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公开(公告)号：US20060138960A1
公开(公告)日：2006-06-29
申请号：US10536918
申请日：2003-11-28
申请人： Guenther Derra , Joseph Pankert , Willi Neff , Klaus Bergmann , Jeroen Jonkers
发明人： Guenther Derra , Joseph Pankert , Willi Neff , Klaus Bergmann , Jeroen Jonkers
摘要： The invention relates to a gas discharge lamp for EUV radiation with an anode (1) and a hollow cathode (2), wherein the hollow cathode (2) has at least two openings (3, 3′) and the anode (1) has a through hole (4), which is characterized in that the longitudinal axes (5, 5′) of the hollow cathode openings (3) have a common point of intersection S lying on the axis of symmetry (6) of the anode opening (4).
摘要翻译： 本发明涉及一种用于具有阳极（1）和中空阴极（2）的EUV辐射的气体放电灯，其中中空阴极（2）具有至少两个开口（3,3'），阳极（1）具有 一个通孔（4），其特征在于，中空阴极开口（3）的纵向轴线（5,5'）具有位于阳极开口（6）的对称轴线（6）上的公共交点S 4）。
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公开(公告)号：US07397190B2
公开(公告)日：2008-07-08
申请号：US10536918
申请日：2003-11-28
申请人： Guenther Hans Derra , Joseph Robert Rene Pankert , Willi Neff , Klaus Bergmann , Jeroen Jonkers
发明人： Guenther Hans Derra , Joseph Robert Rene Pankert , Willi Neff , Klaus Bergmann , Jeroen Jonkers
IPC分类号： H01J61/09
摘要： The invention relates to a gas discharge lamp for EUV radiation with an anode (1) and a hollow cathode (2), wherein the hollow cathode (2) has at least two openings (3, 3′) and the anode (1) has a through hole (4), which is characterized in that the longitudinal axes (5, 5′) of the hollow cathode openings (3) have a common point of intersection S lying on the axis of symmetry (6) of the anode opening (4).
摘要翻译： 本发明涉及一种用于具有阳极（1）和中空阴极（2）的EUV辐射的气体放电灯，其中中空阴极（2）具有至少两个开口（3,3'），阳极（1）具有 一个通孔（4），其特征在于，中空阴极开口（3）的纵向轴线（5,5'）具有位于阳极开口（6）的对称轴线（6）上的公共交点S 4）。
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3.发明授权Method and device for the generation of far ultraviolet or soft x-ray radiation 有权用于产生远紫外或软X射线辐射的方法和装置公开(公告)号：US06967341B2
公开(公告)日：2005-11-22
申请号：US10473906
申请日：2002-03-21
申请人： Willi Neff , Klaus Bergmann , Oliver Rosier , Joseph Pankert
发明人： Willi Neff , Klaus Bergmann , Oliver Rosier , Joseph Pankert
CPC分类号： H05G2/003 , G03F7/70033
摘要： In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes that are connected to high voltage. Between the electrodes, in an area of two electrode recesses that are coaxial to one another, a gas fill with predetermined gas pressure in accordance with a discharge operation realized on the left branch of the Paschen curve is provided. In this area, a plasma emitting the radiation is generated when supplying energy. The plasma is displaced or deformed by a pressure change of the gas fill in the area of the electrode recesses.
摘要翻译： 在通过气体放电产生极紫外辐射或软X射线辐射的方法中，特别是对于EUV光刻技术，放电容器具有连接到高电压的两个电极。 在电极之间，在彼此同轴的两个电极凹部的区域中，提供根据在Paschen曲线的左分支上实现的放电操作的预定气体压力的气体填充。 在该区域，在供给能量时产生发射辐射的等离子体。 等离子体通过气体填充物在电极凹部的区域中的压力变化而移位或变形。
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公开(公告)号：US20050040347A1
公开(公告)日：2005-02-24
申请号：US10473906
申请日：2002-03-21
申请人： Willi Neff , Klaus Bergmann , Oliver Rosier , Joseph Pankert
发明人： Willi Neff , Klaus Bergmann , Oliver Rosier , Joseph Pankert
CPC分类号： H05G2/003 , G03F7/70033
摘要： In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes that are connected to high voltage. Between the electrodes, in an area of two electrode recesses that are coaxial to one another, a gas fill with predetermined gas pressure in accordance with a discharge operation realized on the left branch of the Paschen curve is provided. In this area, a plasma emitting the radiation is generated when supplying energy. The plasma is displaced or deformed by a pressure change of the gas fill in the area of the electrode recesses.
