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公开(公告)号：US20090195763A1
公开(公告)日：2009-08-06
申请号：US12331870
申请日：2008-12-10
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Peter Paul Hempenius , Youssef Karel Maria De Vos , Joost De Pee , Clementius Andreas Johannes Beijers , Nicolaas Bernardus Roozen , Erwin Antonius Henricus Fransiscus Van Den Boogaert , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Peter Paul Hempenius , Youssef Karel Maria De Vos , Joost De Pee , Clementius Andreas Johannes Beijers , Nicolaas Bernardus Roozen , Erwin Antonius Henricus Fransiscus Van Den Boogaert , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
CPC分类号： G10K11/178 , G03B27/42 , G03F7/709 , G10K2210/129
摘要： A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate. The lithographic apparatus includes an acoustical sensor to measure a first acoustic vibration in a sensor measurement area in the lithographic apparatus. An actuator is provided to generate a second acoustic vibration in at least an area of the lithographic apparatus. Further, a control device is provided having a sensor input to receive a sensor signal of the acoustical sensor and an actuator output to provide an actuator drive signal to the actuator. The control device is arranged to drive the actuator so as to let the second acoustic vibration at least partly compensate in the area the first acoustic vibration.
摘要翻译： 光刻设备被布置成将图案从图案形成装置转印到基底上。 光刻设备包括用于测量光刻设备中传感器测量区域中的第一声振动的声学传感器。 提供致动器以在光刻设备的至少一个区域中产生第二声振动。 此外，提供了具有传感器输入以接收声学传感器的传感器信号和致动器输出以向致动器提供致动器驱动信号的控制装置。 控制装置被布置成驱动致动器，以使得第二声振动在该区域中至少部分地补偿第一声振动。
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公开(公告)号：US20090161085A1
公开(公告)日：2009-06-25
申请号：US12276115
申请日：2008-11-21
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
CPC分类号： G03F7/709
摘要： A lithographic apparatus may be provided with an acoustic resonator to dampen an acoustic vibration in the lithographic apparatus. The acoustic resonator may include a Helmholtz resonator. The helmholz resonator may be provided with an active element to provide active damping and/or altering a spring characteristic of the mass spring assembly formed by the resonator. The resonator may be provided at a slit in a shield between the patterning device stage and the projection system to suppress transfer of acoustical vibrations, caused by e.g. a movement of the patterning device stage, to the projection system.
摘要翻译： 光刻设备可以设置有声谐振器以抑制光刻设备中的声振动。 声谐振器可以包括亥姆霍兹共振器。 亥姆霍兹共振器可以设置有有源元件以提供主动阻尼和/或改变由谐振器形成的质量弹簧组件的弹簧特性。 谐振器可以设置在图案形成装置台和投影系统之间的屏蔽中的狭缝处，以抑制由例如导致的声音振动的传递。 图案形成装置台的移动到投影系统。
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3.发明授权公开(公告)号：US09378722B2
公开(公告)日：2016-06-28
申请号：US12331870
申请日：2008-12-10
申请人： Hans Butler , Marc Wilhelmus Maria Van der Wijst , Johan Hendrik Geerke , Peter Paul Hempenius , Youssef Karel Maria De Vos , Joost De Pee , Clementius Andreas Johannes Beijers , Nicolaas Bernardus Roozen , Erwin Antonius Henricus Fransiscus Van den Boogaert , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
发明人： Hans Butler , Marc Wilhelmus Maria Van der Wijst , Johan Hendrik Geerke , Peter Paul Hempenius , Youssef Karel Maria De Vos , Joost De Pee , Clementius Andreas Johannes Beijers , Nicolaas Bernardus Roozen , Erwin Antonius Henricus Fransiscus Van den Boogaert , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
IPC分类号： G10K11/178 , G03B27/42 , G03F7/20
CPC分类号： G10K11/178 , G03B27/42 , G03F7/709 , G10K2210/129
摘要： A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate. The lithographic apparatus includes an acoustical sensor to measure a first acoustic vibration in a sensor measurement area in the lithographic apparatus. An actuator is provided to generate a second acoustic vibration in at least an area of the lithographic apparatus. Further, a control device is provided having a sensor input to receive a sensor signal of the acoustical sensor and an actuator output to provide an actuator drive signal to the actuator. The control device is arranged to drive the actuator so as to let the second acoustic vibration at least partly compensate in the area the first acoustic vibration.
