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公开(公告)号：US20080087887A1
公开(公告)日：2008-04-17
申请号：US11905178
申请日：2007-09-27
申请人： Gyou-Jin Cho , Jeong-Ju Kim , Eun-Jung Choi , Nam-Young Kim , Chan-Seok Park , Hoe-Taek Yang
发明人： Gyou-Jin Cho , Jeong-Ju Kim , Eun-Jung Choi , Nam-Young Kim , Chan-Seok Park , Hoe-Taek Yang
CPC分类号： H01L51/005 , B82Y10/00 , C07D257/02 , H01L51/0005 , H01L51/0068 , H01L51/0077 , H01L51/0591 , H01L51/0595
摘要： Disclosed are a compound which works as electronic materials such as a molecular memory, a molecular switch, a molecular rectifier, a molecular wire, and so on, and a molecular electronic device including the same. The compound for molecular electronic device has the structure of following Formula 1, (MnRM)n wherein, R is a single molecule having an electrical conductivity, M is independently a repeating unit constituting a polymer having an electrical conductivity, and n is independently an integer ranging from 100 to 500.
摘要翻译： 公开了作为电子材料如分子记忆，分子开关，分子整流器，分子线等的化合物和包括其的分子电子器件。 分子电子器件用化合物具有以下结构：式（1）其中，R是具有导电性的单分子，M独立地是构成聚合物的重复单元 具有导电性，n独立地为100-500的整数。
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公开(公告)号：US07850872B2
公开(公告)日：2010-12-14
申请号：US11905178
申请日：2007-09-27
申请人： Gyou-Jin Cho , Jeong-Ju Kim , Eun-Jung Choi , Nam-Young Kim , Chan-Seok Park , Hoe-Taek Yang
发明人： Gyou-Jin Cho , Jeong-Ju Kim , Eun-Jung Choi , Nam-Young Kim , Chan-Seok Park , Hoe-Taek Yang
IPC分类号： H01B1/12
CPC分类号： H01L51/005 , B82Y10/00 , C07D257/02 , H01L51/0005 , H01L51/0068 , H01L51/0077 , H01L51/0591 , H01L51/0595
摘要： Disclosed are a compound which works as electronic materials such as a molecular memory, a molecular switch, a molecular rectifier, a molecular wire, and so on, and a molecular electronic device including the same. The compound for molecular electronic device has the structure of following Formula 1, (MnRM)n wherein, R is a single molecule having an electrical conductivity, M is independently a repeating unit constituting a polymer having an electrical conductivity, and n is independently an integer ranging from 100 to 500.
摘要翻译： 公开了作为电子材料如分子记忆，分子开关，分子整流器，分子线等的化合物和包括其的分子电子器件。 分子电子器件用化合物具有以下结构：式（1）其中，R是具有导电性的单分子，M独立地是构成聚合物的重复单元 具有导电性，n独立地为100-500的整数。
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公开(公告)号：US20070060729A1
公开(公告)日：2007-03-15
申请号：US10555706
申请日：2004-05-06
申请人： Bong-Gi Kim , Seong-Mo Park , Chan-Seok Park
发明人： Bong-Gi Kim , Seong-Mo Park , Chan-Seok Park
IPC分类号： C08F30/02
CPC分类号： C08F220/18 , C08F220/06 , C08F220/14 , C08F230/02 , G03F7/033 , G03F7/038
摘要： The present invention relates to an alkali-soluble photosensitive resin composition and a dry film resist using the same, more particularly to a photosensitive resin composition having superior heat resistance, chemical resistance and long-time stability and good adhesivity to a Cu or ITO (indium tin oxide) substrate by containing an acrylate resin, which is effective in improving adhesivity, and a photosensitive dry film resist using the same.
摘要翻译： 本发明涉及一种碱溶性感光性树脂组合物和使用其的干膜抗蚀剂，更具体地说，涉及具有优异的耐热性，耐化学性和长时间稳定性以及对Cu或ITO（铟）的良好粘附性的感光性树脂组合物 氧化锡）基材，以及使用其的感光性干膜抗蚀剂。
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4.发明授权Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel 失效感光性组合物，包含该光敏组合物的隔壁用光敏糊剂组合物和等离子体显示面板用隔壁的制造方法公开(公告)号：US08098012B2
公开(公告)日：2012-01-17
申请号：US12461918
申请日：2009-08-27
申请人： Hyea-Weon Shin , Yon-Goo Park , Bong-Gi Kim , Chan-Seok Park , Sung-Mun Ryu
发明人： Hyea-Weon Shin , Yon-Goo Park , Bong-Gi Kim , Chan-Seok Park , Sung-Mun Ryu
CPC分类号： G03F7/0007 , G03F7/0047 , Y10T428/24802
摘要： A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic material and an organic material.
