polishing, leaving shallow trench isolation features and topographical alignment marks. As a result, alignment marks can be fabricated from the STI level with an arbitrary depth and an SiO2 fill to produce topography and/or material contrast without accumulating errors by using a mask that is separate from the transistor isolation feature mask to define the alignment mark positions.

    摘要翻译: 一种用于器件制造的方法,包括用包括SiO 2,SiN x和第一抗蚀剂的层涂覆晶片,在第一抗蚀剂中限定浅沟槽隔离和取向图案,将第一抗蚀剂图案转移到SiO 2和SiN x中,除去第一抗蚀剂 将沟槽蚀刻到适于浅沟槽隔离的深度,用第二光致抗蚀剂涂覆晶片,限定对准标记周围的开放区域,蚀刻对准标记沟槽至大于沟槽深度的深度,适合于对准标记检测,去除第二 抗蚀剂和SiNx,沉积SiO 2以填充沟槽用于浅沟槽隔离并部分填充对准标记沟槽用于对准标记检测; 并执行化学机械抛光,留下浅沟槽隔离特征和形貌对准标记。 结果,可以从具有任意深度的STI级和SiO 2填充制造对准标记,以通过使用与晶体管隔离特征掩模分离的掩模来定义对准标记来产生形貌和/或材料对比度而不会累积误差 职位

    No clog shunt using a compact fluid drag path
    5.
    发明授权
    No clog shunt using a compact fluid drag path 有权
    没有堵塞分流使用紧凑的流体拖动路径

    公开(公告)号:US08088091B2

    公开(公告)日:2012-01-03

    申请号:US12381170

    申请日:2009-03-09

    IPC分类号: A61M1/00 A61M5/00

    摘要: The present invention is an improved shunt system for draining CSF. The system includes a removable sheath for reduction of catheter clogging during shunt insertion, a catheter with relatively large holes, an extracranial filter to allow non-invasive filter replacement, and a wireless flow/pressure meter to monitor and control CSF flow.

    摘要翻译: 本发明是用于排出CSF的改进的分流系统。 该系统包括可拆卸护套,用于在分流插入期间减少导管堵塞,具有相对较大孔的导管,允许非侵入性过滤器更换的颅外过滤器以及用于监测和控制CSF流动的无线流量/压力计。

    No clog shunt using a compact fluid drag path
    8.
    发明申请
    No clog shunt using a compact fluid drag path 有权
    没有堵塞分流使用紧凑的流体拖动路径

    公开(公告)号:US20100228179A1

    公开(公告)日:2010-09-09

    申请号:US12381170

    申请日:2009-03-09

    IPC分类号: A61M1/00 A61M25/00

    摘要: The present invention is an improved shunt system for draining CSF. The system includes a removable sheath for reduction of catheter clogging during shunt insertion, a catheter with relatively large holes, an extracranial filter to allow non-invasive filter replacement, and a wireless flow/pressure meter to monitor and control CSF flow.

    摘要翻译: 本发明是用于排出CSF的改进的分流系统。 该系统包括可拆卸护套,用于在分流插入期间减少导管堵塞,具有相对较大孔的导管,允许非侵入性过滤器更换的颅外过滤器以及用于监测和控制CSF流动的无线流量/压力计。

    Method of forming nanotube vertical field effect transistor
    9.
    发明授权
    Method of forming nanotube vertical field effect transistor 失效
    形成纳米管垂直场效应晶体管的方法

    公开(公告)号:US07736979B2

    公开(公告)日:2010-06-15

    申请号:US11765788

    申请日:2007-06-20

    IPC分类号: H01L29/78 H01L21/336

    摘要: A nanotube field effect transistor and a method of fabrication are disclosed. The method includes electrophoretic deposition of a nanotube to contact a region of a conductive layer defined by an aperture. Embodiments of the present disclosure provide a method of depositing nanotubes in a region defined by an aperture, with control over the number of nanotubes to be deposited, as well as the pattern and spacing of nanotubes. For example, electrophoretic deposition, along with proper configuration of the aperture, allows at least one nanotube to be deposited in a target region with nanometer scale precision. Pre-sorting of nanotubes, e.g., according to their geometries or other properties, may be used in conjunction with embodiments of the present disclosure to facilitate fabrication of devices with specific performance requirements.

    摘要翻译: 公开了一种纳米管场效应晶体管及其制造方法。 该方法包括电泳沉积纳米管以接触由孔限定的导电层的区域。 本公开的实施例提供了一种在由孔限定的区域中沉积纳米管的方法,控制要沉积的纳米管的数量,以及纳米管的图案和间隔。 例如,电泳沉积以及孔的适当构造允许至少一个纳米管以纳米级精度沉积在目标区域中。 可以结合本公开的实施例使用例如根据其几何形状或其他性质对纳米管进行预分选,以便于制造具有特定性能要求的装置。

    Manufacturing system error detection
    10.
    发明授权
    Manufacturing system error detection 失效
    制造系统错误检测

    公开(公告)号:US5906902A

    公开(公告)日:1999-05-25

    申请号:US806301

    申请日:1997-02-26

    摘要: The present invention relates to a method for determining error in a manufacturing system by providing a substrate having first pattern disposed thereon. An energy source such as electromagnetic radiation or particle beams is projected through a shaping member having a second pattern incongruent with the first pattern to form a shaped energy source. The shaped energy source impinges on the first pattern such that a portion of said shaped energy source is reflected, scattered, or transmitted by the first pattern. The portion of the shaped energy source that is reflected, scattered or transmitted by the first pattern is detected to determine the presence or absence of an error in the manufacturing system.In a further aspect, the present invention relates to a method for constructing an error detection system. A waveform representative of at least one manufacturing system parameter is selected. Associated with the waveform is a mathematical function. The function is expanded in a set of orthogonal functions to yield coefficients which are used to construct an error detection pattern.

    摘要翻译: 本发明涉及一种通过提供其上布置有第一图案的基板来确定制造系统中的误差的方法。 诸如电磁辐射或粒子束的能量源通过具有与第一图案不一致的第二图案的成形构件突出以形成成形能量源。 成形的能源照射在第一图案上,使得所述成形能量源的一部分被第一图案反射,散射或透射。 检测由第一图案反射,散射或透射的成形能量源的部分,以确定制造系统中是否存在误差。 另一方面,本发明涉及一种用于构建错误检测系统的方法。 选择代表至少一个制造系统参数的波形。 与波形相关的是一个数学函数。 该函数在一组正交函数中扩展,以产生用于构建错误检测模式的系数。