摘要翻译： 光刻设备被布置成将图案从图案形成装置转印到基底上。 光刻设备包括用于测量光刻设备中传感器测量区域中的第一声振动的声学传感器。 提供致动器以在光刻设备的至少一个区域中产生第二声振动。 此外，提供了具有传感器输入以接收声学传感器的传感器信号和致动器输出以向致动器提供致动器驱动信号的控制装置。 控制装置被布置成驱动致动器，以使得第二声振动在该区域中至少部分地补偿第一声振动。
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公开(公告)号：US08553199B2
公开(公告)日：2013-10-08
申请号：US12268801
申请日：2008-11-11
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
CPC分类号： G03F7/709
摘要： A vibration damping arrangement for a lithographic apparatus includes a sensor arranged to, in use, detect a vibration of a projection system. An actuator is arranged to, in use, exert a force on a control unit of the projection system to convert an output signal of the sensor to an actuator input signal such that, during operation, the vibration of the projection system is mitigated by controlling the actuator by the input signal to exert the force to the projection system.
摘要翻译： 用于光刻设备的减振装置包括布置成在使用中检测投影系统的振动的传感器。 致动器被布置成在使用中在投影系统的控制单元上施加力以将传感器的输出信号转换为致动器输入信号，使得在操作期间通过控制投影系统来减轻投影系统的振动 致动器通过输入信号向投影系统施加力。
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公开(公告)号：US08243258B2
公开(公告)日：2012-08-14
申请号：US12276115
申请日：2008-11-21
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
CPC分类号： G03F7/709
摘要： A lithographic apparatus may be provided with an acoustic resonator to dampen an acoustic vibration in the lithographic apparatus. The acoustic resonator may include a Helmholtz resonator. The helmholz resonator may be provided with an active element to provide active damping and/or altering a spring characteristic of the mass spring assembly formed by the resonator. The resonator may be provided at a slit in a shield between the patterning device stage and the projection system to suppress transfer of acoustical vibrations, caused by e.g. a movement of the patterning device stage, to the projection system.
摘要翻译： 光刻设备可以设置有声谐振器以抑制光刻设备中的声振动。 声谐振器可以包括亥姆霍兹共振器。 亥姆霍兹共振器可以设置有有源元件以提供主动阻尼和/或改变由谐振器形成的质量弹簧组件的弹簧特性。 谐振器可以设置在图案形成装置台和投影系统之间的屏蔽中的狭缝处，以抑制由例如导致的声音振动的传递。 图案形成装置台的移动到投影系统。
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公开(公告)号：US20090147230A1
公开(公告)日：2009-06-11
申请号：US12268801
申请日：2008-11-11
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
IPC分类号： G03B27/52
CPC分类号： G03F7/709
摘要： A vibration damping arrangement for a lithographic apparatus includes a sensor arranged to, in use, detect a vibration of a projection system. An actuator is arranged to, in use, exert a force on a control unit of the projection system to convert an output signal of the sensor to an actuator input signal such that, during operation, the vibration of the projection system is mitigated by controlling the actuator by the input signal to exert the force to the projection system.
