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公开(公告)号：US20090195763A1
公开(公告)日：2009-08-06
申请号：US12331870
申请日：2008-12-10
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Peter Paul Hempenius , Youssef Karel Maria De Vos , Joost De Pee , Clementius Andreas Johannes Beijers , Nicolaas Bernardus Roozen , Erwin Antonius Henricus Fransiscus Van Den Boogaert , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Peter Paul Hempenius , Youssef Karel Maria De Vos , Joost De Pee , Clementius Andreas Johannes Beijers , Nicolaas Bernardus Roozen , Erwin Antonius Henricus Fransiscus Van Den Boogaert , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
CPC分类号： G10K11/178 , G03B27/42 , G03F7/709 , G10K2210/129
摘要： A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate. The lithographic apparatus includes an acoustical sensor to measure a first acoustic vibration in a sensor measurement area in the lithographic apparatus. An actuator is provided to generate a second acoustic vibration in at least an area of the lithographic apparatus. Further, a control device is provided having a sensor input to receive a sensor signal of the acoustical sensor and an actuator output to provide an actuator drive signal to the actuator. The control device is arranged to drive the actuator so as to let the second acoustic vibration at least partly compensate in the area the first acoustic vibration.
摘要翻译： 光刻设备被布置成将图案从图案形成装置转印到基底上。 光刻设备包括用于测量光刻设备中传感器测量区域中的第一声振动的声学传感器。 提供致动器以在光刻设备的至少一个区域中产生第二声振动。 此外，提供了具有传感器输入以接收声学传感器的传感器信号和致动器输出以向致动器提供致动器驱动信号的控制装置。 控制装置被布置成驱动致动器，以使得第二声振动在该区域中至少部分地补偿第一声振动。
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2.发明授权公开(公告)号：US09378722B2
公开(公告)日：2016-06-28
申请号：US12331870
申请日：2008-12-10
申请人： Hans Butler , Marc Wilhelmus Maria Van der Wijst , Johan Hendrik Geerke , Peter Paul Hempenius , Youssef Karel Maria De Vos , Joost De Pee , Clementius Andreas Johannes Beijers , Nicolaas Bernardus Roozen , Erwin Antonius Henricus Fransiscus Van den Boogaert , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
发明人： Hans Butler , Marc Wilhelmus Maria Van der Wijst , Johan Hendrik Geerke , Peter Paul Hempenius , Youssef Karel Maria De Vos , Joost De Pee , Clementius Andreas Johannes Beijers , Nicolaas Bernardus Roozen , Erwin Antonius Henricus Fransiscus Van den Boogaert , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
IPC分类号： G10K11/178 , G03B27/42 , G03F7/20
CPC分类号： G10K11/178 , G03B27/42 , G03F7/709 , G10K2210/129
摘要： A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate. The lithographic apparatus includes an acoustical sensor to measure a first acoustic vibration in a sensor measurement area in the lithographic apparatus. An actuator is provided to generate a second acoustic vibration in at least an area of the lithographic apparatus. Further, a control device is provided having a sensor input to receive a sensor signal of the acoustical sensor and an actuator output to provide an actuator drive signal to the actuator. The control device is arranged to drive the actuator so as to let the second acoustic vibration at least partly compensate in the area the first acoustic vibration.
摘要翻译： 光刻设备被布置成将图案从图案形成装置转印到基底上。 光刻设备包括用于测量光刻设备中传感器测量区域中的第一声振动的声学传感器。 提供致动器以在光刻设备的至少一个区域中产生第二声振动。 此外，提供了具有传感器输入以接收声学传感器的传感器信号和致动器输出以向致动器提供致动器驱动信号的控制装置。 控制装置被布置成驱动致动器，以使得第二声振动在该区域中至少部分地补偿第一声振动。
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公开(公告)号：US20090161085A1
公开(公告)日：2009-06-25
申请号：US12276115
申请日：2008-11-21
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
CPC分类号： G03F7/709
摘要： A lithographic apparatus may be provided with an acoustic resonator to dampen an acoustic vibration in the lithographic apparatus. The acoustic resonator may include a Helmholtz resonator. The helmholz resonator may be provided with an active element to provide active damping and/or altering a spring characteristic of the mass spring assembly formed by the resonator. The resonator may be provided at a slit in a shield between the patterning device stage and the projection system to suppress transfer of acoustical vibrations, caused by e.g. a movement of the patterning device stage, to the projection system.
