Prestressable low-E layer systems for window panes
    2.
    发明授权
    Prestressable low-E layer systems for window panes 失效
    用于窗玻璃的预应力低E层系统

    公开(公告)号:US07211328B2

    公开(公告)日:2007-05-01

    申请号:US10466523

    申请日:2002-01-23

    IPC分类号: B32B17/00

    摘要: A multilayer film, capable of withstanding high thermal stresses, with silver as functional layer, a sacrificial metal layer placed on top of the silver layer and antireflection dielectric layers, has a metal nitride layer between the silver layer and the sacrificial metal layer. This metal nitride layer is composed in particular of Si3N4 and/or AlN and constitutes an effective diffusion barrier. The optical and energy properties of the silver layer consequently remain, for the most part, preserved, even after undergoing high thermal stresses (for example of the bending or toughening type when curving and/or prestressing a window pane provided with the multilayer film).

    摘要翻译: 能够耐受高热应力的多层膜,银作为功能层,置于银层和抗反射介电层顶部的牺牲金属层在银层和牺牲金属层之间具有金属氮化物层。 该金属氮化物层特别是由Si 3 N 4 N 4和/或AlN构成,构成有效的扩散阻挡层。 因此,即使在经受高热应力(例如弯曲和/或预应力提供多层膜的窗玻璃)时,银层的光学和能量特性也大部分被保留。

    Prestressable layer system for partition glass
    4.
    发明申请
    Prestressable layer system for partition glass 失效
    分隔玻璃预应力层系统

    公开(公告)号:US20060099427A1

    公开(公告)日:2006-05-11

    申请号:US10522619

    申请日:2003-08-01

    IPC分类号: B32B17/06

    摘要: A low-emissivity multilayer system, capable of being bent and prestressed, for glazing panes, with silver as functional layer, comprises a sacrificial metal layer of Ti or an alloy of Ti and Zn and/or Al placed above the silver layer, antireflection dielectric layers and an oxide, nitride or oxynitride covering layer. The sacrificial metal layer contains chemically bonded hydrogen. An optionally Al- and/or In-doped ZnO layer is adjacent to the sacrificial metal layer. The covering layer consists of a titanium compound. Multilayer systems of this type can be manufactured relatively inexpensively and have a high hardness and a high chemical resistance. Their color parameters are very reproducible, even in the case of a heat treatment at high temperature.

    摘要翻译: 具有银作为功能层的能够弯曲和预应力的低辐射多层系统包括Ti的牺牲金属层或者设置在银层上方的Ti和Zn和/或Al的合金,抗反射电介质 层和氧化物,氮化物或氧氮化物覆盖层。 牺牲金属层包含化学键合的氢。 任选的Al和/或In掺杂的ZnO层与牺牲金属层相邻。 覆盖层由钛化合物组成。 这种多层系统可以相对廉价地制造并且具有高硬度和高耐化学性。 它们的颜色参数是非常可重现的,即使在高温下进行热处理的情况下也是如此。

    Low emissivity (low-E) thin coating stacks with intermediate antidiffusion layers
    5.
    发明授权
    Low emissivity (low-E) thin coating stacks with intermediate antidiffusion layers 有权
    具有中等反扩散层的低发射率(低E)薄涂层

    公开(公告)号:US07858193B2

    公开(公告)日:2010-12-28

    申请号:US12064391

    申请日:2006-08-10

    IPC分类号: B32B17/06

    摘要: In a heat-resistant low-emissivity (low-E) multilayer system that includes a silver layer as functional layer, for transparent substrates, in particular for window panes, which has, between the surface of the substrate and the silver layer, a high-refringence layer, in particular made of TiO2, Nb2O5 or TiNbOx, and, immediately below the silver layer, a layer essentially consisting of ZnO, a mixed oxide layer with a thickness of at least 0.5 nm, made of NiCrOx or InSnOx (ITO) that serves as antiscattering layer is placed between the high-refringence layer and the ZnO layer.