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5.发明授权Method and device for producing extreme ultraviolet radiation and soft x-ray radiation 失效用于产生极紫外辐射和软X射线辐射的方法和装置公开(公告)号：US07126143B2
公开(公告)日：2006-10-24
申请号：US10474121
申请日：2002-03-23
申请人： Jürgen Klein , Willi Neff , Stefan Seiwart , Klaus Bergmann , Joseph Pankert , Michael Löken
发明人： Jürgen Klein , Willi Neff , Stefan Seiwart , Klaus Bergmann , Joseph Pankert , Michael Löken
IPC分类号： G21K5/02
CPC分类号： H05G2/003 , G03F7/70033
摘要： A method for generating extreme ultraviolet radiation and soft x-ray radiation with a gas discharge operated on the left branch of the Paschen curve, in particular, for EUV lithography,wherein a discharge chamber (10) of a predetermined gas pressure and two electrodes (11, 12) are used, wherein the electrodes have an opening (14, 15), respectively, positioned on the same symmetry axis (13) and, in the course of a voltage increase (16) upon reaching a predetermined ignition voltage (Uz), generate a plasma (17) located in the area between their openings (14, 15), which plasma is a source of the radiation (17′) to be generated, wherein an ignition of the plasma (17) is realized by affecting the gas pressure and/or by triggering, and wherein, with the ignition of the plasma (17), an energy storage device supplies by means of the electrodes (11, 12) stored energy into the plasma (17), characterized in that the ignition of the plasma (17) is realized by using a predetermined ignition delay (18).
摘要翻译： 一种用于在帕邢斯曲线的左分支上操作的气体放电产生极紫外辐射和软X射线辐射的方法，特别是用于EUV光刻，其中具有预定气体压力的放电室（10）和两个电极 11，12），其中电极分别具有位于同一对称轴线（13）上的开口（14,15），并且在达到预定点火电压（U）时在电压增加（16）的过程中 产生位于其开口（14,15）之间的区域中的等离子体（17），该等离子体是要产生的辐射源（17'），其中点火 通过影响气体压力和/或通过触发实现等离子体（17），并且其中，通过等离子体（17）的点火，能量存储装置通过电极（11,12）将储存的能量供应到等离子体 （17），其特征在于，通过以下方式实现等离子体（17）的点火 使用预定的点火延迟（18）。
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6.发明授权Method and device for the generation of a plasma through electric discharge in a discharge space 有权用于通过放电空间中的放电产生等离子体的方法和装置公开(公告)号：US07518300B2
公开(公告)日：2009-04-14
申请号：US10548243
申请日：2004-03-05
IPC分类号： H01J17/26
摘要： The invention relates to a method and a device for the generation of a plasma through electric discharge in a discharge space which contains at least two electrodes, at least one of which is constructed from a matrix material or carrier material, such that an erosion-susceptible region with an evaporation spot is formed at least by the current flow. To present a method or a device for the generation of a plasma by electric discharge, it is suggested that a sacrificial substrate (38) is provided at least at the evaporation spot, the boiling point of said sacrificial suvstrate (38) during discharge operation lying below the melting point of the carrier material (30), such that charge carriers arising in the current flow are mainly generated from the sacrificial substrate (38).
摘要翻译： 本发明涉及一种用于在放电空间中通过放电产生等离子体的方法和装置，其包含至少两个电极，其中至少一个电极由基质材料或载体材料构成，使得易受侵蚀 至少由电流形成具有蒸发点的区域。 为了呈现通过放电产生等离子体的方法或装置，建议至少在蒸发点处提供牺牲衬底（38），在放电操作期间所述牺牲衬套（38）的沸点位于 低于载体材料（30）的熔点，使得在电流中产生的电荷载体主要从牺牲衬底（38）产生。
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7.发明申请Method and apparatus for producing extreme ultraviolet radiation or soft x-ray radiation 有权用于产生极紫外辐射或软X射线辐射的方法和装置公开(公告)号：US20070090304A1
公开(公告)日：2007-04-26
申请号：US10570535
申请日：2004-09-01
申请人： Jeroen Jonkers , Dominik Vaudrevange , Willi Neff
发明人： Jeroen Jonkers , Dominik Vaudrevange , Willi Neff
IPC分类号： G01J3/10
摘要： A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two electrodes (14, 16) in a discharge space (12), said plasma emitting said radiation that is to be produced. The gaseous medium is produced from a metal melt (24), which is applied to a surface in said discharge space (12) and at least partially evaporated by an energy beam, in particular by a laser beam (20).
