公开(公告)号：US20110071317A1

公开(公告)日：2011-03-24

申请号：US12885698

申请日：2010-09-20

Applicant: Harue OSAKA ,  Hiroto INOUE

Inventor： Harue OSAKA ,  Hiroto INOUE

IPC: C07C211/56 ,  C07C209/74

CPC classification number: C07C211/56 ,  C07D209/86

Abstract: An object is to provide a new halogenated diarylamine compound serving as a source material for synthesis of a variety of diarylamine compounds and triarylamine compounds and a synthesis method of the new halogenated diarylamine compound. A halogenated diarylamine compound represented by the following general formula (G1) and a synthesis method thereof are provided. Note that a variety of diarylamine compounds and triarylamine compounds can be synthesized using the halogenated diarylamine compound represented by the following general formula (G1).

Abstract translation: 目的是提供新的卤化二芳基胺化合物，其用作合成各种二芳基胺化合物和三芳基胺化合物的原料，以及新的卤化二芳基胺化合物的合成方法。 提供由以下通式（G1）表示的卤代二芳基胺化合物及其合成方法。 注意，可以使用由以下通式（G1）表示的卤代二芳基胺化合物来合成各种二芳基胺化合物和三芳基胺化合物。

公开(公告)号：US20100323501A1

公开(公告)日：2010-12-23

申请号：US12817224

申请日：2010-06-17

Applicant: Shunpei YAMAZAKI ,  Takayuki INOUE ,  Erumu KIKUCHI ,  Hiroto INOUE

Inventor： Shunpei YAMAZAKI ,  Takayuki INOUE ,  Erumu KIKUCHI ,  Hiroto INOUE

IPC: H01L21/20 ,  C23C16/453 ,  H01L21/28

CPC classification number: H01J37/32449 ,  H01J37/3244 ,  H01J37/32541 ,  H01L29/66765

Abstract: A structure of the plasma treatment apparatus is employed in which an upper electrode has projected portions provided with first introduction holes and recessed portions provided with second introduction holes, the first introduction hole of the upper electrode is connected to a first cylinder filled with a gas which is not likely to be dissociated, the second introduction hole is connected to a second cylinder filled with a gas which is likely to be dissociated, the gas which is not likely to be dissociated is introduced into a reaction chamber from an introduction port of the first introduction hole provided on a surface of the projected portion of the upper electrode, and the gas which is likely to be dissociated is introduced into the reaction chamber from an introduction port of the second introduction hole provided on a surface of the recessed portion.

Abstract translation: 采用等离子体处理装置的结构，其中上电极具有设置有第一导入孔的突出部分和设置有第二导入孔的凹部，上电极的第一导入孔与填充有气体的第一圆筒连接， 不可能解离，第二引入孔连接到填充有可能解离的气体的第二气缸，不可能解离的气体从第一引入孔的引入口引入反应室 设置在上部电极的突出部分的表面上的引入孔和可能被解离的气体从设置在凹部的表面上的第二引入孔的引入口引入到反应室中。

公开(公告)号：US20130012006A1

公开(公告)日：2013-01-10

申请号：US13618472

申请日：2012-09-14

Applicant: Shunpei YAMAZAKI ,  Takayuki INOUE ,  Erumu KIKUCHI ,  Hiroto INOUE

Inventor： Shunpei YAMAZAKI ,  Takayuki INOUE ,  Erumu KIKUCHI ,  Hiroto INOUE

IPC: H01L21/314 ,  H01L21/283 ,  H01L21/20

CPC classification number: H01J37/32449 ,  H01J37/3244 ,  H01J37/32541 ,  H01L29/66765

Abstract: A structure of the plasma treatment apparatus is employed in which an upper electrode has projected portions provided with first introduction holes and recessed portions provided with second introduction holes, the first introduction hole of the upper electrode is connected to a first cylinder filled with a gas which is not likely to be dissociated, the second introduction hole is connected to a second cylinder filled with a gas which is likely to be dissociated, the gas which is not likely to be dissociated is introduced into a reaction chamber from an introduction port of the first introduction hole provided on a surface of the projected portion of the upper electrode, and the gas which is likely to be dissociated is introduced into the reaction chamber from an introduction port of the second introduction hole provided on a surface of the recessed portion.

Abstract translation: 采用等离子体处理装置的结构，其中上电极具有设置有第一导入孔的突出部分和设置有第二导入孔的凹部，上电极的第一导入孔与填充有气体的第一圆筒连接， 不可能解离，第二引入孔连接到填充有可能解离的气体的第二气缸，不可能解离的气体从第一引入孔的引入口引入反应室 设置在上部电极的突出部分的表面上的引入孔和可能被解离的气体从设置在凹部的表面上的第二引入孔的引入口引入到反应室中。

公开(公告)号：US20090096641A1

公开(公告)日：2009-04-16

申请号：US12235853

申请日：2008-09-23

Applicant: Hiroto INOUE ,  Tamotsu YAMAMOTO

Inventor： Hiroto INOUE ,  Tamotsu YAMAMOTO

IPC: H03K17/94 ,  F16H21/12

CPC classification number: G01D5/145 ,  G01D11/14 ,  G05G1/10 ,  G05G5/03 ,  H03K2217/94068 ,  Y10T74/1836

Abstract: A rotary actuator includes a roller having a center shaft protruding along a center axis, a bearing for supporting the center shaft of the roller to allow the roller to rotate about the center axis, a ring magnet fixed to the center shaft of the roller, an elastic member having a ring shape provided between the center shaft of the roller and the bearing, and a fixed magnet facing the ring magnet. The ring magnet is alternately magnetized to an S-pole and an N-pole with predetermined angular intervals. This rotary actuator has a simple structure and operates with a preferable operation feeling.

Abstract translation: 旋转致动器包括具有沿中心轴突出的中心轴的滚子，用于支撑滚子的中心轴的轴承，以允许滚筒围绕中心轴线旋转;固定到滚子的中心轴的环形磁铁， 具有设置在辊的中心轴和轴承之间的环形的弹性构件和面向环形磁体的固定磁体。 环形磁铁以预定的角度间隔交替地磁化到S极和N极。 该旋转致动器具有简单的结构，并且具有优选的操作感觉。