公开(公告)号：US20160137881A1

公开(公告)日：2016-05-19

申请号：US14897771

申请日：2014-04-28

申请人： HITACHI CHEMICAL COMPANY, LTD.

发明人： Munehiro OOTA ,  Toshio TAKIZAWA ,  Hisataka MINAMI ,  Toshiaki AKUTSU ,  Tomohiro IWANO

IPC分类号： C09G1/02 ,  B24B37/04

CPC分类号： C09G1/02 ,  B24B37/044 ,  C09K3/1409 ,  C09K3/1463 ,  H01L21/31053 ,  H01L21/76229

摘要： A polishing liquid for CMP, comprising: an abrasive grain including a cerium-based compound; a 4-pyrone-based compound; a polymer compound having an aromatic ring and a polyoxyalkylene chain; a cationic polymer; and water.

摘要翻译： 一种用于CMP的抛光液，包括：包含铈基化合物的磨料颗粒; 4-吡喃酮基化合物; 具有芳香环和聚氧化烯链的高分子化合物; 阳离子聚合物; 和水。

公开(公告)号：US20200299544A1

公开(公告)日：2020-09-24

申请号：US16638493

申请日：2017-08-14

申请人： HITACHI CHEMICAL COMPANY, LTD.

发明人： Masayuki HANANO ,  Toshio TAKIZAWA

IPC分类号： C09G1/02 ,  H01L21/3105

摘要： Provided is a CMP polishing liquid used for removing a part of an insulating portion of a base substrate, which includes a substrate, a stopper provided on one surface of the substrate, and the insulating portion provided on a surface of the stopper opposite to the substrate, by CMP to expose the stopper, the polishing liquid containing: abrasive grains containing cerium; a nonionic water-soluble compound A; a polymer compound B having at least one selected from the group consisting of carboxylic acid groups and carboxylate groups; a basic pH adjusting agent which is optionally contained; and water, in which a content of the basic pH adjusting agent is less than 1.3×10−2 mol/kg based on the total mass of the polishing liquid.

公开(公告)号：US20200283659A1

公开(公告)日：2020-09-10

申请号：US16652451

申请日：2018-10-01

申请人： HITACHI CHEMICAL COMPANY, LTD.

发明人： Hisato TAKAHASHI ,  Masayuki HANANO ,  Toshio TAKIZAWA

IPC分类号： C09G1/02 ,  C08K3/22 ,  C08K3/36 ,  C08K5/3412 ,  C08K5/3462 ,  C08L33/02 ,  C08L33/04 ,  C08L71/02

摘要： A polishing liquid containing: abrasive grains containing at least one selected from the group consisting of cerium oxide and silicon oxide; a nitrogen-containing compound; and water, in which the nitrogen-containing compound contains at least one selected from the group consisting of (I) a compound having an aromatic ring containing one nitrogen atom in the ring and a hydroxyl group, (II) a compound having an aromatic ring containing one nitrogen atom in the ring and a functional group containing a nitrogen atom, (III) a compound having a 6-membered ring containing two nitrogen atoms in the ring, (IV) a compound having a benzene ring and a ring containing a nitrogen atom in the ring, and (V) a compound having a benzene ring to which two or more functional groups containing a nitrogen atom are bonded.