摘要翻译： 一种通过电操作的放电产生极紫外辐射（EUV）或软X射线辐射的方法，特别是用于EUV光刻或计量的方法，其中等离子体（22）在气体介质中点燃至少两个 放电空间（12）中的电极（14,16），所述等离子体发射要产生的辐射。 气体介质由金属熔体（24）产生，金属熔体（24）施加到所述放电空间（12）中的表面，并且至少部分地被能量束，特别是激光束（20）蒸发。
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8.发明申请Method and device for the generation of a plasma through electric discharge in a discharge space 有权用于通过放电空间中的放电产生等离子体的方法和装置公开(公告)号：US20070001571A1
公开(公告)日：2007-01-04
申请号：US10548243
申请日：2004-03-05
申请人： Eric Bosch , Jeroen Jonkers , Willi Neff , Gunther Derra
发明人： Eric Bosch , Jeroen Jonkers , Willi Neff , Gunther Derra
摘要： The invention relates to a method and a device for the generation of a plasma through electric discharge in a discharge space which contains at least two electrodes, at least one of which is constructed from a matrix material or carrier material, such that an erosion-susceptible region with an evaporation spot is formed at least by the current flow. To present a method or a device for the generation of a plasma by electric discharge, it is suggested that a sacrificial substrate (38) is provided at least at the evaporation spot, the boiling point of said lying below the melting point of the carrier material (30), such that charge carriers arising in the current flow are mainly generated from the sacrificial substrate (38).
摘要翻译： 本发明涉及一种用于在放电空间中通过放电产生等离子体的方法和装置，其包含至少两个电极，其中至少一个电极由基质材料或载体材料构成，使得易受侵蚀 至少由电流形成具有蒸发点的区域。 为了呈现用于通过放电产生等离子体的方法或装置，建议至少在蒸发点处提供牺牲衬底（38），其中所述的沸点低于载体材料的熔点 （30），使得在电流中产生的电荷载体主要从牺牲衬底（38）产生。
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9.发明授权Method and apparatus for producing extreme ultraviolet radiation or soft X-ray radiation 有权用于产生极紫外辐射或软X射线辐射的方法和装置公开(公告)号：US07427766B2
公开(公告)日：2008-09-23
申请号：US10570535
申请日：2004-09-01
摘要： A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two electrodes (14, 16) in a discharge space (12), said plasma emitting said radiation that is to be produced. The gaseous medium is produced from a metal melt (24), which is applied to a surface in said discharge space (12) and at least partially evaporated by an energy beam, in particular by a laser beam (20).
摘要翻译： 一种通过电操作的放电产生极紫外辐射（EUV）或软X射线辐射的方法，特别是用于EUV光刻或计量的方法，其中等离子体（22）在气体介质中点燃至少两个 放电空间（12）中的电极（14,16），所述等离子体发射要产生的辐射。 气体介质由金属熔体（24）产生，金属熔体（24）施加到所述放电空间（12）中的表面，并且至少部分地被能量束，特别是激光束（20）蒸发。
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10.发明授权Method and device for producing extreme ultraviolet and soft X-rays from a gaseous discharge 有权用于从气体放电产生极紫外和软X射线的方法和装置公开(公告)号：US06389106B1
公开(公告)日：2002-05-14
申请号：US09555819
申请日：2000-07-28
申请人： Willi Neff , Rainer Lebert , Guido Schriever , Klaus Bergmann
发明人： Willi Neff , Rainer Lebert , Guido Schriever , Klaus Bergmann
IPC分类号： H01J3500
CPC分类号： H05G2/003 , G03F7/70033 , H05H1/48
摘要： A method and a device for generating extreme ultraviolet (EUV) and soft x-ray radiation from a gas discharge. The device has at least two electrodes each having a flush opening by which an axis of symmetry is defined, in which an intermediate space with a wide spatial homogenous gas filling between anode and cathode is provided. The electrodes are formed in such a way, that the gas discharge is formed exclusively in the volume defined by the flush openings. The current pulses with respect to amplitude and period duration are selected in such a way that a dense hot plasma channel is formed on the axis of symmetry, the plasma being the source of EUV and/or soft x-ray radiation. The preferred area of application is the EUV projection lithography in the spectral range around 13 nm.
摘要翻译： 一种用于从气体放电产生极紫外（EUV）和软X射线辐射的方法和装置。 该装置具有至少两个电极，每个电极具有齐平的开口，通过该开口限定对称轴，其中提供了在阳极和阴极之间填充宽空间均匀气体的中间空间。 电极以这样的方式形成，即气体排出仅在由冲洗开口限定的体积中形成。 选择相对于振幅和周期持续时间的电流脉冲，使得在对称轴上形成致密的热等离子体通道，等离子体是EUV和/或软X射线辐射源。 优选的应用领域是在约13nm的光谱范围内的EUV投影光刻。
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