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46 条记录 (耗时 0.025 秒)

    1-4-Dihydropyridine-containing ir-sensitive composition and use thereof for the production of imageable elements
    3.
    发明申请
    1-4-Dihydropyridine-containing ir-sensitive composition and use thereof for the production of imageable elements 有权

    公开(公告)号：US20060154172A1

    公开(公告)日：2006-07-13

    申请号：US10559230

    申请日：2004-06-08

    申请人： Hans-Joachim Timpe ,  Jianbing Huang

    发明人： Hans-Joachim Timpe ,  Jianbing Huang

    IPC分类号： G03C1/76

    CPC分类号： B41M5/465 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  Y10S430/117 ,  Y10S430/121

    摘要： Initiator system comprising: (a) at least one substance capable of absorbing IR radiation, (b) at least one compound capable of forming free radicals, and (c) at least one 1,4-dihydropyridine derivative of the formula (I) wherein R1 is selected from a hydrogen atom, —C(O)OR7, an optionally substituted alkyl group, an optionally substituted aryl group and an optionally substituted aralkyl group, R2 and R3 are independently selected from optionally substituted alkyl groups, optionally substituted aryl groups, CN and a hydrogen atom, R4 and R5 are independently selected from —C(O)OR7, —C(O)R7, —C(O)NR8R9 and CN, or R2 and R4 together form an optionally substituted phenyl ring or a 5- to 7-membered carbocyclic or heterocyclic ring, wherein the unit is present in the carbocyclic or heterocyclic ring adjacent to position 5 of the dihydropyridine ring and wherein the carbocyclic or heterocyclic ring optionally comprises additional substituents, or both R2 and R4 as well as R3 and R5 form either optionally substituted phenyl rings or 5- to 7-membered carbocyclic or heterocyclic rings, wherein the unit is present in the carbocyclic or heterocyclic rings adjacent to positions 3 and 5 of the dihydropyridine ring and wherein the carbocyclic or heterocyclic rings optionally comprise additional substituents, or one of the pairs R2/R4 and R3/R5 forms a 5- to 7-membered carbocyclic or heterocyclic ring, wherein the unit is present in the carbocyclic or heterocyclic ring adjacent to position 5 or 3 of the dihydropyridine ring and wherein the carbocyclic or heterocyclic ring optionally comprises additional substituents and the other pair forms an optionally substituted phenyl ring, or R2 and R4 or R3 and R1 form a 5- to 7-membered heterocyclic ring which can optionally comprise one or more substituents and which, in addition to the nitrogen atom it shares with the 1,4-dihydropyridine ring, optionally comprises additional nitrogen atoms, —NR13 groups, —S— or —O—, R6 is selected from an alkyl group optionally substituted with a halogen atom or a —C(O) group, an optionally substituted aryl group, an optionally substituted aralkyl group, an optionally substituted heterocyclic group and the group Y is an alkylene group or an arylene group, R7 is a hydrogen atom, aryl group, aralkyl group or alkyl group, wherein the alkyl group and the alkyl unit of the aralkyl group optionally comprise one or more C—C double and/or C—C triple bonds, and R8 and R9 are independently selected from a hydrogen atom, an optionally substituted alkyl group, an optionally substituted aryl group and an optionally substituted aralkyl group.

    Thermal digital lithographic printing plate
    4.
    发明授权
    Thermal digital lithographic printing plate 有权
    热数码平版印刷版

    公开(公告)号：US06358669B1

    公开(公告)日：2002-03-19

    申请号：US09469489

    申请日：1999-12-22

    申请人： Celin Savariar-Hauck ,  Ken-ichi Shimazu ,  Hans-Joachim Timpe ,  Jayanti Patel ,  Jianbing Huang

    发明人： Celin Savariar-Hauck ,  Ken-ichi Shimazu ,  Hans-Joachim Timpe ,  Jayanti Patel ,  Jianbing Huang

    IPC分类号： G03F709

    CPC分类号： B41M5/42 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  B41M5/368 ,  B41M5/44 ,  B41M5/465

    摘要： A thermally imageable element, useful as a lithographic printing plate precursor is disclosed. The element comprises a hydrophilic substrate; an underlayer comprising a first polymeric material; and an ink-receptive top layer comprising a second polymeric material. Preferably, the top layer comprises a compound that functions as a solubility-suppressing component. The solubility-suppressing component may be a separate dissolution inhibitor compound and/or the second polymeric material may also function as a solubility-suppressing component. On thermal exposure the exposed regions of the top layer becomes more readily soluble in an aqueous developer, allowing the developer to remove the top layer and reveal the surface of the hydrophilic substrate. The lithographic printing plate thus formed has excellent properties, including the absence of sludging of the developer.

