公开(公告)号：US3986997A

公开(公告)日：1976-10-19

申请号：US482961

申请日：1974-06-25

Applicant: Harold A. Clark

Inventor： Harold A. Clark

IPC: C08L83/00 ,  B29D11/00 ,  C03C17/30 ,  C04B24/42 ,  C04B41/84 ,  C08J7/04 ,  C08K5/09 ,  C08L83/04 ,  C08L83/06 ,  C09D1/00 ,  C09D183/00 ,  C09D183/04 ,  C09D183/06 ,  C08J3/02

CPC classification number: C09D1/00 ,  B29D11/00865 ,  C08K3/36 ,  C09D183/04 ,  Y10T428/31507

Abstract: An acidic dispersion of colloidal silica and hydroxylated silsesquioxane in an alcohol-water medium is coated onto solid substrates, such as acrylic lenses, to provide an abrasion resistant coating.

公开(公告)号：US3976497A

公开(公告)日：1976-08-24

申请号：US483183

申请日：1974-06-25

Applicant: Harold A. Clark

Inventor： Harold A. Clark

IPC: C09D1/00 ,  C08K3/36 ,  C09D5/18 ,  C09D183/00 ,  C09D183/04 ,  C08G77/16 ,  C09D3/82 ,  C09K3/00

CPC classification number: C09D183/04 ,  Y10T428/2804 ,  Y10T428/31663

Abstract: Pigments are incorporated in an acidic dispersion of colloidal silica and hydroxylated silsesquioxane in an alcohol-water medium to provide paint compositions.

Abstract translation: 将颜料掺入胶体二氧化硅和羟基化倍半硅氧烷的酸性分散体在醇 - 水介质中以提供涂料组合物。

公开(公告)号：US4239668A

公开(公告)日：1980-12-16

申请号：US962362

申请日：1978-11-20

Applicant: Harold A. Clark ,  Loren A. Haluska

Inventor： Harold A. Clark ,  Loren A. Haluska

IPC: C08L83/00 ,  C08L83/04 ,  C09D183/04 ,  C09D183/08 ,  C09J11/00 ,  C09J183/00 ,  C08J3/02

CPC classification number: C09D183/08 ,  Y10T428/31507

Abstract: What is disclosed is a composition of matter which is an aqueous dispersion of an organothiolsilsesquioxane and colloidal silica which is useful as an adhesion promoter for siloxane resins which have a low degree of substitution.

Abstract translation: 所公开的是作为有机硫醇倍半硅氧烷和胶体二氧化硅的水分散体的物质组合物，其可用作具有低取代度的硅氧烷树脂的粘合促进剂。

公开(公告)号：US3944702A

公开(公告)日：1976-03-16

申请号：US482298

申请日：1974-06-24

Applicant: Harold A. Clark

Inventor： Harold A. Clark

IPC: D06M11/00 ,  C09J183/00 ,  D04H1/64 ,  D04H3/12 ,  D06M11/79 ,  H01B3/50 ,  D04H1/58

CPC classification number: D04H1/64 ,  D04H1/587 ,  Y10S428/92 ,  Y10T428/2962 ,  Y10T428/2964 ,  Y10T442/60

Abstract: A binder composition of colloidal silica and silsesquioxane polymer (RSiO.sub.3 /.sub.2) is applied to fibrous masses from an acidified water-alcohol vehicle to fabricate coherent three-dimensional structures, such as bonded asbestos mats.

Abstract translation: 将胶体二氧化硅和倍半硅氧烷聚合物（RSiO3 / 2）的粘合剂组合物从酸化的水 - 醇载体施加到纤维团上，以制造粘结的石棉垫等相干三维结构。

公开(公告)号：US4180432A

公开(公告)日：1979-12-25

申请号：US861796

申请日：1977-12-19

Applicant: Harold A. Clark

Inventor： Harold A. Clark

IPC: C30B33/00 ,  B28B11/08 ,  C30B33/12 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/308 ,  H01L21/311 ,  B44C1/22 ,  C03C15/00 ,  C03C25/06

CPC classification number: H01L21/31116 ,  H01L21/3081

Abstract: Silicon dioxide is etched at about five times the rate of silicon in a moderate vacuum gas plasma formed from a mixture of CF.sub.4 and oxygen wherein the mixture contains above about 5 to about 15 percent by volume CF.sub.4 so that films of silicon dioxide on silicon can be etched to the silicon surface without excessive attack on the silicon. Silicon dioxide is etched at about three times the rate of silicon nitride so that silicon nitride can be used as an etch mask for the process.

Abstract translation: 在CF4和氧气的混合物形成的中等真空气体等离子体中硅的蚀刻速率约为二氧化硅的5倍，其中混合物含有约5至约15体积％的CF 4，使得硅上的二氧化硅膜可以是 蚀刻到硅表面，而不会对硅进行过度的攻击。 以大约三倍于氮化硅的速率蚀刻二氧化硅，使得氮化硅可以用作该工艺的蚀刻掩模。

公开(公告)号：US4027073A

公开(公告)日：1977-05-31

申请号：US698234

申请日：1976-06-21

Applicant: Harold A. Clark

Inventor： Harold A. Clark

IPC: B29D11/00 ,  C09D1/00 ,  C09D183/04 ,  B32B9/04

CPC classification number: C09D1/00 ,  B29D11/00865 ,  C09D183/04 ,  Y10T428/31507 ,  Y10T428/31663 ,  Y10T428/31786 ,  Y10T428/31855

Abstract: An acidic dispersion of colloidal silica and hydroxylated silsesquioxane in an alcohol-water medium is coated onto solid substrates, such as acrylic lenses, to provide an abrasion resistant coating.

Abstract translation: 胶体二氧化硅和羟基化倍半硅氧烷在醇 - 水介质中的酸性分散体被涂覆到固体基质如丙烯酸透镜上，以提供耐磨涂层。