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    Method of forming open-network polishing pads
    1.
    发明授权
    Method of forming open-network polishing pads 有权
    形成开网抛光垫的方法

    公开(公告)号：US08801949B2

    公开(公告)日：2014-08-12

    申请号：US13239951

    申请日：2011-09-22

    申请人： Hamed Lakrout ,  Ben W Schaefer ,  Michael D. Williams

    发明人： Hamed Lakrout ,  Ben W Schaefer ,  Michael D. Williams

    IPC分类号： C23F1/02 ,  B24B37/22 ,  B24D11/00 ,  B24B37/26

    CPC分类号： B24B37/22 ,  B24B37/26 ,  B24D11/003

    摘要： The method forms forming an open-network polishing pad useful for polishing magnetic, semiconductor and optical substrates. The method provides a polymer sheet or film of a curable polymer and exposes the polymer sheet or film to an energy source to create an exposure pattern in the polymer sheet or film. The exposure pattern having elongated sections exposed to the energy source. After attaching the polymer sheet or film to an open-network substrate, the method removes polymer adjacent from the exposed polymer sheet or film of the intermediate structure with a solvent. This forms elongated channels through the polymer sheet or film in a texture pattern that corresponds to the exposure pattern with the open-network supporting the polymer. The elongated channels extending through the thickness of the polymer sheet or film to form the open-network polishing pad.

    摘要翻译： 该方法形成用于抛光磁性，半导体和光学衬底的开放网络抛光垫。 该方法提供可固化聚合物的聚合物片材或膜，并将聚合物片材或膜暴露于能量源以在聚合物片材或膜中产生曝光图案。 曝光图案具有暴露于能量源的细长部分。 在将聚合物片或膜连接到开放网络基板上之后，该方法用溶剂除去与暴露的聚合物片或中间结构的膜相邻的聚合物。 这形成通过聚合物片材或膜的细长通道，其以对应于曝光图案的纹理图案与支撑聚合物的开放网络形成。 细长通道延伸穿过聚合物片或薄膜的厚度以形成开放式网状抛光垫。

    Method Of Forming Open-Network Polishing Pads
    2.
    发明申请
    Method Of Forming Open-Network Polishing Pads 有权
    形成开放网络抛光垫的方法

    公开(公告)号：US20130075362A1

    公开(公告)日：2013-03-28

    申请号：US13239951

    申请日：2011-09-22

    申请人： Hamed Lakrout ,  Ben W. Schaefer ,  Michael D. Williams

    发明人： Hamed Lakrout ,  Ben W. Schaefer ,  Michael D. Williams

    IPC分类号： C23F1/02

    CPC分类号： B24B37/22 ,  B24B37/26 ,  B24D11/003

    摘要： The method forms forming an open-network polishing pad useful for polishing magnetic, semiconductor and optical substrates. The method provides a polymer sheet or film of a curable polymer and exposes the polymer sheet or film to an energy source to create an exposure pattern in the polymer sheet or film. The exposure pattern having elongated sections exposed to the energy source. After attaching the polymer sheet or film to an open-network substrate, the method removes polymer adjacent from the exposed polymer sheet or film of the intermediate structure with a solvent. This forms elongated channels through the polymer sheet or film in a texture pattern that corresponds to the exposure pattern with the open-network supporting the polymer. The elongated channels extending through the thickness of the polymer sheet or film to form the open-network polishing pad.

    摘要翻译： 该方法形成用于抛光磁性，半导体和光学衬底的开放网络抛光垫。 该方法提供可固化聚合物的聚合物片材或膜，并将聚合物片材或膜暴露于能量源，以在聚合物片材或膜中产生曝光图案。 曝光图案具有暴露于能量源的细长部分。 在将聚合物片或膜连接到开放网络基板上之后，该方法用溶剂除去与暴露的聚合物片或中间结构的膜相邻的聚合物。 这形成通过聚合物片材或膜的细长通道，其以对应于曝光图案的纹理图案与支撑聚合物的开放网络形成。 细长通道延伸穿过聚合物片或薄膜的厚度以形成开放式网状抛光垫。

    Method of forming layered-open-network polishing pads
    4.
    发明授权
    Method of forming layered-open-network polishing pads 有权
    形成分层开放网络抛光垫的方法