摘要翻译： 具有至少两个烯属双键的交联单体，光聚合引发剂和有机溶剂的光敏组合物，以及制备用于等离子体显示面板的隔壁的方法，其中使用该感光性组合物。 感光组合物提供对无机材料和有机材料的改善的附着力。
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5.发明授权Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same 有权控制溶解度的光敏树脂组合物和使用其的双层结构的图案形成方法公开(公告)号：US07611826B2
公开(公告)日：2009-11-03
申请号：US12351398
申请日：2009-01-09
申请人： Seok-Yoon Yang , Gil-Lae Kim , Chan-Seok Park , Choon-Ho Park , Soo-Guy Rho
发明人： Seok-Yoon Yang , Gil-Lae Kim , Chan-Seok Park , Choon-Ho Park , Soo-Guy Rho
CPC分类号： G03F7/032 , G03F7/0007 , G03F7/0751 , Y10S430/106
摘要： The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the -value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.
摘要翻译： 本发明涉及一种能够进行溶解度控制的新的感光性树脂组合物和使用该感光性树脂组合物的双层结构的图案形成方法，更具体地说，涉及可以控制
- 使用 新的光聚合引发剂和下层硬化剂，并且即使在低曝光能量下也可以根据曝光能量控制膜厚而无图案破裂。 该感光性树脂组合物可用于LCD（液晶显示）制造工艺的滤色器和外涂层材料。
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公开(公告)号：US20100178416A1
公开(公告)日：2010-07-15
申请号：US12729993
申请日：2010-03-23
申请人： Yoon-Ho KANG , Choon-Ho Park , Kyung-Ah Kim , Gil-Lae Kim , Chan-Seok Park , Seong-Gyu Kwon , Jang-Sub Kim , Byoung-Joo Kim
发明人： Yoon-Ho KANG , Choon-Ho Park , Kyung-Ah Kim , Gil-Lae Kim , Chan-Seok Park , Seong-Gyu Kwon , Jang-Sub Kim , Byoung-Joo Kim
IPC分类号： B05D5/06
CPC分类号： C09D11/36
摘要： An ink composition comprising dipropylene glycol monomethyl ether acetate (DPMA). For example, an ink composition for a color filter includes a binder material, a monomer material, a polymerization initiator, a pigment dispersion, and a solvent including dipropylene glycol monomethyl ether acetate (DPMA).
摘要翻译： 包含二丙二醇单甲醚乙酸酯（DPMA）的油墨组合物。 例如，用于滤色器的油墨组合物包括粘合剂材料，单体材料，聚合引发剂，颜料分散体和包含二丙二醇单甲醚乙酸酯（DPMA）的溶剂。
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7.发明授权Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel 失效感光性组合物，包含该光敏组合物的隔壁用光敏糊剂组合物和等离子体显示面板用隔壁的制造方法公开(公告)号：US07588877B2
公开(公告)日：2009-09-15
申请号：US11287432
申请日：2005-11-28
申请人： Hyea-Weon Shin , Yon-Goo Park , Bong-Gi Kim , Chan-Seok Park , Sung-Mun Ryu
发明人： Hyea-Weon Shin , Yon-Goo Park , Bong-Gi Kim , Chan-Seok Park , Sung-Mun Ryu
CPC分类号： G03F7/0007 , G03F7/0047 , Y10T428/24802
摘要： A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic material and an organic material.
