摘要:
A method and a device for generating extreme ultraviolet (EUV) and soft x-ray radiation from a gas discharge. The device has at least two electrodes each having a flush opening by which an axis of symmetry is defined, in which an intermediate space with a wide spatial homogenous gas filling between anode and cathode is provided. The electrodes are formed in such a way, that the gas discharge is formed exclusively in the volume defined by the flush openings. The current pulses with respect to amplitude and period duration are selected in such a way that a dense hot plasma channel is formed on the axis of symmetry, the plasma being the source of EUV and/or soft x-ray radiation. The preferred area of application is the EUV projection lithography in the spectral range around 13 nm.
摘要:
The invention relates to a device for generating extreme ultraviolet and soft x-rays from a gas discharge, operated on the left-hand branch of the Paschen curve. There are two main electrodes, between which there is a gas-filled space, and each main electrode exhibits an opening, by means of which an axis of symmetry [(5)] is defined; and there are means to increase the conversion efficiency. Preferred fields of application are those requiring extreme ultraviolet (EUV) radiation or soft x-rays at a wavelength ranging from approximately 1 to 20 nm, and in particular around 13 nm, such as in EUV lithography.
摘要:
The invention is an improvement in a device for generating X-radiation with a plasma source. In the device, two concentric cylindrical electrodes (11, 12) are separated by an evacuated discharge space (13) filled with low-pressure gas. When the inner electrode is momentarily raised to an extremely high voltage, the gas is ionized and a plasma shock wave (17, 17') is created and compressed into a plasma focus (21) emitting X-radiation (20). The improvement introduces a first ("discharge") gas into the discharge space for initiation of the plasma, while introducing a second ("emitting") gas into the inner electrode for generating the X-radiation in the plasma focus. Special features of the improved device include a plurality of gas extraction ports, which can be used independently or together, and which can be combined with variations in the introduction and flow of the two gases to control the movement and intermixture of the gases and, thereby, the operation of the device. Also, the device introduces a third gas for improving the transmission of the X-radiation from the generating plasma focus to a work station for X-ray microscopy or for X-ray lithography.
摘要:
In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes that are connected to high voltage. Between the electrodes, in an area of two electrode recesses that are coaxial to one another, a gas fill with predetermined gas pressure in accordance with a discharge operation realized on the left branch of the Paschen curve is provided. In this area, a plasma emitting the radiation is generated when supplying energy. The plasma is displaced or deformed by a pressure change of the gas fill in the area of the electrode recesses.
摘要:
A gas discharge source, in particular, for generating extreme ultraviolet and/or soft X-radiation, has a gas-filled intermediate electrode space located between two electrodes, devices for the admission and evacuation of gas, and one electrode that has an opening that defines an axis of symmetry and is provided for the discharge of radiation. A diaphragm exhibits at least one opening on the axis of symmetry and operates as a differential pump stage, between the two electrodes.
摘要:
The invention relates to a gas discharge lamp for EUV radiation with an anode (1) and a hollow cathode (2), wherein the hollow cathode (2) has at least two openings (3, 3′) and the anode (1) has a through hole (4), which is characterized in that the longitudinal axes (5, 5′) of the hollow cathode openings (3) have a common point of intersection S lying on the axis of symmetry (6) of the anode opening (4).
摘要:
In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes that are connected to high voltage. Between the electrodes, in an area of two electrode recesses that are coaxial to one another, a gas fill with predetermined gas pressure in accordance with a discharge operation realized on the left branch of the Paschen curve is provided. In this area, a plasma emitting the radiation is generated when supplying energy. The plasma is displaced or deformed by a pressure change of the gas fill in the area of the electrode recesses.
摘要:
A method for generating extreme ultraviolet radiation and soft x-ray radiation with a gas discharge operated on the left branch of the Paschen curve, in particular, for EUV lithography,wherein a discharge chamber (10) of a predetermined gas pressure and two electrodes (11, 12) are used, wherein the electrodes have an opening (14, 15), respectively, positioned on the same symmetry axis (13) and, in the course of a voltage increase (16) upon reaching a predetermined ignition voltage (Uz), generate a plasma (17) located in the area between their openings (14, 15), which plasma is a source of the radiation (17′) to be generated, wherein an ignition of the plasma (17) is realized by affecting the gas pressure and/or by triggering, and wherein, with the ignition of the plasma (17), an energy storage device supplies by means of the electrodes (11, 12) stored energy into the plasma (17), characterized in that the ignition of the plasma (17) is realized by using a predetermined ignition delay (18).
摘要:
The invention relates to a gas discharge source, in particular for generating extreme ultraviolet and/or soft X-radiation, in which a gas-filled intermediate electrode space (3) is located between two electrodes (1, 2), in which devices for the admission and evacuation of gas are present, and in which one electrode (1) exhibits an opening (5) that defines an axis of symmetry (4) and is provided for the discharge of radiation. The proposed improvements constitute the presence of a diaphragm (6), which exhibits at least one opening (7) on the axis of symmetry (4) and operates as a differential pump stage, between the two electrodes (1, 2).
摘要:
The invention relates to a gas discharge lamp for EUV radiation with an anode (1) and a hollow cathode (2), wherein the hollow cathode (2) has at least two openings (3, 3′) and the anode (1) has a through hole (4), which is characterized in that the longitudinal axes (5, 5′) of the hollow cathode openings (3) have a common point of intersection S lying on the axis of symmetry (6) of the anode opening (4).