    公开(公告)号：US08894799B2

    公开(公告)日：2014-11-25

    申请号：US13240007

    申请日：2011-09-22

    申请人： Hamed Lakrout

    发明人： Hamed Lakrout

    IPC分类号： B32B3/10 ,  B24B37/22 ,  B24B37/26 ,  B24D11/00

    CPC分类号： B24B37/22 ,  B24B37/26 ,  B24D11/003

    摘要： The method forms a layered-open-network polishing pad useful for polishing at least one of magnetic, semiconductor and optical substrates. Exposing a first and second polymer sheet or film of a curable polymer to an energy source creates an exposure pattern in the first and second polymer sheet, the exposure pattern having elongated sections exposed to the energy source. Then removing polymer from the exposed first and second polymer sheets to forms elongated channels through the first and second polymer sheets in a channel pattern that corresponds to the exposure pattern. Attaching the first and second polymer sheets forms a polishing pad, the patterns of the first and second polymer sheets cross wherein the first polymer sheet supports the second polymer sheet and the elongated channels from the first and second polymer sheets connect and to form the layered-open-network polishing pad.

    摘要翻译： 该方法形成用于抛光磁性，半导体和光学衬底中的至少一种的分层开放网络抛光垫。 将可固化聚合物的第一和第二聚合物片或薄膜暴露于能量源，在第一和第二聚合物片中产生曝光图案，曝光图案具有暴露于能量源的细长部分。 然后从曝光的第一和第二聚合物片材中除去聚合物以通过对应于曝光图案的通道图案通过第一和第二聚合物片材形成细长通道。 连接第一和第二聚合物片材形成抛光垫，第一和第二聚合物片材的图案交叉，其中第一聚合物片材支撑第二聚合物片材，并且来自第一和第二聚合物片材的细长通道连接并形成层状 - 开网抛光垫。

    REACTIVELY-COUPLED ARTICLES AND RELATED METHODS
    5.
    发明申请
    REACTIVELY-COUPLED ARTICLES AND RELATED METHODS 审中-公开
    反应耦合文章及相关方法

    公开(公告)号：US20100136273A1

    公开(公告)日：2010-06-03

    申请号：US12444871

    申请日：2007-10-09

    申请人： Miguel A. Prieto ,  Peter Sandkuehler ,  Antonio Batistini ,  Sandra Hofmann ,  Stephen F. Hahn ,  Mohamed Esseghir ,  Monika Plass ,  Mark F. Sonnenschein ,  H. Craig Silvis ,  Hamed Lakrout ,  Kevin J. Bouck ,  Muthu Subramanian ,  Jinder Jow ,  Thiam Aik Lim ,  Stephen Y. Cheng ,  Lester Yeong

    发明人： Miguel A. Prieto ,  Peter Sandkuehler ,  Antonio Batistini ,  Sandra Hofmann ,  Stephen F. Hahn ,  Mohamed Esseghir ,  Monika Plass ,  Mark F. Sonnenschein ,  H. Craig Silvis ,  Hamed Lakrout ,  Kevin J. Bouck ,  Muthu Subramanian ,  Jinder Jow ,  Thiam Aik Lim ,  Stephen Y. Cheng ,  Lester Yeong

    IPC分类号： B32B27/36 ,  B32B1/08

    CPC分类号： C08J5/12 ,  B32B7/12 ,  B32B27/02 ,  B32B27/08 ,  B32B27/32 ,  B32B27/36 ,  Y10T428/1393 ,  Y10T428/31797

    摘要： The present invention is an article of construction formed from an article adhesively-bonded to a layering material through (a) reactive coupling of a functionalized nitroxide or (b) the adhesion of components in a polymer matrix made from or containing a polymer, an organic peroxide, and a functionalized nitroxide. The initial article may be expanded. It may also be polar or nonpolar. Similarly, the layering material may be polar or nonpolar. Other embodiments of the present invention are described, including other articles and methods for preparing the articles. The useful articles of the present invention include shoe outsoles and midsoles, paints, overmolded articles, weather stripping, gaskets, profiles, belts, hoses, tubes, durable goods, tires, construction panels, leisure and sports equipment foams, energy management foams, acoustic management foams, insulation foams, other foams, automotive parts (including bumper fascias, vertical panels, soft thermoplastic polyolefin skins, and interior trim), toys, supported films (including single-ply and co-extruded films), glass laminations, leather articles (synthetic and natural), personal health care and hygiene articles, other metal laminates, wood composites, automotive belts, hoses, tubes, conveyor belts, footwear, sporting goods, and filled articles.

