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1.发明授权Measuring device and method for determining relative positions of a positioning stage configured to be moveable in at least one direction 有权用于确定定位台的相对位置的测量装置和方法，所述定位台被配置成可在至少一个方向上移动公开(公告)号：US07450246B2
公开(公告)日：2008-11-11
申请号：US11432949
申请日：2006-05-12
IPC分类号： G01B11/02
CPC分类号： G01B9/0207 , G01B9/02002 , G01B9/02018 , G01B9/02021 , G01B2290/70
摘要： A measuring apparatus for determining relative positions of a positioning stage arranged in a moveable fashion in at least one direction by a predeterminable maximum traversing path. The measuring device comprises at least one interferometric measuring means and at least one interferometric correction means. An interferometric measuring means is operable with the laser light of a laser of at least one wavelength. Correction results can be generated with the interferometric correction means allowing conclusions to be drawn with respect to the actual wavelength of the laser light during a position determination of the positioning stage in order to take into account variations of the wavelength of the laser light, in particular due to ambient conditions, when evaluating the measuring results. The interferometric correction means is arranged proximate to the interferometric measuring means, and the proximity corresponds to a predeterminable portion of the maximum traversing path of the positioning stage.
摘要翻译： 一种测量装置，用于确定以可移动的方式在至少一个方向上布置有可预定的最大横向路径的定位台的相对位置。 测量装置包括至少一个干涉测量装置和至少一个干涉校正装置。 干涉测量装置可操作于具有至少一个波长的激光的激光。 可以用干涉校正装置产生校正结果，以便在定位台的位置确定期间相对于激光的实际波长得出结论，以便考虑到激光的波长的变化，特别是 由于环境条件，在评估测量结果时。 干涉校正装置设置在干涉测量装置附近，并且接近度对应于定位台的最大横移路径的可预定部分。
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2.发明授权Method for determining the focal position of at least two edges of structures on a substrate 有权用于确定衬底上的结构的至少两个边缘的焦点位置的方法公开(公告)号：US07551296B2
公开(公告)日：2009-06-23
申请号：US12040872
申请日：2008-03-01
IPC分类号： G01B11/14
摘要： A method for determining the focal position of at least two edges of structures (31) on a substrate (30) is disclosed. During the movement of a measurement objective (21) in the Z-coordinate direction, a plurality of images of the at least one structure (31) is acquired with at least one measurement window (45) of a detector. An intensity profile of the structure (31) is determined for each image.
摘要翻译： 公开了一种用于确定衬底（30）上的结构（31）的至少两个边缘的焦点位置的方法。 在测量目标（21）在Z坐标方向移动期间，采用检测器的至少一个测量窗（45）获取所述至少一个结构（31）的多个图像。 为每个图像确定结构（31）的强度分布。
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公开(公告)号：US20090031572A1
公开(公告)日：2009-02-05
申请号：US12220808
申请日：2008-07-29
IPC分类号： G01B5/008
CPC分类号： G01B11/005 , G01B9/02052 , H01L21/67265 , H01L21/681
摘要： A coordinate measuring machine (1) for measuring structures (3) on a substrate (2) including a measurement table (20) movable in the X-coordinate direction and in the Y-coordinate direction, a measurement objective (9), at least one laser interferometer (24) for determining the position of the measurement table (20) and the measurement objective (9) wherein the measurement table (20), the measurement objective (9) and the at least one laser interferometer (24) are arranged in a vacuum chamber (50).
摘要翻译： 一种用于在基板（2）上测量结构（3）的坐标测量机（1），包括：在X坐标方向和Y坐标方向上可移动的测量台（20），至少测量目标 一个用于确定测量表（20）和测量目标（9）的位置的激光干涉仪（24），其中测量表（20），测量目标（9）和至少一个激光干涉仪（24）被布置 在真空室（50）中。
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4.发明申请Measuring device and method for determining relative positions of a positioning stage configured to be moveable in at least one direction 有权用于确定定位台的相对位置的测量装置和方法，所述定位台被配置成可在至少一个方向上移动公开(公告)号：US20060279743A1
公开(公告)日：2006-12-14
申请号：US11432949
申请日：2006-05-12
CPC分类号： G01B9/0207 , G01B9/02002 , G01B9/02018 , G01B9/02021 , G01B2290/70
摘要： A measuring apparatus for determining relative positions of a positioning stage arranged in a moveable fashion in at least one direction by a predeterminable maximum traversing path. The measuring device comprises at least one interferometric measuring means and at least one interferometric correction means. An interferometric measuring means is operable with the laser light of a laser of at least one wavelength. Correction results can be generated with the interferometric correction means allowing conclusions to be drawn with respect to the actual wavelength of the laser light during a position determination of the positioning stage in order to take into account variations of the wavelength of the laser light, in particular due to ambient conditions, when evaluating the measuring results. The interferometric correction means is arranged proximate to the interferometric measuring means, and the proximity corresponds to a predeterminable portion of the maximum traversing path of the positioning stage.