摘要翻译： 光刻设备可以设置有声谐振器以抑制光刻设备中的声振动。 声谐振器可以包括亥姆霍兹共振器。 亥姆霍兹共振器可以设置有有源元件以提供主动阻尼和/或改变由谐振器形成的质量弹簧组件的弹簧特性。 谐振器可以设置在图案形成装置台和投影系统之间的屏蔽中的狭缝处，以抑制由例如导致的声音振动的传递。 图案形成装置台的移动到投影系统。
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公开(公告)号：US08553199B2
公开(公告)日：2013-10-08
申请号：US12268801
申请日：2008-11-11
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
CPC分类号： G03F7/709
摘要： A vibration damping arrangement for a lithographic apparatus includes a sensor arranged to, in use, detect a vibration of a projection system. An actuator is arranged to, in use, exert a force on a control unit of the projection system to convert an output signal of the sensor to an actuator input signal such that, during operation, the vibration of the projection system is mitigated by controlling the actuator by the input signal to exert the force to the projection system.
摘要翻译： 用于光刻设备的减振装置包括布置成在使用中检测投影系统的振动的传感器。 致动器被布置成在使用中在投影系统的控制单元上施加力以将传感器的输出信号转换为致动器输入信号，使得在操作期间通过控制投影系统来减轻投影系统的振动 致动器通过输入信号向投影系统施加力。
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公开(公告)号：US08243258B2
公开(公告)日：2012-08-14
申请号：US12276115
申请日：2008-11-21
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
CPC分类号： G03F7/709
摘要： A lithographic apparatus may be provided with an acoustic resonator to dampen an acoustic vibration in the lithographic apparatus. The acoustic resonator may include a Helmholtz resonator. The helmholz resonator may be provided with an active element to provide active damping and/or altering a spring characteristic of the mass spring assembly formed by the resonator. The resonator may be provided at a slit in a shield between the patterning device stage and the projection system to suppress transfer of acoustical vibrations, caused by e.g. a movement of the patterning device stage, to the projection system.
摘要翻译： 光刻设备可以设置有声谐振器以抑制光刻设备中的声振动。 声谐振器可以包括亥姆霍兹共振器。 亥姆霍兹共振器可以设置有有源元件以提供主动阻尼和/或改变由谐振器形成的质量弹簧组件的弹簧特性。 谐振器可以设置在图案形成装置台和投影系统之间的屏蔽中的狭缝处，以抑制由例如导致的声音振动的传递。 图案形成装置台的移动到投影系统。
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公开(公告)号：US20090147230A1
公开(公告)日：2009-06-11
申请号：US12268801
申请日：2008-11-11
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Joost De Pee , Clementius Andreas Johannes Beijers , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
IPC分类号： G03B27/52
CPC分类号： G03F7/709
摘要： A vibration damping arrangement for a lithographic apparatus includes a sensor arranged to, in use, detect a vibration of a projection system. An actuator is arranged to, in use, exert a force on a control unit of the projection system to convert an output signal of the sensor to an actuator input signal such that, during operation, the vibration of the projection system is mitigated by controlling the actuator by the input signal to exert the force to the projection system.
摘要翻译： 用于光刻设备的减振装置包括布置成在使用中检测投影系统的振动的传感器。 致动器被布置成在使用中在投影系统的控制单元上施加力以将传感器的输出信号转换为致动器输入信号，使得在操作期间通过控制投影系统来减轻投影系统的振动 致动器通过输入信号向投影系统施加力。
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7.发明申请COMBINATION OF STRUCTURE AND AN ACTIVE DAMPING SYSTEM, AND A LITHOGRAPHIC APPARATUS 失效结构与主动阻尼系统的组合，以及平面设备公开(公告)号：US20090180092A1
公开(公告)日：2009-07-16
申请号：US12267809
申请日：2008-11-10
申请人： Hans BUTLER , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
发明人： Hans BUTLER , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
CPC分类号： G03F7/709 , F16F15/002
摘要： An active damping system to dampen a vibration of at least a part of the structure, including a device to determine a position quantity of the structure and an actuator to exert a force on the structure in dependency of the determined position quantity, wherein the device is a calculation device configured to calculate the position quantity of the structure on the basis of actuator signals.