    摘要翻译： 本发明是通过（a）官能化氮氧化物的反应性偶联或（b）由聚合物或有机聚合物制成的聚合物基质中的组分的粘合而形成的粘合剂与层压材料形成的制品， 过氧化物和官能化的氮氧化物。 最初的文章可能会扩大。 它也可以是极性或非极性。 类似地，分层材料可以是极性或非极性的。 描述了本发明的其它实施例，包括用于制备制品的其它制品和方法。 本发明的有用制品包括鞋底和中底，油漆，包覆制品，气候剥离，垫片，型材，皮带，软管，管，耐用品，轮胎，建筑面板，休闲和运动设备泡沫，能量管理泡沫，声学 管理泡沫，绝缘泡沫，其他泡沫，汽车零件（包括保险杠，垂直面板，软质热塑性聚烯烃外皮和内饰），玩具，支撑膜（包括单层和共挤出膜），玻璃叠片，皮革制品 （合成和天然），个人保健和卫生用品，其他金属层压板，木材复合材料，汽车皮带，软管，管，输送带，鞋类，运动用品和填充物品。

    Method Of Forming Structured-Open-Network Polishing Pads
    7.
    发明申请
    Method Of Forming Structured-Open-Network Polishing Pads 有权
    形成结构化开放网络抛光垫的方法

    公开(公告)号：US20130074419A1

    公开(公告)日：2013-03-28

    申请号：US13240072

    申请日：2011-09-22

    申请人： Hamed Lakrout

    发明人： Hamed Lakrout

    IPC分类号： B24D11/00

    CPC分类号： B24B37/22 ,  B24B37/26 ,  B24D18/00

    摘要： The invention is a method of forming a layered-open-network polishing pad useful for polishing at least one of magnetic, semiconductor and optical substrates. Exposing a first and second polymer sheet or film of a photocurable polymer creates an exposure pattern in the first and second polymer sheet. The exposure pattern has elongated sections exposed to the energy source. The light exposure is of an exposure time sufficient to cure the photocurable polymer, but insufficient to cure adjacent elongated sections together. Attaching the first and second polymer sheets forms a polishing pad with the patterns of the first and second polymer sheets crossing. Curing the layered-open-network polishing pad to secure the layered-open-network polishing pad with the first and second sheets having sufficient stiffness to reduce sagging and maintain an orthogonal relationship between the elongated channels and the parallel planes of the polymer sheets.

    摘要翻译： 本发明是形成用于研磨磁性，半导体和光学衬底中的至少一种的分层开放网络抛光垫的方法。 露出光固化聚合物的第一和第二聚合物片或膜产生在第一和第二聚合物片中的曝光图案。 曝光图案具有暴露于能量源的细长部分。 曝光时间足以固化光固化聚合物，但不足以固化相邻的细长部分。 安装第一和第二聚合物片材形成抛光垫，其中第一和第二聚合物片材的图案交叉。 固化分层开放网络抛光垫以固定分层开放式网状抛光垫，其中第一和第二片具有足够的刚度以减少松弛并保持细长通道与聚合物片的平行平面之间的正交关系。

    Method of forming structured-open-network polishing pads
    10.
    发明授权
    Method of forming structured-open-network polishing pads 有权
    形成结构化开放网络抛光垫的方法

    公开(公告)号：US09108291B2

    公开(公告)日：2015-08-18

    申请号：US13240072

    申请日：2011-09-22

    申请人： Hamed Lakrout

    发明人： Hamed Lakrout

    IPC分类号： B24D11/00 ,  B24B37/22 ,  B24B37/26 ,  B24D18/00

    CPC分类号： B24B37/22 ,  B24B37/26 ,  B24D18/00

    摘要： The invention is a method of forming a layered-open-network polishing pad useful for polishing at least one of magnetic, semiconductor and optical substrates. Exposing a first and second polymer sheet or film of a photocurable polymer creates an exposure pattern in the first and second polymer sheet. The exposure pattern has elongated sections exposed to the energy source. The light exposure is of an exposure time sufficient to cure the photocurable polymer, but insufficient to cure adjacent elongated sections together. Attaching the first and second polymer sheets forms a polishing pad with the patterns of the first and second polymer sheets crossing. Curing the layered-open-network polishing pad to secure the layered-open-network polishing pad with the first and second sheets having sufficient stiffness to reduce sagging and maintain an orthogonal relationship between the elongated channels and the parallel planes of the polymer sheets.

    摘要翻译： 本发明是形成用于研磨磁性，半导体和光学衬底中的至少一种的分层开放网络抛光垫的方法。 露出光固化聚合物的第一和第二聚合物片或膜产生在第一和第二聚合物片中的曝光图案。 曝光图案具有暴露于能量源的细长部分。 曝光时间足以固化光固化聚合物，但不足以固化相邻的细长部分。 安装第一和第二聚合物片材形成抛光垫，其中第一和第二聚合物片材的图案交叉。 固化分层开放网络抛光垫以固定分层开放式网状抛光垫，其中第一和第二片具有足够的刚度以减少松弛并保持细长通道与聚合物片的平行平面之间的正交关系。