    摘要翻译： 公开了可用作平版印刷版原版的可热成像元件。 元件包括亲水基底; 包含第一聚合物材料的底层; 以及包含第二聚合物材料的吸墨顶层。 优选地，顶层包含用作溶解度抑制成分的化合物。 溶解性抑制成分可以是单独的溶解抑制剂化合物和/或第二聚合物材料也可以作为溶解度抑制成分起作用。 在热曝光的情况下，顶层的暴露区域变得更容易溶于水性显影剂，使显影剂除去顶层并露出亲水基材的表面。 这样形成的平版印刷版具有优异的性能，包括不存在显影剂的污泥。

    Thermal digital lithographic printing plate
    5.
    发明授权
    Thermal digital lithographic printing plate 有权
    热数码平版印刷版

    公开(公告)号：US06534238B1

    公开(公告)日：2003-03-18

    申请号：US09592895

    申请日：2000-06-13

    申请人： Celin Savariar-Hauck ,  Ken-ichi Shimazu ,  Hans-Joachim Timpe ,  Jayanti Patel ,  Jianbing Huang

    发明人： Celin Savariar-Hauck ,  Ken-ichi Shimazu ,  Hans-Joachim Timpe ,  Jayanti Patel ,  Jianbing Huang

    IPC分类号： G03F7038

    CPC分类号： B41C1/1016 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  B41M5/368 ,  B41M5/42 ,  B41M5/44 ,  B41M5/465 ,  Y10S430/145 ,  Y10S430/146

    摘要： A thermally imageable element, useful as a lithographic printing plate precursor is disclosed. The element comprises a hydrophilic substrate; an underlayer comprising a first polymeric material; and an ink-receptive top layer comprising a second polymeric material and a solubility-suppressing component. The solubility-suppressing component may be a separate dissolution inhibitor compound and/or the second polymeric material may also function as a solubility-suppressing component. On thermal exposure the exposed regions of the top layer becomes more readily soluble in an aqueous developer, allowing the developer to remove the top layer and reveal the surface of the hydrophilic substrate. The lithographic printing plate thus formed has excellent properties, including the absence of sludging of the developer.

    摘要翻译： 公开了可用作平版印刷版原版的可热成像元件。 元件包括亲水基底; 包含第一聚合物材料的底层; 以及包含第二聚合物材料和溶解度抑制组分的吸墨顶层。 溶解性抑制成分可以是单独的溶解抑制剂化合物和/或第二聚合物材料也可以作为溶解度抑制成分起作用。 在热曝光的情况下，顶层的暴露区域变得更容易溶于水性显影剂，使显影剂除去顶层并露出亲水基材的表面。 这样形成的平版印刷版具有优异的性能，包括不存在显影剂的污泥。

    Lithographic printing plate precursors with mercapto-functionlalized free-radical polymerizable monomers
    7.
    发明申请
    Lithographic printing plate precursors with mercapto-functionlalized free-radical polymerizable monomers 有权

    公开(公告)号：US20070148583A1

    公开(公告)日：2007-06-28

    申请号：US10586509

    申请日：2005-01-19

    申请人： Hans-Joachim Timpe ,  Ursula Muller

    发明人： Hans-Joachim Timpe ,  Ursula Muller

    IPC分类号： G03C1/00

    CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41N1/083 ,  Y10S430/122 ,  Y10S430/145

    摘要： Lithographic printing plate precursor comprising: a) an untreated or pretreated substrate and b) a radiation-sensitive coating comprising: (i) at least one polymeric binder soluble or swellable in aqueous alkaline developers; (ii) at least one free-radical polymerizable monomer and/or oligomer comprising at least one non-aromatic C—C double bond and at least one SH group in the molecule; and (iii) a radiation-sensitive initiator or initiator system for free-radical polymerization, wherein component (ii) has the formula (I) wherein each R1a, R1b and R1c is independently selected from H, C1-C6 alkyl, C2-C8 alkenyl, aryl, halogen, CN and COOR1d, wherein R1d is H, C1-C18 alkyl, C2-C8 alkenyl, C2-C8 alkynyl or aryl; and Z is an aliphatic, heterocyclic or heteroaromatic spacer or a combination of two or more thereof, wherein Z can optionally comprise one or more additional SH groups and/or one or more additional non-aromatic C—C double bonds; and each Z1 is independently selected from a single bond, formulae (Ia), (Ib), (Ic), (Id), (Ie), (If), (Ig), (Ih), (Ij), (Ik), (Im), (In), (Io), (Ip), (Iq), (Ir), (Is), (It), (Iu), (Iv), wherein R2a, R2b and R2c are independently selected from H, C1-C6 alkyl and aryl, Z2 is selected from a single bond, O, S and NR2c, Z3 is a single bond which is connected to Z, b is an integer from 1 to 10 and c is an integer from 1 to 3.