摘要翻译： 一种测量装置，用于确定以可移动的方式在至少一个方向上布置有可预定的最大横向路径的定位台的相对位置。 测量装置包括至少一个干涉测量装置和至少一个干涉校正装置。 干涉测量装置可操作于具有至少一个波长的激光的激光。 可以用干涉校正装置产生校正结果，以便在定位台的位置确定期间相对于激光的实际波长得出结论，以便考虑到激光的波长的变化，特别是 由于环境条件，在评估测量结果时。 干涉校正装置设置在干涉测量装置附近，并且接近度对应于定位台的最大横移路径的可预定部分。
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5.发明申请METHOD FOR DETERMINING THE FOCAL POSITION OF AT LEAST TWO EDGES OF STRUCTURES ON A SUBSTRATE 有权用于确定基底上最少两个结构边缘的焦点位置的方法公开(公告)号：US20080252903A1
公开(公告)日：2008-10-16
申请号：US12040872
申请日：2008-03-01
IPC分类号： G01B11/14
摘要： A method for determining the focal position of at least two edges of structures (31) on a substrate (30) is disclosed. During the movement of a measurement objective (21) in the Z-coordinate direction, a plurality of images of the at least one structure (31) is acquired with at least one measurement window (45) of a detector. An intensity profile of the structure (31) is determined for each image.
摘要翻译： 公开了一种用于确定衬底（30）上的结构（31）的至少两个边缘的焦点位置的方法。 在测量目标（21）在Z坐标方向移动期间，采用检测器的至少一个测量窗（45）获取至少一个结构（31）的多个图像。 为每个图像确定结构（31）的强度分布。
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6.发明授权Device and method for automatic detection of incorrect measurements by means of quality factors 有权通过质量因素自动检测不正确的测量的装置和方法公开(公告)号：US08154595B2
公开(公告)日：2012-04-10
申请号：US12023222
申请日：2008-01-31
CPC分类号： G01B21/045 , G01N2021/95676 , G03F1/84 , H01J2237/24592
摘要： What is disclosed is a device (1) for automatic detection of a possible incorrect measurement, wherein the device (1) comprises at least one reflected light illumination apparatus (14) and/or a transmitted light illumination apparatus (6) and at least one imaging optical system (9) and one detector (11) of a camera (10) for imaging structures (3) on a substrate (2), wherein a first program portion (17) is linked to the detector (11) of the camera (10), said detector being provided for determining the position and/or dimension of the structure (3) on the substrate (2), wherein the device (1) determines and records a plurality of measurement variables Mj, jε{1, . . . , L}, from which at least one variable G can be determined, wherein a second program portion (18) is linked to the detector (11) of the camera (10), said program portion calculating an analysis of the measurement variables Mj with regard to a possible incorrect measurement. Also disclosed is a method for automatic detection of a possible incorrect measurement wherein an analysis of the measurement variables Mj with regard to a possible incorrect measurement is calculated with a second program portion (18) which is linked to the detector (11) of the camera (10).
摘要翻译： 所公开的是用于自动检测可能的不正确测量的装置（1），其中装置（1）包括至少一个反射光照明装置（14）和/或透射光照明装置（6）和至少一个 成像光学系统（9）和相机（10）的一个检测器（11），用于在基板（2）上成像结构（3），其中第一程序部分（17）连接到相机的检测器（11） （10），所述检测器被提供用于确定所述基板（2）上的所述结构（3）的位置和/或尺寸，其中所述装置（1）确定并记录多个测量变量Mj，j＆egr; {1， 。 。 。 ，L}，其中可以确定至少一个变量G，其中第二程序部分（18）链接到摄像机（10）的检测器（11），所述程序部分计算测量变量Mj的分析， 考虑到可能的不正确的测量。 还公开了一种用于自动检测可能的不正确测量的方法，其中使用连接到相机的检测器（11）的第二程序部分（18）计算关于可能的不正确测量的测量变量Mj的分析， （10）。
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公开(公告)号：US07961334B2
公开(公告)日：2011-06-14
申请号：US12220808
申请日：2008-07-29
IPC分类号： G01B11/02
CPC分类号： G01B11/005 , G01B9/02052 , H01L21/67265 , H01L21/681
摘要： A coordinate measuring machine (1) for measuring structures (3) on a substrate (2) including a measurement table (20) movable in the X-coordinate direction and in the Y-coordinate direction, a measurement objective (9), at least one laser interferometer (24) for determining the position of the measurement table (20) and the measurement objective (9) wherein the measurement table (20), the measurement objective (9) and the at least one laser interferometer (24) are arranged in a vacuum chamber (50).