    摘要翻译: 在包括银层作为功能层的耐热低发射率(low-E)多层系统中,对于透明基板,特别是用于窗玻璃,其在基板的表面和银层之间具有高的 特别是由TiO 2,Nb 2 O 5或TiNbO x制成,并且在银层的正下方,由NiCrOx或InSnOx(ITO)制成的基本上由ZnO组成的厚度为至少0.5nm的混合氧化物层的层, 用作防灰层的高折射层和ZnO层之间。

    Glazing provided with a low-emissivity multilayer stack
    9.
    发明授权
    Glazing provided with a low-emissivity multilayer stack 失效
    玻璃窗配有低辐射多层堆叠

    公开(公告)号:US06432545B1

    公开(公告)日:2002-08-13

    申请号:US09616074

    申请日:2000-07-13

    IPC分类号: B32B1706

    摘要: The invention is a transparent substrate provided with a multilayer stack having thermal properties, especially solar-control or low-emissivity properties. The stack comprises at least one silver-based functional layer surrounded by at least two coatings made of dielectric material, with the presence of thin metal layers between the functional layer and at least one of the coatings made of dielectric material. A preferred stack is D1/ZnO/Ag/AlM/D2/ZnM′O, with AlM representing an aluminum alloy, ZnM′O a mixed oxide of zinc and at least one other metal, with D1 and D2 being a layer or a superposition of layers comprising at least one layer made of a metal oxide, silicon nitride, metal nitride or made of a mixed silicon/metal nitride.

    摘要翻译: 本发明是一种具有多层叠层的透明基板,其具有热性能,特别是太阳能控制或低发射率特性。 该叠层包括由至少两层由介电材料制成的涂层包围的至少一个银基功能层,在功能层与至少一层由电介质材料制成的涂层之间存在薄金属层。 优选的堆叠是D1 / ZnO / Ag / AlM / D2 / ZnM'O,AlM表示铝合金,ZnM'O是锌和至少一种其它金属的混合氧化物,D1和D2是层或叠层 包括由金属氧化物,氮化硅,金属氮化物或由混合硅/金属氮化物制成的至少一层的层。

    Transparent substrate provided with a thin-film stack with properties in
the infrared
    10.
    发明授权
    Transparent substrate provided with a thin-film stack with properties in the infrared 失效
    透明基板具有红外线性质的薄膜叠层

    公开(公告)号:US6020077A

    公开(公告)日:2000-02-01

    申请号:US796185

    申请日:1997-02-07

    摘要: The invention relates to a transparent substrate, in particular glass substrate, provided with a thin-film stack including at least one metal film with properties in the infrared, in particular a low-emissivity one, arranged between two coatings which each include at least one anti-reflection film based on dielectric material, and at least one protective film based on a sacrificial metal or a partially or fully oxidized sacrificial metal or a sacrificial metal alloy placed between the said metal film and one of the said coatings. According to the invention, the film placed directly below and/or above the said metal film contains at least one of the noble metals Pd, Au, Ir, Pt and Rh. The low-level addition of one or more of these metals to the others, namely the film placed below and/or above the metal film, leads to an increase in the chemical stability and the hardness of the thin-film stack.

    摘要翻译: 本发明涉及一种透明基板,特别是玻璃基板,其具有薄膜叠层,该薄膜叠层包括至少一种具有红外线性质的金属膜,特别是低辐射率金属膜,其布置在两个涂层之间,每个涂层至少包括一个 基于介电材料的抗反射膜,以及至少一个基于牺牲金属或部分或完全氧化的牺牲金属或牺牲金属合金的保护膜,放置在所述金属膜和所述涂层之一之间。 根据本发明,直接位于所述金属薄膜的正下方放置的薄膜包含贵金属Pd,Au,Ir,Pt和Rh中的至少一种。 将这些金属中的一种或多种低级添加到其它金属,即放置在金属膜下方和/或上方的膜导致薄膜叠层的化学稳定性和硬度的增加。