    Lithographic printing plate precursors with mercapto-functionalized free-radical polymerizable monomers
    8.
    发明授权
    Lithographic printing plate precursors with mercapto-functionalized free-radical polymerizable monomers 有权
    具有巯基官能化自由基可聚合单体的平版印刷版前体

    公开(公告)号：US07560221B2

    公开(公告)日：2009-07-14

    申请号：US10586509

    申请日：2005-01-19

    申请人： Hans-Joachim Timpe ,  Ursula Muller

    发明人： Hans-Joachim Timpe ,  Ursula Muller

    IPC分类号： G03F7/004 ,  G03F7/027 ,  G03F7/028 ,  G03F7/033

    CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41N1/083 ,  Y10S430/122 ,  Y10S430/145

    摘要： Lithographic printing plate precursor comprising: a) an untreated or pretreated substrate and b) a radiation-sensitive coating comprising: (i) at least one polymeric binder soluble or swellable in aqueous alkaline developers; (ii) at least one free-radical polymerizable monomer and/or oligomer comprising at least one non-aromatic C—C double bond and at least one SH group in the molecule; and (iii) a radiation-sensitive initiator or initiator system for free-radical polymerization, wherein component (ii) has the formula (I) wherein each R1a, R1b and R1c is independently selected from H, C1-C6 alkyl, C2-C8 alkenyl, aryl, halogen, CN and COOR1d, wherein R1d is H, C1-C18 alkyl, C2-C8 alkenyl, C2-C8 alkynyl or aryl; and Z is an aliphatic, heterocyclic or heteroaromatic spacer or a combination of two or more thereof, wherein Z can optionally comprise one or more additional SH groups and/or one or more additional non-aromatic C—C double bonds; and each Z1 is independently selected from a single bond, formulae (Ia), (Ib), (Ic), (Id), (Ie), (If), (Ig), (Ih), (Ij), (Ik), (Im), (In), (Io), (Ip), (Iq), (Ir), (Is), (It), (Iu), (Iv), wherein R2a, R2b and R2c are independently selected from H, C1-C6 alkyl and aryl, Z2 is selected from a single bond, O, S and NR2c, Z3 is a single bond which is connected to Z, b is an integer from 1 to 10 and c is an integer from 1 to 3.

    摘要翻译： 包括：a）未处理或预处理的底物和b）辐射敏感性涂层，其包含：（i）至少一种可溶于或溶胀在含水碱性显影剂中的聚合物粘合剂; （ii）至少一种包含分子中至少一个非芳族C-C双键和至少一个SH基团的自由基可聚合单体和/或低聚物; 和（iii）用于自由基聚合的辐射敏感引发剂或引发剂体系，其中组分（ii）具有式（I），其中每个R 1a，R 1b和R 1c独立地选自H，C 1 -C 6烷基，C 2 -C 8 烯基，芳基，卤素，CN和COOR1d，其中R1d是H，C1-C18烷基，C2-C8链烯基，C2-C8炔基或芳基; 并且Z是脂族，杂环或杂芳族间隔基或其两个或多个的组合，其中Z可以任选地包含一个或多个另外的SH基团和/或一个或多个另外的非芳族C-C双键; 并且每个Z 1独立地选自单键，式（Ia），（Ib），（Ic），（Id），（Ie），（If），（Ig），（Ih），（Ij） ），（I 1），（I 1），（I 1），（I 1），（I q），（Ir），（Is），（It），（I u），（Iv） 选自H，C1-C6烷基和芳基，Z2选自单键，O，S和NR2c，Z3为与Z连接的单键，b为1至10的整数，c为 1到3。

    Lithographic printing plates with high print run stability
    10.
    发明申请
    Lithographic printing plates with high print run stability 审中-公开
    平版印刷版印刷运行稳定性高

    公开(公告)号：US20070184381A1

    公开(公告)日：2007-08-09

    申请号：US11571934

    申请日：2005-07-14

    申请人： Ursula Muller ,  Hans-Joachim Timpe

    发明人： Ursula Muller ,  Hans-Joachim Timpe

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0757 ,  G03F7/028

    摘要： Radiation-sensitive element comprising (a) an optionally pretreated substrate and (b) a radiation-sensitive coating consisting of a composition comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one radiation-sensitive initiator or initiator system for free-radical polymerization absorbing radiation selected from the wavelength range of 300 to 1,200 nm; and (iii) at least one silsesquioxane comprising at least one substituent with at least one ethylenically unsaturated group each; applied onto the substrate.

    摘要翻译： 辐射敏感元件包括（a）任选地预处理的底物和（b）由组合物组成的辐射敏感性涂层，所述组合物包含（i）一种或多种类型的单体和/或低聚物和/或聚合物，每种包含至少一种烯属 不饱和基团可以进行自由基聚合，（ii）至少一种辐射敏感的引发剂或引发剂体系，用于自由基聚合吸收选自波长范围为300至1200nm的辐射; 和（iii）至少一种包含至少一个具有至少一个烯属不饱和基团的取代基的倍半硅氧烷; 施加到基底上。