公开(公告)号：US20170183770A1

公开(公告)日：2017-06-29

申请号：US15459772

申请日：2017-03-15

Applicant: HITACHI KOKUSAI ELECTRIC INC.

Inventor： Yasuaki KOMAE ,  Takashi NOGAMI ,  Hidenari YOSHIDA ,  Tomoshi TANIYAMA ,  Shigeru ODAKE

IPC: C23C16/44 ,  C23C16/52 ,  C23C16/455

CPC classification number: C23C16/4412 ,  C23C16/455 ,  C23C16/45523 ,  C23C16/45557 ,  C23C16/52 ,  H01L21/02164 ,  H01L21/02271

Abstract: There is provided a substrate processing apparatus including a first exhaust system which is connected to a first pump and a second pump of a type different from the first pump and is configured to exhaust the interior of a process chamber, a second exhaust system which is connected to the second pump and is configured to exhaust the interior of the process chamber and a control part configured to control the first exhaust system and the second exhaust system such that, when the processing gas is exhausted from the interior of the process chamber, the interior of the process chamber is first exhausted by the second exhaust system, and then an exhaust path is switched from the second exhaust system to the first exhaust system after an internal pressure of the process chamber reaches a predetermined pressure, to exhaust the process chamber by the first exhaust system.

公开(公告)号：US20170352556A1

公开(公告)日：2017-12-07

申请号：US15682730

申请日：2017-08-22

Applicant: HITACHI KOKUSAI ELECTRIC INC.

Inventor： Yasuaki KOMAE ,  Takashi NOGAMI ,  Tomoshi TANIYAMA ,  Shigeru ODAKE

IPC: H01L21/677

CPC classification number: H01L21/677 ,  B25J9/104 ,  B25J18/02 ,  B65G49/07 ,  H01L21/67712 ,  H01L21/6773 ,  H01L21/67781 ,  H01L21/68707

Abstract: A substrate processing apparatus includes a process chamber and a transfer device configured to transfer a plurality of substrates to a substrate retainer. The transfer device includes a base; a first moving unit capable of linear motion; a first drive unit to drive the first moving unit. The first drive unit includes a first pulley group; a first motor coupled to a first pulley; and a first connecting member coupling the first belt and the first moving unit. A second moving unit is capable of linear motion. A second drive unit is in an enclosure of the first moving unit and drives the second moving unit. The second drive unit includes a second pulley group; a second belt wound on the second pulley group, a second motor coupled to drive a second pulley; and a second connecting member coupling the second belt and the second moving unit.

公开(公告)号：US20170292188A1

公开(公告)日：2017-10-12

申请号：US15632678

申请日：2017-06-26

Applicant: HITACHI KOKUSAI ELECTRIC INC.

Inventor： Takayuki NAKADA ,  Takashi NOGAMI ,  Tomoshi TANIYAMA ,  Daigi KAMIMURA

IPC: C23C16/455 ,  H01L21/205 ,  H01L21/677 ,  C23C16/44

CPC classification number: C23C16/45502 ,  C23C16/4401 ,  C23C16/4412 ,  C23C16/54 ,  H01L21/205 ,  H01L21/67109 ,  H01L21/67739

Abstract: A substrate processing apparatus includes: a substrate retainer configured to support a substrate; a heat-insulating unit; a transfer chamber; and a gas supply mechanism configured to supply a gas into the transfer chamber, the gas supply mechanism including: a first gas supply mechanism configured to supply the gas into an upper region of the transfer chamber, where the substrate retainer is disposed such that the gas flows horizontally through the upper region; and a second gas supply mechanism configured to supply the gas into a lower region of the transfer chamber, where the heat-insulating unit is provided such that the gas flows downward through the lower region, wherein the first gas supply mechanism and the second gas supply mechanism are disposed along a first sidewall of the transfer chamber, and the second gas supply mechanism is disposed lower than the first gas supply mechanism.

公开(公告)号：US20170198397A1

公开(公告)日：2017-07-13

申请号：US15472450

申请日：2017-03-29

Applicant: HITACHI KOKUSAI ELECTRIC INC.

Inventor： Yasuaki KOMAE ,  Takashi NOGAMI ,  Kenji SHIRAKO

IPC: C23C16/52 ,  H01L21/677 ,  H01L21/673 ,  H01L21/67 ,  H01L21/687

CPC classification number: C23C16/52 ,  C23C16/4409 ,  C23C16/4584 ,  H01L21/67126 ,  H01L21/67178 ,  H01L21/67303 ,  H01L21/67757 ,  H01L21/68707

Abstract: A technique for improving stability and safety at the time of boat transfer is provided. A reaction tube configured to process a substrate, a seal cap, provided on an upper surface thereof with a substrate retainer for retaining the substrate, configured to close a furnace opening of the reaction tube, one of a first elevator and a second elevator configured to elevate the seal cap; and another of a first elevator and a second elevator configured to assist the one of the first elevator and the second elevator in elevating the seal cap.

公开(公告)号：US20160379858A1

公开(公告)日：2016-12-29

申请号：US15263478

申请日：2016-09-13

Applicant: HITACHI KOKUSAI ELECTRIC INC.

Inventor： Takashi NOGAMI ,  Tomoshi TANIYAMA ,  Kazuma YOSHIOKA

IPC: H01L21/67 ,  H01L21/677

CPC classification number: H01L21/67265 ,  H01L21/67766 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775

Abstract: A space needed to transfer a substrate container is decreased. A substrate processing apparatus includes a locating part where a substrate container accommodating a substrate is located; a driving unit configured to drive the locating part vertically; a transfer robot configured to transfer the substrate container; and a controller configured to control the driving unit and the transfer robot to move the locating part downward after the transfer robot moves to under the locating part to transfer the substrate container from the locating part to the transfer robot.

Abstract translation: 转移衬底容器所需的空间减小。 基板处理装置包括：容纳基板的基板容器所在的定位部; 构造成垂直地驱动定位部的驱动单元; 传送机器人，其构造成传送所述基板容器; 以及控制器，被配置为控制所述驱动单元和所述传送机器人在所述传送机器人移动到所述定位部下方之前向下移动所述定位部，以将所述基板容器从所述定位部传送到所述传送机器人。