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    Charged Particle Beam Device
    1.
    发明申请
    Charged Particle Beam Device 有权
    带电粒子束装置

    公开(公告)号：US20160240348A1

    公开(公告)日：2016-08-18

    申请号：US15023936

    申请日：2014-06-11

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Toshiyuki YOKOSUKA ,  Chahn LEE ,  Hideyuki KAZUMI ,  Hajime KAWANO ,  Shahedul HOQUE ,  Kumiko SHIMIZU ,  Hiroyuki TAKAHASHI

    IPC: H01J37/28

    CPC classification number: H01J37/28 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J2237/2803 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/2826 ,  H01J2237/3045

    Abstract: The scanning charged particle beam microscope according to the present invention is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

    Abstract translation: 根据本发明的扫描带电粒子束显微镜的特征在于，在获取FOV（视场）的图像时，设置间隔射束照射点，然后控制偏转器，使得带电粒子束扫描 当带电粒子束照射到每个照射点之间的样品上的位置时，比相对于每个照射点的样品照射样品上的位置（对应于每个像素检测的样品上的位置）更快地执行 一个信号）。 这允许减轻或控制在FOV内发生的微域带电的影响。

    Charged Particle Beam Device
    4.
    发明申请
    Charged Particle Beam Device 审中-公开

    公开(公告)号：US20180269026A1

    公开(公告)日：2018-09-20

    申请号：US15761294

    申请日：2015-09-29

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Shahedul HOQUE ,  Hajime KAWANO ,  Yoshinori MOMONOI ,  Hideki ITAI ,  Minoru YAMAZAKI ,  Hiroshi NISHIHAMA

    IPC: H01J37/147 ,  H01J37/28 ,  H01J37/26 ,  G02B21/00

    Abstract: The objective of the present invention is to provide a charged particle beam device wherein scanning is performed through a scanning pattern that may suppress the influence from charge accumulation without having to perform blanking. In order to achieve this objective, a charged particle beam device is proposed wherein a first scan line is scanned by deflecting a charged particle beam in a first direction. The charged particle beam is deflected in a manner where the ending point of the first scan line is connected to the scan starting point of a second scan line which is arranged to be parallel to the first scan line so as to draw a scanning trajectory, thereby modifying the scan line position. The second scan line is scanned by scanning the charged particle beam from the scan starting point of the second scan line toward a second direction that is opposite to the first direction. After scanning the second scan line, the charged particle beam device scans the interior of a first frame by repeating the scan line position modification and the scanning of the charged particle beam toward the opposite direction. After scanning the first frame, the charged particle beam device starts the scanning of a second frame with the scan ending point contained within the first frame serving as the scan starting point.

    Charged Particle Beam Device
    5.
    发明申请
    Charged Particle Beam Device 审中-公开

    公开(公告)号：US20170323763A1

    公开(公告)日：2017-11-09

    申请号：US15329468

    申请日：2015-07-27

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Hideki ITAI ,  Kumiko SHIMIZU ,  Wataru MORI ,  Hajime KAWANO ,  Shahedul HOQUE

    IPC: H01J37/28 ,  H01J37/147

    CPC classification number: H01J37/28 ,  H01J37/147 ,  H01J37/1474 ,  H01J37/22 ,  H01J2237/221 ,  H01J2237/2806 ,  H01J2237/2817

    Abstract: The purpose of the present invention is to provide a charged particle beam device with which it is possible to minimize the beam irradiation amount while maintaining a high measurement success rate. The present invention is a charged particle beam device provided with a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m≧1), the number m of frames being smaller than the number n of frames.

    CHARGED-PARTICLE BEAM SYSTEM
    6.
    发明申请
    CHARGED-PARTICLE BEAM SYSTEM 审中-公开

    公开(公告)号：US20200020504A1

    公开(公告)日：2020-01-16

    申请号：US16494454

    申请日：2017-03-27

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Akio YAMAMOTO ,  Kazuki IKEDA ,  Wen LI ,  Hiroyuki TAKAHASHI ,  Shahedul HOQUE ,  Shunsuke MIZUTANI

    IPC: H01J37/22 ,  H01J37/244

    Abstract: A charged-particle beam system comprises: a charged-particle beam device containing a detection unit for detecting electrons generated by irradiating a sample with a charged-particle beam released from a charged particle source; and a signal detection unit in which a detection signal from the detection unit is input through a wiring. The signal detection unit comprises: a separation unit for separating into a rising signal and a falling signal the detection signal from the detection unit; a falling signal processing unit for at least eliminating ringing in the falling signal; and a combination unit generating and delivering a combined signal produced by combining the rising signal, which has been separated by the separation unit, with the falling signal wherefrom the ringing has been eliminated by the falling signal processing unit.

    Charged Particle Beam Apparatus
    7.
    发明申请
    Charged Particle Beam Apparatus 审中-公开

    公开(公告)号：US20190355552A1

    公开(公告)日：2019-11-21

    申请号：US16482765

    申请日：2017-03-24

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Shunsuke MIZUTANI ,  Shahedul HOQUE ,  Uki IKEDA ,  Makoto SUZUKI

    IPC: H01J37/28 ,  H01J37/147 ,  H01J37/244

    Abstract: The present invention provides a charged particle beam apparatus that covers a wide range of detection angles of charged particles emitted from a sample. Accordingly, the present invention proposes a charged particle beam apparatus that is provided with an objective lens for converging charged particle beams emitted from a charged particle source, and a detector for detecting charged particles emitted from a sample, wherein: the objective lens includes an inner magnetic path and an outer magnetic path which are formed so as to enclose a coil; the inner magnetic path comprises a first inner magnetic path disposed at a position opposite to an optical axis of the charged particle beams and a second inner magnetic path which is formed at a slant with respect to the optical axis of the charged particle beams and which includes a leading end of the magnetic path; and a detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end of the magnetic path and that is parallel to the optical axis of the charged particle beams.

    Charged Particle Beam Apparatus
    10.
    发明申请
    Charged Particle Beam Apparatus 审中-公开

    公开(公告)号：US20180286627A1

    公开(公告)日：2018-10-04

    申请号：US15940868

    申请日：2018-03-29

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Shinya UENO ,  Hiroshi NISHIHAMA ,  Shuangqi DONG ,  Shahedul HOQUE ,  Susumu KOYAMA

    IPC: H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/28 ,  H01J37/26

    Abstract: An object of the invention is to provide a charged particle beam apparatus capable of achieving both acquisition of an image having high resolution of an inspection target pattern and suppression of a beam irradiation amount when a specific pattern is an inspection target from a highly integrated pattern group. In order to achieve the object, a charged particle beam apparatus is proposed in which at least one of a stage and a deflector is controlled so as to move a field of view from a reference position to an inspection or measurement target pattern, the number of objects included in a first image obtained by scanning a position of the field of view in a moving process of the field of view with a charged particle beam of a first irradiation condition is counted, and in a case where the number of the objects satisfies a predetermined condition, a second image is generated based on scanning with a charged particle beam of a second irradiation condition of a higher dose than that of the first irradiation condition.

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