摘要翻译： 一种用于抑制结构的至少一部分的振动的主动阻尼系统，包括确定结构的位置量的装置和致动器，以依据确定的位置量对结构施加力，其中该装置是 计算装置，被配置为基于致动器信号计算结构的位置量。
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8.发明授权Damping arrangement, active damping system, lithographic apparatus, and projection assembly 失效阻尼布置，主动阻尼系统，光刻设备和投影组件公开(公告)号：US08059259B2
公开(公告)日：2011-11-15
申请号：US12268622
申请日：2008-11-11
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
IPC分类号： G03B27/52
CPC分类号： G03F7/709 , F16F7/1005 , F16F15/02
摘要： An active damping system assembly is configured to dampen a vibration of at least part of a structure. The assembly includes a plurality of active dampers each including a sensor configured to measure a position quantity of an interface mass mounted on the structure; and an actuator configured to exert a force on the interface mass in dependency of a signal provided by the sensor, wherein each of the plurality of active damping systems is connected to the interface mass. The structure may be a projection system of a lithographic apparatus.
摘要翻译： 主动阻尼系统组件被配置为抑制结构的至少一部分的振动。 组件包括多个有源阻尼器，每个活动阻尼器包括被配置为测量安装在结构上的接口质量的位置量的传感器; 以及致动器，其被配置为根据由传感器提供的信号对接口质量施加力，其中多个主动阻尼系统中的每一个连接到界面质量块。 该结构可以是光刻设备的投影系统。
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9.发明申请Damping Arrangement, Active Damping System, Lithographic Apparatus, And Projection Assembly 失效阻尼布置，主动阻尼系统，平版印刷设备和投影组件公开(公告)号：US20090207393A1
公开(公告)日：2009-08-20
申请号：US12268622
申请日：2008-11-11
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , F16F7/1005 , F16F15/02
摘要： An active damping system assembly is configured to dampen a vibration of at least part of a structure. The assembly includes a plurality of active dampers each including a sensor configured to measure a position quantity of an interface mass mounted on the structure; and an actuator configured to exert a force on the interface mass in dependency of a signal provided by the sensor, wherein each of the plurality of active damping systems is connected to the interface mass. The structure may be a projection system of a lithographic apparatus.
摘要翻译： 主动阻尼系统组件被配置为抑制结构的至少一部分的振动。 组件包括多个有源阻尼器，每个活动阻尼器包括被配置为测量安装在结构上的接口质量的位置量的传感器; 以及致动器，其被配置为根据由传感器提供的信号对接口质量施加力，其中多个主动阻尼系统中的每一个连接到界面质量块。 该结构可以是光刻设备的投影系统。
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公开(公告)号：US20090122284A1
公开(公告)日：2009-05-14
申请号：US12249399
申请日：2008-10-10
申请人： Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
发明人： Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
CPC分类号： G03F7/709 , G03F7/70883
摘要： A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.
摘要翻译： 光刻设备包括将图案化的辐射束投影到衬底上的投影系统和用于抑制至少部分投影系统的振动的阻尼系统，所述阻尼系统包括界面阻尼块和主动阻尼子系统，以阻尼 界面阻尼块的至少一部分的振动，连接到投影系统的界面阻尼质量以及连接到界面阻尼块的主动阻尼子系统，主动阻尼子系统包括测量接口阻尼块的位置量的传感器 以及致动器，其基于由传感器提供的信号对接口阻尼质量施加力。 阻尼系统还包括连接到界面阻尼块的接口阻尼装置，并且被配置为在接口阻尼块的本征频率处阻尼接口阻尼块的运动。
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