摘要翻译： 用于光刻设备的减振装置包括布置成在使用中检测投影系统的振动的传感器。 致动器被布置成在使用中在投影系统的控制单元上施加力以将传感器的输出信号转换为致动器输入信号，使得在操作期间通过控制投影系统来减轻投影系统的振动 致动器通过输入信号向投影系统施加力。
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公开(公告)号：US09134632B2
公开(公告)日：2015-09-15
申请号：US13301712
申请日：2011-11-21
申请人： Marc Wilhelmus Maria Van Der Wijst , Hans Butler , Yim Bun Patrick Kwan , Erik Roelof Loopstra , Bernhard Geuppert , Marco Hendrikus Hermanus Oude Nijhuis , Rodolfo Guglielmi Rabe , Dick Antonius Hendrikus Laro
发明人： Marc Wilhelmus Maria Van Der Wijst , Hans Butler , Yim Bun Patrick Kwan , Erik Roelof Loopstra , Bernhard Geuppert , Marco Hendrikus Hermanus Oude Nijhuis , Rodolfo Guglielmi Rabe , Dick Antonius Hendrikus Laro
IPC分类号： G03F7/20
CPC分类号： G03F7/70141 , F16F15/022 , F16F15/08 , G03F7/708 , G03F7/709
摘要： Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).
摘要翻译： 公开了平版印刷设备和设备制造方法，其中提供了用于减少振动在投影系统的第一元件和投影系统的第二元件之间传播的程度的装置。 所公开的方法包括使用多个弹性构件串联作为隔振系统的一部分，用于分开支撑第一和第二投影系统框架的多个隔离框架以及用于第一和第二投影系统框架之间的相互作用的修改的连接位置以及隔离 框架。
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公开(公告)号：US20120154774A1
公开(公告)日：2012-06-21
申请号：US13301712
申请日：2011-11-21
申请人： Marc Wilhelmus Maria VAN DER WIJST , Hans Butler , Yim Bun Patrick Kwan , Erik Roelof Loopstra , Bernhard Geuppert , Marco Hendrikus Hermanus Oude Nijhuis , Rodolfo Guglielmi Rabe , Dick Antonius Hendrikus Laro
发明人： Marc Wilhelmus Maria VAN DER WIJST , Hans Butler , Yim Bun Patrick Kwan , Erik Roelof Loopstra , Bernhard Geuppert , Marco Hendrikus Hermanus Oude Nijhuis , Rodolfo Guglielmi Rabe , Dick Antonius Hendrikus Laro
IPC分类号： G03B27/42
CPC分类号： G03F7/70141 , F16F15/022 , F16F15/08 , G03F7/708 , G03F7/709
摘要： Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).
摘要翻译： 公开了平版印刷设备和设备制造方法，其中提供了用于减少振动在投影系统的第一元件和投影系统的第二元件之间传播的程度的装置。 所公开的方法包括使用多个弹性构件串联作为隔振系统的一部分，用于分开支撑第一和第二投影系统框架的多个隔离框架以及用于第一和第二投影系统框架之间的相互作用的修改的连接位置以及隔离 框架。
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9.发明授权Lithographic apparatus for transferring pattern from patterning device onto substrate, and damping method 有权用于将图案从图案形成装置转印到基板上的平版印刷装置以及阻尼方法公开(公告)号：US08730451B2
公开(公告)日：2014-05-20
申请号：US13281214
申请日：2011-10-25
CPC分类号： G03F7/709 , G03F7/70833 , G03F7/7085
摘要： A lithographic apparatus includes a support frame which is supported by a base via a vibration isolation system; a projection system arranged to transfer a pattern from a patterning device onto a substrate, wherein the projection system includes a first frame which is spring-supported by the support frame; and an active damping system configured to damp movement of the first frame, including: a first sensor system configured to provide a first sensor output representative of absolute movement of the first frame, a first actuator system arranged to apply a force between the first frame and the support frame, and a control system configured to provide a drive signal to the first actuator system based on the first sensor output.
摘要翻译： 光刻设备包括：支撑框架，其经由隔振系统由基座支撑; 投影系统，布置成将图案从图案形成装置传送到基板上，其中所述投影系统包括由所述支撑框架弹簧支撑的第一框架; 以及主动阻尼系统，被配置为阻止所述第一框架的运动，所述主动阻尼系统包括：第一传感器系统，其被配置为提供表示所述第一框架的绝对运动的第一传感器输出;布置成在所述第一框架和 支撑框架和被配置为基于第一传感器输出向第一致动器系统提供驱动信号的控制系统。
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