摘要翻译： 一种用于在基板（2）上测量结构（3）的坐标测量机（1），包括：在X坐标方向和Y坐标方向上可移动的测量台（20），至少测量目标 一个用于确定测量表（20）和测量目标（9）的位置的激光干涉仪（24），其中测量表（20），测量目标（9）和至少一个激光干涉仪（24）被布置 在真空室（50）中。
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8.发明申请DEVICE AND METHOD FOR AUTOMATIC DETECTION OF INCORRECT MEASUREMENTS BY MEANS OF QUALITY FACTORS 有权通过质量因素自动检测不正确测量的装置和方法公开(公告)号：US20080202201A1
公开(公告)日：2008-08-28
申请号：US12023222
申请日：2008-01-31
IPC分类号： G01B21/00
CPC分类号： G01B21/045 , G01N2021/95676 , G03F1/84 , H01J2237/24592
摘要： What is disclosed is a device (1) for automatic detection of a possible incorrect measurement, wherein the device (1) comprises at least one reflected light illumination apparatus (14) and/or a transmitted light illumination apparatus (6) and at least one imaging optical system (9) and one detector (11) of a camera (10) for imaging structures (3) on a substrate (2), wherein a first program portion (17) is linked to the detector (11) of the camera (10), said detector being provided for determining the position and/or dimension of the structure (3) on the substrate (2), wherein the device (1) determines and records a plurality of measurement variables Mj, j ε {1, . . . , L}, from which at least one variable G can be determined, wherein a second program portion (18) is linked to the detector (11) of the camera (10), said program portion calculating an analysis of the measurement variables Mj with regard to a possible incorrect measurement. Also disclosed is a method for automatic detection of a possible incorrect measurement wherein an analysis of the measurement variables Mj with regard to a possible incorrect measurement is calculated with a second program portion (18) which is linked to the detector (11) of the camera (10).
摘要翻译： 所公开的是用于自动检测可能的不正确测量的装置（1），其中装置（1）包括至少一个反射光照明装置（14）和/或透射光照明装置（6）和至少一个 成像光学系统（9）和相机（10）的一个检测器（11），用于在基板（2）上成像结构（3），其中第一程序部分（17）连接到相机的检测器（11） （10），所述检测器被提供用于确定所述基板（2）上的结构（3）的位置和/或尺寸，其中所述装置（1）确定并记录多个测量变量M SUB>，j epsilon {1，... 。 。 ，L}，其中可以确定至少一个变量G，其中第二程序部分（18）链接到相机（10）的检测器（11），所述程序部分计算测量变量M' 关于可能的不正确测量的SUB> j 。 还公开了一种用于自动检测可能的不正确测量的方法，其中使用第二程序部分（18）计算关于可能的不正确测量的测量变量M SUB的分析，该第二程序部分（18）被链接到 相机（10）的检测器（11）。
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9.发明申请Metrology system and method for monitoring and correcting system generated errors 审中-公开计量系统和方法，用于监控和校正系统产生的错误公开(公告)号：US20100302555A1
公开(公告)日：2010-12-02
申请号：US12799362
申请日：2010-04-23
IPC分类号： G01B11/02
CPC分类号： G01B11/005 , G01B21/047
摘要： A metrology system (1) and a method for determining low order errors are disclosed. At least one measurement objective (9) for the determination of the position of structures (3) on a substrate (2) is provided. The substrate (2) to be measured rests in a support on three points of support (52). The support exhibits an opening (53) for measuring the substrate (2). At least two marks (54) are provided on the support for the mask (2) in such a way that the marks (54) are capturable with the measurement objective (9) by moving the measurement table (20). Furthermore the substrate (2) in the support does not screen the marks (54) on the support.
摘要翻译： 公开了一种计量系统（1）和确定低阶误差的方法。 提供了用于确定衬底（2）上的结构（3）的位置的至少一个测量目标（9）。 要测量的基板（2）支撑在三个支撑点（52）上。 支撑件具有用于测量基板（2）的开口（53）。 在用于掩模（2）的支撑件上设置至少两个标记（54），使得通过移动测量台（20）可以通过测量物镜（9）捕获标记（54）。 此外，支撑件中的基板（2）不会屏蔽支撑件上的标记（54）。
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公开(公告)号：US20060275017A1
公开(公告)日：2006-12-07
申请号：US11437953
申请日：2006-05-19
申请人： Wolfgang Sulik , Hans-Artur Boesser
发明人： Wolfgang Sulik , Hans-Artur Boesser
IPC分类号： G02B6/00
摘要： Apparatus and method for optically detecting an object. The apparatus includes a light source to illuminate an object, an illumination optical path, a detection optical path, imaging optics, a detection means, wherein the imaging optics are arranged in the detection optical path and wherein light from the object can be imaged onto the detection means with the aid of the imaging optics, an adjustment means is provided, by means of which at least one imaging optical component, arranged in the illumination optical path or in the detection optical path, is rotatable about its respective optical axes, or is pivotable with respect to the optical axis of the optical path in which the optical component is arranged, and is translatable in a direction transverse to the optical axis, to detect an object with the aid of the optical component in a rotated, pivoted or translated state.
摘要翻译： 用于光学检测物体的装置和方法。 该装置包括用于照亮物体的光源，照明光路，检测光路，成像光学器件，检测装置，其中成像光学元件布置在检测光路中，并且其中来自物体的光可以成像到 检测装置借助于成像光学元件，提供了一种调节装置，通过该调节装置，布置在照明光路或检测光路中的至少一个成像光学部件可绕其相应的光轴旋转，或者是 可相对于其中配置有光学部件的光路的光轴可枢转，并且可以在横向于光轴的方向上平移，以借助于光学部件以旋转，枢转或翻转的状态来检测物体 。
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