摘要翻译： 具有至少两个烯属双键的交联单体，光聚合引发剂和有机溶剂的光敏组合物，以及制备用于等离子体显示面板的隔壁的方法，其中使用该感光性组合物。 感光组合物提供对无机材料和有机材料的改善的附着力。
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8.发明授权Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same 失效感光树脂组合物，其制备方法和含有该组合物的干膜抗蚀剂公开(公告)号：US07927781B2
公开(公告)日：2011-04-19
申请号：US12328037
申请日：2008-12-04
申请人： In-Ho Yoon , Bong-Gi Kim , Chang-Seok Rho , Sang-Ki Kang , Kyung-Rock Byun , Chan-Seok Park
发明人： In-Ho Yoon , Bong-Gi Kim , Chang-Seok Rho , Sang-Ki Kang , Kyung-Rock Byun , Chan-Seok Park
CPC分类号： G03F7/0007 , G03F7/029 , G03F7/033 , Y10S430/116 , Y10S430/117 , Y10S430/121 , Y10S430/124 , Y10S430/127
摘要： The present invention relates to a photosensitive resin composition including a) an alkali-soluble acrylate resin, b) a cross-linking monomer having at least two ethylenic double bonds, and c) a phosphinoxide based photopolymerization initiator and an acridon based photopolymerization initiator; a preparation method thereof; and a dry film resist comprising the same.
摘要翻译： 本发明涉及一种感光性树脂组合物，其包含a）碱溶性丙烯酸酯树脂，b）具有至少两个烯键式双键的交联单体，以及c）基于氧化膦的光聚合引发剂和吖啶系光聚合引发剂; 其制备方法 和含有它的干膜抗蚀剂。
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9.发明申请Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same 审中-公开感光树脂组合物，其制备方法和含有该组合物的干膜抗蚀剂公开(公告)号：US20060141392A1
公开(公告)日：2006-06-29
申请号：US11292411
申请日：2005-11-30
申请人： In-Ho Yoon , Bong-Gi Kim , Chang-Seok Rho , Sang-Ki Kang , Kyung-Rock Byun , Chan-Seok Park
发明人： In-Ho Yoon , Bong-Gi Kim , Chang-Seok Rho , Sang-Ki Kang , Kyung-Rock Byun , Chan-Seok Park
IPC分类号： G03C1/76
CPC分类号： G03F7/0007 , G03F7/029 , G03F7/033
摘要： The present invention relates to a photosensitive resin composition, a preparation method thereof, and a dry film resist comprising the same. More particularly, the photosensitive resin composition of the present invention is directed to a photosensitive resin composition including a) an alkali-soluble acrylate resin, b) a cross-linking monomer having at least two ethylenic double bonds, and c) a phosphine oxide based photopolymerization initiator and an acridon based photopolymerization initiator. According to the photosensitive resin composition and the dry film resist, it is easy to finely pattern using a laser direct image with high density and the dry film has excellent sensitivity, resolution, and adhesiveness to the substrate.
摘要翻译： 本发明涉及感光性树脂组合物及其制备方法以及含有该感光性树脂组合物的干膜抗蚀剂。 更具体地，本发明的感光性树脂组合物涉及感光性树脂组合物，其包含a）碱溶性丙烯酸酯树脂，b）具有至少2个烯键式双键的交联单体，和c）基于氧化膦的 光聚合引发剂和吖啶类光聚合引发剂。 根据感光性树脂组合物和干膜抗蚀剂，可以容易地使用高密度的激光直接图像进行精细图案化，并且干膜对基材具有优异的灵敏度，分辨率和粘附性。
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公开(公告)号：US20060063858A1
公开(公告)日：2006-03-23
申请号：US11229271
申请日：2005-09-15
申请人： Yoon-Ho Kang , Choon-Ho Park , Kyung-Ah Kim , Gil-Lae Kim , Chan-Seok Park , Seong-Gyu Kwon , Jang-Sub Kim , Byoung-Joo Kim
发明人： Yoon-Ho Kang , Choon-Ho Park , Kyung-Ah Kim , Gil-Lae Kim , Chan-Seok Park , Seong-Gyu Kwon , Jang-Sub Kim , Byoung-Joo Kim
CPC分类号： C09D11/36
摘要： An ink composition comprising dipropylene glycol monomethyl ether acetate (DPMA). For example, an ink composition for a color filter includes a binder material, a monomer material, a polymerization initiator, a pigment dispersion, and a solvent including dipropylene glycol monomethyl ether acetate (DPMA).
摘要翻译： 包含二丙二醇单甲醚乙酸酯（DPMA）的油墨组合物。 例如，用于滤色器的油墨组合物包括粘合剂材料，单体材料，聚合引发剂，颜料分散体和包含二丙二醇单甲醚乙酸酯（DPMA）的溶剂。
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